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Category:G03F7/00
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Pages in category "G03F7/00"
The following 200 pages are in this category, out of 633 total.
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- 17386312. DEVICES, SYSTEMS, AND METHODS FOR THE TRANSFORMATION AND CROPPING OF DROP PATTERNS simplified abstract (CANON KABUSHIKI KAISHA)
- 17525511. METHOD FOR IMPROVING ACCURACY OF IMPRINT FORCE APPLICATION IN IMPRINT LITHOGRAPHY simplified abstract (CANON KABUSHIKI KAISHA)
- 17525729. LAYER FORMING SYSTEM INCLUDING COVER WITH SUPPORT PADS, A POSITIONING SYSTEM WITH THE COVER AND SUPPORT PADS, AND A METHOD OF LOADING A PLATE simplified abstract (CANON KABUSHIKI KAISHA)
- 17802568. LIQUID CRYSTAL DISPLAY PANEL AND METHOD OF MANUFACTURING THE SAME, AND DISPLAY APPARATUS simplified abstract (BOE Technology Group Co., Ltd.)
- 17816078. SYSTEM AND METHOD FOR GENERATING CONTROL VALUES FOR OVERLAY CONTROL OF AN IMPRINT TOOL simplified abstract (CANON KABUSHIKI KAISHA)
- 17921254. METHODS FOR FORMING VIA HOLE AND FILLING VIA HOLE IN FLEXIBLE SUBSTRATE simplified abstract (Beijing BOE Technology Development Co., Ltd.)
- 17921254. METHODS FOR FORMING VIA HOLE AND FILLING VIA HOLE IN FLEXIBLE SUBSTRATE simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)
- 17932016. RESIDUAL LAYER THICKNESS MODULATION IN NANOIMPRINT LITHOGRAPHY simplified abstract (Google LLC)
- 18049128. PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANUFACTURING AN ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18064158. METHOD AND APPARATUS FOR IDENTIFYING POSITIONS OF A SPATIAL LIGHT MODULATOR RELATIVE TO A TEMPLATE EDGE simplified abstract (CANON KABUSHIKI KAISHA)
- 18083851. PHYSICALLY DETECTABLE ID INTRODUCED BY LITHOGRAPHY SRAF INSERTION FOR HETEROGENEOUS INTEGRATION simplified abstract (International Business Machines Corporation)
- 18107427. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18130001. SUPERCRITICAL FLUID SUPPLY APPARATUS, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18131436. OPTICAL PROXIMITY CORRECTION METHOD USING NEURAL JACOBIAN MATRIX AND METHOD OF MANUFACTURING MASK BY USING THE OPTICAL PROXIMITY CORRECTION METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18145038. PRECURSORS AND METHODS FOR PRODUCING BISMUTH-OXY-CARBIDE-BASED PHOTORESIST simplified abstract (Intel Corporation)
- 18147261. GENERATING WHOLE SUBSTRATE DROP PATTERNS WITH REPEATING EVALUATION REGIONS simplified abstract (CANON KABUSHIKI KAISHA)
- 18166924. Adaptive Feedforward and Feedback Control for Controlled Viscosity Alignment and Field-to-Field Related Friction Variation simplified abstract (CANON KABUSHIKI KAISHA)
- 18172212. SYSTEMS, DEVICES, AND METHODS FOR GENERATING DROP PATTERNS simplified abstract (CANON KABUSHIKI KAISHA)
- 18186413. Optical Device and Method of Manufacture simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18187309. OPTIMAL SCANNER MAPS AND FIELD LAYOUTS simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 18189185. FABRICATION OF ANGLED MANDREL STRUCTURES IN SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 18189189. GUIDING STRUCTURES FOR FABRICATION OF ANGLED FEATURES IN A SEMICONDUCTOR DEVICE simplified abstract (INTERNATIONAL BUSINESS MACHINES CORPORATION)
- 18210548. MITIGATING LONG-TERM ENERGY DECAY OF LASER DEVICES simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18215485. CONTROLLING ELECTROSTATIC CHARGE ON MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY (Intel Corporation)
- 18216142. EUV LIGHT UNIFORMITY CONTROL APPARATUS, EUV EXPOSURE EQUIPMENT INCLUDING THE SAME, AND METHOD OF CONTROLLING EUV LIGHT UNIFORMITY BY USING THE CONTROL APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18222897. INTEGRATED SOLUTION WITH LOW TEMPERATURE DRY DEVELOP FOR EUV PHOTORESIST simplified abstract (Applied Materials, Inc.)
- 18230472. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE PROCESSING METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18235575. COOLING SYSTEM, A SEMICONDUCTOR APPARATUS INCLUDING THE SAME, AND A METHOD OF REPLACING A FILTER USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18236554. INTEGRATED SUBSTRATE PROCESSING SYSTEM WITH ADVANCED SUBSTRATE HANDLING ROBOT (Applied Materials, Inc.)
- 18239301. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18242407. MONITORING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18244376. METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18277589. QUANTUM DOT MIXTURE, QUANTUM DOT LIGHT EMITTING LAYER AND PREPARATION METHOD THEREOF (BOE TECHNOLOGY GROUP CO., LTD.)
- 18279694. OPERATING A METROLOGY SYSTEM, LITHOGRAPHIC APPARATUS, AND METHODS THEREOF simplified abstract (ASML NETHERLANDS B.V.)
- 18282509. PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS simplified abstract (Applied Materials, Inc.)
- 18302375. CRITICAL DIMENSION INSPECTION METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18318801. IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18326659. PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18329647. FILM FORMING METHOD, FILM FORMING APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18332238. MULTI-WAVELENGTH SELECTION METHOD FOR OVERLAY MEASUREMENT, AND OVERLAY MEASUREMENT METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING MULTI-WAVELENGTHS simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18338789. EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18340535. SUBSTRATE TREATING METHOD AND SUBSTRATE TREATING APPARATUS simplified abstract (SEMES CO., LTD.)
- 18346419. CLEANING METHOD, COMPUTER STORAGE MEDIUM, AND SUBSTRATE TREATMENT SYSTEM (Tokyo Electron Limited)
- 18347129. OVERLAY CORRECTION METHOD, AND EXPOSURE METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD INCLUDING OVERLAY CORRECTION METHOD simplified abstract (Samsung Electronics Co., Ltd.)
- 18350611. LITHOGRAPHY MODEL SIMULATION METHOD, PHOTOMASK GENERATING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE FABRICATION METHOD USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18351637. IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18354078. IMPRINTING METHOD, IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18360209. METHOD AND COMPUTING DEVICE FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18360238. EXPOSURE APPARATUS, EXPOSURE METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18361728. LITHOGRAPHY SYSTEM AND METHOD THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18363957. FILM FORMING APPARATUS, FILM FORMING METHOD, MANUFACTURING METHOD OF ARTICLE, AND STORAGE MEDIUM simplified abstract (CANON KABUSHIKI KAISHA)
- 18364850. STAGE APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18368995. EXPOSURE APPARATUS AND DECONTAMINATION APPARATUS simplified abstract (Samsung Electronics Co., Ltd.)
- 18369323. METHOD FOR AREA SELECTIVE DEPOSITION ON EXTREME ULTRA-VIOLET (EUV) PHOTORESISTS (Tokyo Electron Limited)
- 18372444. SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING TARGET simplified abstract (KLA Corporation)
- 18372531. SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVERLAY METROLOGY simplified abstract (KLA Corporation)
- 18379860. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18379933. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18384038. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18394133. METHODS FOR INCREASING THE DENSITY OF HIGH-INDEX NANOIMPRINT LITHOGRAPHY FILMS simplified abstract (Applied Materials, Inc.)
- 18397308. PATTERN EXPOSURE APPARATUS, DEVICE MANUFACTURING METHOD, AND EXPOSURE APPARATUS simplified abstract (Nikon Corporation)
- 18401729. SYSTEM AND METHOD FOR THERMAL MANAGEMENT OF RETICLE IN SEMICONDUCTOR MANUFACTURING simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18402094. CONVEYANCE APPARATUS, CONVEYANCE METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18403982. BIASABLE ELECTROSTATIC CHUCK simplified abstract (Applied Materials, Inc.)
- 18404934. METHOD AND APPARATUS FOR DIRECT WRITING PHOTOETCHING BY PARALLEL INTERPENETRATING SUPER-RESOLUTION HIGH-SPEED LASER simplified abstract (ZHEJIANG UNIVERSITY)
- 18405339. MEASURING DEVICE AND MEASURING METHOD simplified abstract (Kioxia Corporation)
- 18407631. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18409031. METHOD OF FABRICATING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18410463. MASK CASE, MASK HANDLING AUTOMATION APPARATUS AND OPERATING METHOD THEREOF simplified abstract (Samsung Electronics Co., Ltd.)
- 18411364. PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18412739. SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD simplified abstract (Tokyo Electron Limited)
- 18416087. SUBSTRATE TREATMENT METHOD AND SUBSTRATE TREATMENT APPARATUS simplified abstract (Tokyo Electron Limited)
- 18418963. IMPRINT METHOD, IMPRINT APPARATUS, DETERMINING METHOD, INFORMATION PROCESSING APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18419219. SEMICONDUCTOR MANUFACTURING APPARATUS (SAMSUNG ELECTRONICS CO., LTD.)
- 18421399. PHOTOLITHOGRAPHY METHOD AND STRUCTURES THEREOF (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18421783. METHOD AND APPARATUS FOR CONTROLLING DROPLET IN EXTREME ULTRAVIOLET LIGHT SOURCE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18426723. SULFONIUM SALT, RESIST COMPOSITION AND PATTERN FORMING PROCESS simplified abstract (SHIN-ETSU CHEMICAL CO., LTD.)
- 18434831. Display Panel, Preparation Method and Display Apparatus simplified abstract (HKC CORPORATION LIMITED)
- 18434948. SUBSTRATE PROCESSING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18436127. SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18439434. METHOD OF BUILDING A 3D FUNCTIONAL OPTICAL MATERIAL STACKING STRUCTURE simplified abstract (Applied Materials, Inc.)
- 18440727. CONTROLLING LIGHT SOURCE WAVELENGTHS FOR SELECTABLE PHASE SHIFTS BETWEEN PIXELS IN DIGITAL LITHOGRAPHY SYSTEMS simplified abstract (Applied Materials, Inc.)
- 18441710. DARK FIELD MICROSCOPE simplified abstract (ASML NETHERLANDS B.V.)
- 18442205. OPTICAL PROXIMITY CORRECTION METHOD AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)
- 18446400. LITHOGRAPHY SYSTEM AND METHODS simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18447324. MANUFACTURING METHOD OF OVERLAY MARK AND OVERLAY MEASUREMENT METHOD (United Microelectronics Corp.)
- 18448110. METHOD OF USING WAFER STAGE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18449078. OPTICAL PROXIMITY CORRECTION (OPC) METHOD AND METHOD OF MANUFACTURING MASK BY USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18449779. DETECTION DEVICE, DETECTION METHOD, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18450457. DETERMINING APPARATUS, PATTERN FORMING APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18454957. INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, STORAGE MEDIUM, EXPOSURE APPARATUS, EXPOSURE METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18455976. CLEANING APPARATUS, CLEANING METHOD, IMPRINT APPARATUS, AND METHOD FOR MANUFACTURING AN ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18457983. PATTERN FORMATION METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND IMPRINT APPARATUS simplified abstract (Kioxia Corporation)
- 18458056. PATTERN FORMING METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18460679. OVERLAY MEASUREMENT METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18465420. SUBSTRATE TREATMENT APPARATUS AND TREATMENT SOLUTION SUPPLY METHOD simplified abstract (TOKYO ELECTRON LIMITED)
- 18467389. METHOD FOR FORMING SEMICONDUCTOR DIE (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18468505. APPARATUS FOR CLEANING AN EXTREME ULTRAVIOLET LIGHT CREATION CHAMBER simplified abstract (Samsung Electronics Co., Ltd.)
- 18471005. METHOD FOR INTEGRATION OF OPTICAL DEVICE FABRICATION WITH SUBSTRATE THICKNESS ENGINEERING simplified abstract (Applied Materials, Inc.)
- 18473635. METHOD OF DESIGNING MASK LAYOUT FOR IMAGE SENSOR simplified abstract (Samsung Electronics Co., Ltd.)
- 18480148. OVERLAY MARK, MANUFACTURING METHOD USING THE SAME, AND SEMICONDUCTOR DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18480544. APPARATUS AND METHOD FOR MANUFACTURING DISPLAY DEVICE, AND MASK ASSEMBLY simplified abstract (Samsung Display Co., Ltd.)
- 18481030. DETERMINATION METHOD, DETERMINATION APPARATUS, INFORMATION PROCESSING METHOD, STORAGE MEDIUM, INFORMATION PROCESSING APPARATUS, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING ARTICLE simplified abstract (CANON KABUSHIKI KAISHA)
- 18481897. Magnification Ramp Scheme to Mitigate Template Slippage simplified abstract (CANON KABUSHIKI KAISHA)
- 18489062. EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18489404. FABRICATION OF NANOIMPRINT WORKING STAMPS WITH COMBINED PATTERNS FROM MULTIPLE MASTER STAMPS simplified abstract (GOOGLE LLC)
- 18492587. INFORMATION PROCESSING APPARATUS AND INFORMATION PROCESSING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18496160. PHOTO-CURABLE COMPOSITION AND METHODS FOR PREPARING CURED FILM, OPTICAL COMPONENT, CIRCUIT SUBSTRATE, ELECTRICAL COMPONENT AND REPLICA MOLD USING THE SAME simplified abstract (CANON KABUSHIKI KAISHA)
- 18504007. WAFER CHUCK, METHOD FOR PRODUCING THE SAME, AND EXPOSURE APPARATUS simplified abstract (CANON KABUSHIKI KAISHA)
- 18504147. METHOD AND APPARATUS FOR DIFFRACTION-BASED OVERLAY MEASUREMENT simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18507311. PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME AND COLOR FILTER simplified abstract (SAMSUNG SDI CO., LTD.)
- 18508195. TARGET CONTROL IN EXTREME ULTRAVIOLET LITHOGRAPHY SYSTEMS USING ABERRATION OF REFLECTION IMAGE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18508566. METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18512296. FILM FORMING APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18513893. PARTICLE REMOVAL METHOD simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18514254. MULTI-METAL FILL WITH SELF-ALIGNED PATTERNING AND DIELECTRIC WITH VOIDS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18516825. DETERMINATION METHOD, EXPOSURE METHOD, METHOD OF MANUFACTURING ARTICLE, INFORMATION PROCESSING APPARATUS, AND EXPOSURE APPARATUS simplified abstract (CANON KABUSHIKI KAISHA)
- 18517070. LENS ADJUSTMENT FOR AN EDGE EXPOSURE TOOL simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18517635. TECHNIQUES FOR CORRECTION OF ABERRATIONS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18517653. FREQUENCY-PICKED METHODOLOGY FOR DIFFRACTION-BASED OVERLAY MEASUREMENT simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18519497. EXTREME ULTRAVIOLET EXPOSURE APPARATUS INCLUDING A MASK STAGE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18521853. IMPRINT COMPOSITIONS WITH PASSIVATED NANOPARTICLES AND MATERIALS AND PROCESSES FOR MAKING THE SAME simplified abstract (Applied Materials, Inc.)
- 18523620. DYNAMIC GENERATION OF LAYOUT ADAPTIVE PACKAGING simplified abstract (Applied Materials, Inc.)
- 18523745. IMPRINT APPARATUS, ARTICLE MANUFACTURING METHOD, DETERMINATION METHOD, AND RECORDING MEDIUM simplified abstract (CANON KABUSHIKI KAISHA)
- 18524726. SUBSTRATE PROCESSING APPARATUS AND METHOD simplified abstract (SEMES CO., LTD.)
- 18526350. SUBSTRATE PROCESSING APPARATUS simplified abstract (TOKYO ELECTRON LIMITED)
- 18528998. METHOD OF MEASURING OVERLAY AND SEMICONDUCTOR DEVICE MANUFACTURED USING THE SAME simplified abstract (Samsung Electronics Co., Ltd.)
- 18532757. OVERLAY IMPROVEMENT METHOD, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE COMPRISING OVERLAY IMPROVEMENT METHOD simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18533376. IMPRINT APPARATUS, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18535137. IMPRINT APPARATUS, IMPRINT METHOD AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18535594. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18538308. IMPRINT METHOD, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18538343. IMPRINT DEVICE, IMPRINT METHOD, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18541174. DISPLAY SUBSTRATE, DISPLAY PANEL, DISPLAY DEVICE, METHOD OF DETECTING POST SPACER, AND METHOD OF MANUFACTURING POST SPACER simplified abstract (BOE TECHNOLOGY GROUP CO., LTD.)
- 18542946. CONTROL APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18547470. SUBSTRATE RESTRAINING SYSTEM simplified abstract (ASML NETHERLANDS B.V.)
- 18568993. DIGITAL LITHOGRAPHY EXPOSURE UNIT BOUNDARY SMOOTHING simplified abstract (Applied Materials, Inc.)
- 18575518. A METHOD OF MONITORING A MEASUREMENT RECIPE AND ASSOCIATED METROLOGY METHODS AND APPARATUSES simplified abstract (ASML Netherlands B.V.)
- 18578753. IMPRINTING APPARATUS simplified abstract (KONINKLIJKE PHILIPS N.V.)
- 18578780. APPARATUS AND METHOD FOR PREPARING AND CLEANING A COMPONENT simplified abstract (ASML Netherlands B.V.)
- 18582045. METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18588680. ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PREPARING PRINTING PLATE simplified abstract (FUJIFILM Corporation)
- 18589918. PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18590518. SUPPORT FOR LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD OF PRODUCING LITHOGRAPHIC PRINTING PLATE simplified abstract (FUJIFILM Corporation)
- 18593112. PATTERN DESIGN METHOD AND TEMPLATE MANUFACTURING METHOD simplified abstract (Kioxia Corporation)
- 18593159. IMPRINT METHOD AND TEMPLATE FOR IMPRINTING simplified abstract (Kioxia Corporation)
- 18595341. SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE simplified abstract (Kioxia Corporation)
- 18597563. METHOD OF MANUFACTURING INTEGRATED CIRCUIT simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18597732. CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE simplified abstract (Samsung Display Co., Ltd.)
- 18597732. CORRECTION METHOD OF MULTI-BEAM EXPOSURE DEVICE simplified abstract (Samsung Electronics Co., Ltd.)
- 18598201. PATTERN DESIGN METHOD, TEMPLATE MANUFACTURING METHOD, AND PATTERN DESIGN APPARATUS simplified abstract (Kioxia Corporation)
- 18598415. METHOD OF CLEANING WAFER TABLE OF PHOTOLITHOGRAPHY SYSTEM AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18599619. SUBSTRATE TRANSFER METHOD AND SUBSTRATE TRANSFER APPARATUS simplified abstract (Tokyo Electron Limited)
- 18599666. HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS simplified abstract (Samsung SDI Co., Ltd.)
- 18601794. METHOD OF PRODUCING MICROSTRUCTURE AND LIQUID EJECTION HEAD simplified abstract (CANON KABUSHIKI KAISHA)
- 18603316. ANALYSIS METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18603679. CLEANING APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18604127. METHOD AND APPARATUS FOR COATING PHOTO RESIST OVER A SUBSTRATE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18609116. METHOD FOR TESTING PHOTOSENSITIVE COMPOSITION AND METHOD FOR PRODUCING PHOTOSENSITIVE COMPOSITION simplified abstract (FUJIFILM Corporation)
- 18609433. IMMERSION EXPOSURE TOOL simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18611037. ANALYSIS METHOD OF PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF PHOTOSENSITIVE COMPOSITION, AND MANUFACTURING METHOD OF ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18611440. DROPLET SPLASH CONTROL FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18612659. LIGHT SOURCES AND METHODS OF CONTROLLING; DEVICES AND METHODS FOR USE IN MEASUREMENT APPLICATIONS simplified abstract (ASML NETHERLANDS B.V.)
- 18616014. ENDPOINT DETECTION SYSTEM FOR ENHANCED SPECTRAL DATA COLLECTION simplified abstract (Applied Materials, Inc.)
- 18620262. METHODS AND APPARATUS TO REDUCE EXTREME ULTRAVIOLET LIGHT FOR PHOTOLITHOGRAPHY simplified abstract (Intel Corporation)
- 18628152. SEMICONDUCTOR MANUFACTURING APPARATUS AND OPERATING METHOD THEREOF simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18633359. TEMPERATURE ADJUSTMENT APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
- 18634221. EXTREME ULTRAVIOLET LIGHT SOURCE WITH THERMAL STABILIZATION (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18642711. PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE simplified abstract (FUJIFILM Corporation)
- 18643281. METHOD OF OPERATING SEMICONDUCTOR APPARATUS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18646813. METHOD AND APPARATUS FOR IMPROVING CRITICAL DIMENSION VARIATION simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18652444. APPARATUS AND METHOD FOR ASSESSING PHOTORESIST RINSE SOLUTION (SAMSUNG ELECTRONICS CO., LTD.)
- 18660862. Lithography Apparatus and Method simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18663836. METHOD AND SYSTEM FOR MANUFACTURING A SEMICONDUCTOR DEVICE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18664027. HIGH THROUGHPUT AND HIGH POSITION ACCURATE METHOD FOR PARTICLE INSPECTION OF MASK PODS simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18664308. EXPOSURE APPARATUS, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE (Kioxia Corporation)
- 18665134. SUBSTRATE HOLDER AND METHODS OF USE simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18667993. FLOW CELLS simplified abstract (ILLUMINA, INC.)
- 18668382. FORMING APPARATUS AND ARTICLE MANUFACTURING METHOD simplified abstract (CANON KABUSHIKI KAISHA)
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