Weimin C. Han

Weimin C. Han from Portland OR US has applied for patents in technology areas such as [[:Category:{Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step (self-aligned silicidation on field effect transistors )}|{Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step (self-aligned silicidation on field effect transistors )}]] with Intel Corporation.

Patents

• SELF-ALIGNED INTERCONNECT FEATURES WITH FLOATING DIELECTRIC STRUCTURE (20250218868)

[[Category:{Formation of self-aligned vias or contact plugs, i.e. involving a lithographically uncritical step (self-aligned silicidation on field effect transistors )}]]