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Category:C09K3/14
Subcategories
This category has the following 33 subcategories, out of 33 total.
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Pages in category "C09K3/14"
The following 32 pages are in this category, out of 32 total.
1
- 18294839. POLISHING LIQUID FOR CMP, POLISHING LIQUID SET FOR CMP, AND POLISHING METHOD (Resonac Corporation)
- 18301462. Methods of Forming an Abrasive Slurry and Methods for Chemical-Mechanical Polishing simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18383226. CMP SLURRY COMPOSITION FOR POLISHING TUNGSTEN AND METHOD OF POLISHING TUNGSTEN USING THE SAME simplified abstract (SAMSUNG SDI CO., LTD.)
- 18455192. ABRASIVE SLURRY REGENERATION METHOD AND ABRASIVE SLURRY REGENERATION SYSTEM simplified abstract (Konica Minolta, Inc.)
- 18557966. ABRASIVE CUT-OFF WHEELS AND METHODS OF MAKING THE SAME simplified abstract (3M INNOVATIVE PROPERTIES COMPANY)
- 18603012. FRICTION MEMBER AND METHOD FOR MANUFACTURING SAME simplified abstract (CANON KABUSHIKI KAISHA)
- 18610982. METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18660559. DISPLAY DEVICE, METHOD OF MANUFACTURING WINDOW, AND METHOD OF MANUFACTURING DISPLAY DEVICE simplified abstract (Samsung Display Co., LTD.)
- 18771727. SLURRY COMPOSITION FOR CHEMICAL MECHANICAL METAL POLISHING AND POLISHING METHOD USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18890313. POLISHING SLURRY, METHOD FOR MANUFACTURING A DISPLAY DEVICE USING THE SAME AND DISPLAY DEVICE (Samsung Display Co., LTD.)
- 18934667. POLISHING COMPOSITION FOR SEMICONDUCTOR PROCESS AND METHOD OF MANUFACTURING SUBSTRATE USING SAME (SK enpulse Co., Ltd.)
- 18984563. COATED ABRASIVE ARTICLE HAVING SPACER PARTICLES, MAKING METHOD AND APPARATUS THEREFOR (3M Innovative Properties Company)
- 18989948. SILICA PARTICLES, PRODUCTION METHOD THEREFOR, SILICA SOL, POLISHING COMPOSITION, POLISHING METHOD, METHOD FOR PRODUCING SEMICONDUCTOR WAFER, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE (Mitsubishi Chemical Corporation)
- 18999881. SLURRY, SCREENING METHOD, AND POLISHING METHOD (RESONAC CORPORATION)
3
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- Samsung display co., ltd. (20240295904). DISPLAY DEVICE, METHOD OF MANUFACTURING WINDOW, AND METHOD OF MANUFACTURING DISPLAY DEVICE simplified abstract
- Samsung display co., ltd. (20250015098). POLISHING SLURRY, METHOD FOR MANUFACTURING A DISPLAY DEVICE USING THE SAME AND DISPLAY DEVICE
- Samsung Display Co., LTD. patent applications on January 9th, 2025
- Samsung Display Co., LTD. patent applications on September 5th, 2024
- Samsung electronics co., ltd. (20240318038). METHOD OF MANUFACTURING CHEMICAL MECHANICAL POLISHING SLURRY AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract
- Samsung electronics co., ltd. (20250115785). SLURRY COMPOSITION FOR CHEMICAL MECHANICAL METAL POLISHING AND POLISHING METHOD USING THE SAME
- Samsung Electronics Co., Ltd. patent applications on April 10th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on April 10th, 2025
- Samsung Electronics Co., Ltd. patent applications on February 6th, 2025
- Samsung Electronics Co., Ltd. patent applications on September 26th, 2024
T
- Taiwan semiconductor manufacturing co., ltd. (20240327677). CHEMICAL MECHANICAL POLISHING SLURRY COMPOSITION AND METHOD OF POLISHING METAL LAYER simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240342856). Methods of Forming an Abrasive Slurry and Methods for Chemical-Mechanical Polishing simplified abstract
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 17th, 2024