20250185337. Se (INTERNATIONAL BUSINESS MACHINES)
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SEMICONDUCTOR STRUCTURE WITH TWO AIR GAPS ON TWO SIDES OF A TOP SOURCE-DRAIN MIDDLE-OF-LINE CONTACT VIA
Abstract: a semiconductor structure that includes a top source/drain (s/d) middle-of-line (mol) contact via including a first side and a second side. the semiconductor structure also includes a first air gap located adjacent the first side of the top s/d mol contact via, and a second air gap located adjacent the second side of the top s/d mol contact via.
Inventor(s): Liqiao Qin, Tao Li, Ruilong Xie, Jingyun Zhang
CPC Classification: H10D64/254 (No explanation available)
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