International business machines corporation (20240413214). SELF ALIGNED BACKSIDE CONTACT

SELF ALIGNED BACKSIDE CONTACT

Organization Name

international business machines corporation

Inventor(s)

Ruilong Xie of Niskayuna NY (US)

Kisik Choi of Watervliet NY (US)

Chanro Park of Clifton Park NY (US)

Shogo Mochizuki of Mechanicville NY (US)

Julien Frougier of Albany NY (US)

SELF ALIGNED BACKSIDE CONTACT

This abstract first appeared for US patent application 20240413214 titled 'SELF ALIGNED BACKSIDE CONTACT

Original Abstract Submitted

a semiconductor structure including first source drain regions and second source drain regions arranged above a backside dielectric layer, and a buffer layer physically separating at least one of the second source drain regions from the backside dielectric layer, where at least one of the first source drain regions is in direct contact with the backside dielectric layer.