Category:Abhijit Basu Mallick of Sunnyvale CA (US)
Abhijit Basu Mallick
Abhijit Basu Mallick from Sunnyvale CA (US) has applied for patents in technology areas such as C23C16/455, C23C16/40, H01J37/32 with applied materials, inc..
Patents
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This category has only the following subcategory.
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Pages in category "Abhijit Basu Mallick of Sunnyvale CA (US)"
The following 13 pages are in this category, out of 13 total.
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- 17839809. METHOD OF FORMING CARBON-BASED SPACER FOR EUV PHOTORESIST PATTERNS simplified abstract (Applied Materials, Inc.)
- 17991931. AREA SELECTIVE DEPOSITION THROUGH SURFACE SILYLATION simplified abstract (Applied Materials, Inc.)
- 18209700. NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION (Applied Materials, Inc.)
- 18209711. IN-SITU ETCH AND INHIBITION IN PLASMA ENHANCED ATOMIC LAYER DEPOSITION (Applied Materials, Inc.)
- 18383182. MULTILAYER INNER SPACER FOR GATE-ALL-AROUND DEVICE simplified abstract (Applied Materials, Inc.)
- 18455508. SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL (Applied Materials, Inc.)
- 18538273. INNER SPACER LINER FOR GATE-ALL-AROUND DEVICE simplified abstract (Applied Materials, Inc.)
- 18585303. IN SITU NUCLEATION FOR NANOCRYSTALLINE DIAMOND FILM DEPOSITION simplified abstract (Applied Materials, Inc.)
- 18615539. AREA SELECTIVE CARBON-BASED FILM DEPOSITION simplified abstract (Applied Materials, Inc.)
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- Applied materials, inc. (20240266185). SELECTIVE ETCHING OF SILICON-CONTAINING MATERIAL RELATIVE TO METAL-DOPED BORON FILMS simplified abstract
- Applied materials, inc. (20240420934). IN-SITU ETCH AND INHIBITION IN PLASMA ENHANCED ATOMIC LAYER DEPOSITION
- Applied materials, inc. (20240420952). NESTED-LOOP PLASMA ENHANCED ATOMIC LAYER DEPOSITION
- Applied materials, inc. (20250066913). SEAM PERFORMANCE IMPROVEMENT USING HYDROXYLATION FOR GAPFILL