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Category:CPC H01L29/6681
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Pages in category "CPC H01L29/6681"
The following 31 pages are in this category, out of 31 total.
1
- 18616449. SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18678227. GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF FORMING SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18750379. Gate Isolation Feature and Manufacturing Method Thereof simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
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- SAMSUNG ELECTRONICS CO., LTD Patent Application Trends in 2024
- Samsung electronics co., ltd. (20250022941). SEMICONDUCTOR DEVICES
- Samsung Electronics Co., Ltd. Patent Application Trends in 2024
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2024
- Samsung electronics Co., Ltd. Patent Application Trends in 2024
- Samsung electronics CO., LTD. Patent Application Trends in 2025
- SAMSUNG ELECTRONICS CO., LTD. Patent Application Trends in 2025
- Samsung Electronics Co., Ltd. patent applications on January 16th, 2025
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- Taiwan Semiconductor Manufacturing Co., Ltd Patent Application Trends in 2024
- Taiwan Semiconductor Manufacturing Co., Ltd. Patent Application Trends in 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. Patent Application Trends in 2025
- Taiwan Semiconductor Manufacturing Company Limited Patent Application Trends in 2024
- Taiwan semiconductor manufacturing company, ltd. (20240234549). SEMICONDUCTOR DEVICE STRUCTURE WITH INNER SPACER LAYER simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240290870). METHODS FOR FORMING MULTI-GATE TRANSISTORS simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240322016). GATE STRUCTURE OF SEMICONDUCTOR DEVICE AND METHOD OF FORMING SAME simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240339526). Gate Isolation Feature and Manufacturing Method Thereof simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379826). FinFET Device Comprising Plurality of Dummy Protruding Features simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379827). CHANNEL LAST PROCESS FOR DUMMY GATE VOID DEFECT REDUCTION simplified abstract
- Taiwan Semiconductor Manufacturing Company, Ltd. Patent Application Trends in 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on August 29th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on July 11th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on November 14th, 2024
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. patent applications on October 10th, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd. patent applications on September 26th, 2024