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Category:C30B25/14
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This category has the following 4 subcategories, out of 4 total.
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Pages in category "C30B25/14"
The following 21 pages are in this category, out of 21 total.
1
- 18070010. GAS RECYCLING SYSTEMS, SUBSTRATE PROCESSING SYSTEMS, AND RELATED APPARATUS AND METHODS FOR SEMICONDUCTOR MANUFACTURING simplified abstract (Applied Materials, Inc.)
- 18101523. PRE-HEAT RINGS AND PROCESSING CHAMBERS INCLUDING BLACK QUARTZ, AND RELATED METHODS simplified abstract (Applied Materials, Inc.)
- 18122530. PROCESSING SYSTEMS, CHAMBERS, AND RELATED METHODS INCLUDING THERMOELECTRIC GENERATORS FOR ENERGY HARNESSING simplified abstract (Applied Materials, Inc.)
- 18122537. PROCESSING SYSTEMS, CHAMBERS, AND RELATED METHODS INCLUDING TURBINES FOR ENERGY HARNESSING simplified abstract (Applied Materials, Inc.)
- 18382429. AUXILIARY FLOW PLATE FOR THICKNESS AND CONCENTRATION UNIFORMITY ADJUSTABILITY (Applied Materials, Inc.)
- 18588308. SILICON CARBIDE SINGLE CRYSTAL AND MANUFACTURING METHOD OF SILICON CARBIDE SINGLE CRYSTAL simplified abstract (DENSO CORPORATION)
- 18588308. SILICON CARBIDE SINGLE CRYSTAL AND MANUFACTURING METHOD OF SILICON CARBIDE SINGLE CRYSTAL simplified abstract (TOYOTA JIDOSHA KABUSHIKI KAISHA)
- 18602099. CHAMBER ARCHITECTURE FOR EPITAXIAL DEPOSITION AND ADVANCED EPITAXIAL FILM APPLICATIONS simplified abstract (Applied Materials, Inc.)
- 18733504. MULTI-THERMAL CVD CHAMBERS WITH SHARED GAS DELIVERY AND EXHAUST SYSTEM simplified abstract (Applied Materials, Inc.)
- 18966261. GAS-PHASE REACTOR SYSTEM-WITH A REACTION CHAMBER, A SOLID PRECURSOR SOURCE VESSEL, A GAS DISTRIBUTION SYSTEM, AND A FLANGE ASSEMBLY (ASM IP Holding B.V.)
- 18976591. MULTI-LAYER EPI CHAMBER BODY (Applied Materials, Inc.)
A
- Applied materials, inc. (20240247404). PRE-HEAT RINGS AND PROCESSING CHAMBERS INCLUDING BLACK QUARTZ, AND RELATED METHODS simplified abstract
- Applied materials, inc. (20240254627). INJECTORS, LINERS, PROCESS KITS, PROCESSING CHAMBERS, AND RELATED METHODS FOR GAS FLOW IN BATCH PROCESSING OF SEMICONDUCTOR MANUFACTURING simplified abstract
- Applied materials, inc. (20240254654). EPI ISOLATION PLATE WITH GAP AND ANGLE ADJUSTMENT FOR PROCESS TUNING simplified abstract
- Applied materials, inc. (20240254655). EPI ISOLATION PLATE AND PARALLEL BLOCK PURGE FLOW TUNING FOR GROWTH RATE AND UNIFORMITY simplified abstract
- Applied materials, inc. (20250101629). MULTI-LAYER EPI CHAMBER BODY
- Applied materials, inc. (20250129509). AUXILIARY FLOW PLATE FOR THICKNESS AND CONCENTRATION UNIFORMITY ADJUSTABILITY
- Applied Materials, Inc. patent applications on April 24th, 2025
- Applied Materials, Inc. patent applications on August 1st, 2024
- Applied Materials, Inc. patent applications on July 25th, 2024
- Applied Materials, Inc. patent applications on March 27th, 2025