There is currently no text in this page. You can search for this page title in other pages, or search the related logs, but you do not have permission to create this page.
Category:CPC C30B25/14
Pages in category "CPC C30B25/14"
The following 20 pages are in this category, out of 20 total.
1
- 18382429. AUXILIARY FLOW PLATE FOR THICKNESS AND CONCENTRATION UNIFORMITY ADJUSTABILITY (Applied Materials, Inc.)
- 18602099. CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIAL FILM APPLICATIONS simplified abstract (Applied Materials, Inc.)
- 18733504. MULTI-THERMAL CVD CHAMBERS WITH SHARED GAS DELIVERY AND EXHAUST SYSTEM simplified abstract (Applied Materials, Inc.)
- 18966261. GAS-PHASE REACTOR SYSTEM-WITH A REACTION CHAMBER, A SOLID PRECURSOR SOURCE VESSEL, A GAS DISTRIBUTION SYSTEM, AND A FLANGE ASSEMBLY (ASM IP Holding B.V.)
- 19018386. EPI ISOLATION PLATE AND PARALLEL BLOCK PURGE FLOW TUNING FOR GROWTH RATE AND UNIFORMITY (Applied Materials, Inc.)
A
- Applied materials, inc. (20240254654). EPI ISOLATION PLATE WITH GAP AND ANGLE ADJUSTMENT FOR PROCESS TUNING simplified abstract
- Applied materials, inc. (20240254655). EPI ISOLATION PLATE AND PARALLEL BLOCK PURGE FLOW TUNING FOR GROWTH RATE AND UNIFORMITY simplified abstract
- Applied materials, inc. (20250129509). AUXILIARY FLOW PLATE FOR THICKNESS AND CONCENTRATION UNIFORMITY ADJUSTABILITY
- APPLIED MATERIALS, INC. Patent Application Trends in 2025
- Applied Materials, Inc. patent applications on April 24th, 2025
- Applied Materials, Inc. patent applications on August 1st, 2024