Category:Shih-Hsien Huang

Shih-Hsien Huang

Executive Summary

Shih-Hsien Huang is an inventor who has filed 1 patents. Their primary areas of innovation include No explanation available (1 patents), {the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz ( (1 patents), {the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers (1 patents), and they have worked with companies such as United Semiconductor (Xiamen) Co., Ltd. (1 patents). Their most frequent collaborators include (1 collaborations), (1 collaborations), (1 collaborations).

Patent Filing Activity

Technology Areas

List of Technology Areas

• H10D30/027 (No explanation available): 1 patents
• H01L21/0217 ({the material being a silicon nitride not containing oxygen, e.g. SixNy or SixByNz (): 1 patents
• H01L21/02211 ({the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides (adhesion layers or buffer layers): 1 patents
• H01L21/02271 ({deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition (): 1 patents
• H01L21/02318 ({post-treatment}): 1 patents
• H01L21/31116 ({by dry-etching}): 1 patents

Companies

List of Companies

• United Semiconductor (Xiamen) Co., Ltd.: 1 patents

Collaborators

• Jun Wu (1 collaborations)
• Wen Yi Tan (1 collaborations)
• Feng Gao (1 collaborations)