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Category:G03F1/80
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This category has the following 10 subcategories, out of 10 total.
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Pages in category "G03F1/80"
The following 31 pages are in this category, out of 31 total.
1
- 17724861. META-OPTICAL DEVICE AND METHOD OF MANUFACTURING METASURFACE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18164053. TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD simplified abstract (Kioxia Corporation)
- 18180210. REFLECTIVE MASK AND METHOD OF DESIGNING ANTI-REFLECTION PATTERN OF THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18313203. METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AREA OF HIGH-NA EUV EXPOSURE simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18318042. PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18326659. PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (SAMSUNG ELECTRONICS CO., LTD.)
- 18435960. PHOTOLITHOGRAPHY PATTERNING METHOD simplified abstract (KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY)
- 18517796. REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND METHOD OF MANUFACTURING REFLECTIVE MASK simplified abstract (AGC Inc.)
- 18823930. REFLECTIVE MASK BLANK AND MANUFACTURING METHOD OF REFLECTIVE MASK (SHIN-ETSU CHEMICAL CO., LTD.)
- 18888542. MASK AND METHOD OF MANUFACTURING THE SAME (Samsung Display Co., LTD.)
2
- 20240085777.PROCESS PROXIMITY EFFECT CORRECTION METHOD AND PROCESS PROXIMITY EFFECT CORRECTION DEVICE simplified abstract (samsung electronics co., ltd.)
- 20240085778.PHOTOMASK INCLUDING LINE PATTERN MONITORING MARK AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME simplified abstract (samsung electronics co., ltd.)
K
- Kioxia corporation (20240096601). TARGET PROCESSING DEVICE AND TARGET PROCESSING METHOD simplified abstract
- Kioxia corporation (20240427228). PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF PHOTOMASK
- Kioxia Corporation patent applications on December 26th, 2024
- Kioxia Corporation patent applications on March 21st, 2024
S
- Samsung display co., ltd. (20250102904). MASK AND METHOD OF MANUFACTURING THE SAME
- Samsung Display Co., LTD. patent applications on March 27th, 2025
- SAMSUNG ELECTRONICS CO., LTD. patent applications on January 25th, 2024
- SAMSUNG ELECTRONICS CO., LTD. patent applications on March 14th, 2024
- SAMSUNG SDI CO., LTD. patent applications on February 6th, 2025
T
- Taiwan semiconductor manufacturing co., ltd. (20240184195). METHOD OF MANUFACTURING PHASE SHIFT PHOTO MASKS simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20240248387). METHOD AND SYSTEM TO INTRODUCE BRIGHT FIELD IMAGING AT STITCHING AREA OF HIGH-NA EUV EXPOSURE simplified abstract
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on July 25th, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. patent applications on June 6th, 2024
- Taiwan semiconductor manufacturing company, ltd. (20240377720). EUV Lithography Mask With A Porous Reflective Multilayer Structure simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240377722). MASK AND METHOD OF FORMING THE SAME simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on February 8th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on March 6th, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024