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Category:CPC H01J37/32155
Pages in category "CPC H01J37/32155"
The following 18 pages are in this category, out of 18 total.
1
- 18063888. CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER simplified abstract (Applied Materials, Inc.)
- 18396280. HIGH-FREQUENCY POWER SUPPLY APPARATUS simplified abstract (DAIHEN Corporation)
- 18489416. Method and System for Plasma Process (Tokyo Electron Limited)
- 18607327. PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM simplified abstract (Tokyo Electron Limited)
- 19000700. FREQUENCY CONTROL OF SOURCE RADIO FREQUENCY POWER IN PLASMA PROCESSING (Tokyo Electron Limited)
2
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- Tokyo electron limited (20250132128). Method and System for Plasma Process
- Tokyo electron limited (20250132129). FREQUENCY CONTROL OF SOURCE RADIO FREQUENCY POWER IN PLASMA PROCESSING
- TOKYO ELECTRON LIMITED Patent Application Trends in 2024
- Tokyo Electron Limited Patent Application Trends in 2024
- Tokyo Electron Limited patent applications on April 24th, 2025