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Tokyo electron limited (20250149315). ADJUSTMENT METHOD AND PLASMA PROCESSING APPARATUS
.../32"},{"@type":"PropertyValue","name":"CPC Classification","value":"H01J37/32926"}]}} [[Category:H01J37/32]] ...

4 KB (540 words) - 06:52, 9 May 2025
19001626. ADJUSTMENT METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
.../32"},{"@type":"PropertyValue","name":"CPC Classification","value":"H01J37/32926"}]}} [[Category:H01J37/32]] ...

4 KB (540 words) - 15:41, 11 May 2025
Tokyo electron limited (20250149316). PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
.../32"},{"@type":"PropertyValue","name":"CPC Classification","value":"H01J37/32926"}]}} [[Category:H01J37/32]] ...

4 KB (532 words) - 06:52, 9 May 2025
19004463. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
.../32"},{"@type":"PropertyValue","name":"CPC Classification","value":"H01J37/32926"}]}} [[Category:H01J37/32]] ...

4 KB (532 words) - 15:41, 11 May 2025
Tokyo Electron Limited patent applications on May 8th, 2025
...tron Limited has applied for patents in the areas of [[:Category:H01J37/32|H01J37/32]] (14), [[:Category:H01L21/67|H01L21/67]] (4), [[:Category:C23C16/455|C2 ...y:CPC_H01J37/32651|H01J37/32651]] (2), [[:Category:CPC_H01J37/32926|H01J37/32926]] (2), [[:Category:CPC_B05D1/62|B05D1/62]] (1) ...

29 KB (4,403 words) - 06:52, 9 May 2025