Category:Kuei-Yu Kao of Hsinchu (TW)
Appearance
Kuei-Yu Kao
Kuei-Yu Kao from Hsinchu (TW) has applied for patents in technology areas such as H01L29/66, H01L29/40, H01L29/423 with taiwan semiconductor manufacturing co., ltd..
Patents
Pages in category "Kuei-Yu Kao of Hsinchu (TW)"
The following 14 pages are in this category, out of 14 total.
1
- 17461184. SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF simplified abstract (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- 18105659. SEMICONDUCTOR DEVICE AND METHOD OF MAKING THE SAME simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
- 18455211. REDUCED RESIDUE AT ETCHED STRUCTURE SIDEWALLS (Taiwan Semiconductor Manufacturing Company, LTD.)
- 18463405. SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF WITH CAP LAYERS (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18524242. SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF simplified abstract (Taiwan Semiconductor Manufacturing Co., Ltd.)
- 18587477. Methods for Forming Stacked Layers and Devices Formed Thereof simplified abstract (Taiwan Semiconductor Manufacturing Company, Ltd.)
T
- Taiwan semiconductor manufacturing co., ltd. (20240096705). SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF simplified abstract
- Taiwan semiconductor manufacturing co., ltd. (20250089328). SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THEREOF WITH CAP LAYERS
- Taiwan semiconductor manufacturing company, ltd. (20240243011). Methods for Forming Stacked Layers and Devices Formed Thereof simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240266209). SEMICONDUCTOR DEVICE AND METHOD OF MAKING THE SAME simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379672). Transistor Gate Profile Optimization simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379821). FIN-END GATE STRUCTURES AND METHOD FORMING SAME simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20240379827). CHANNEL LAST PROCESS FOR DUMMY GATE VOID DEFECT REDUCTION simplified abstract
- Taiwan semiconductor manufacturing company, ltd. (20250072099). REDUCED RESIDUE AT ETCHED STRUCTURE SIDEWALLS