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18639332. MATERIAL MEASUREMENT SYSTEM AND METHOD (SAMSUNG ELECTRONICS CO., LTD.)

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MATERIAL MEASUREMENT SYSTEM AND METHOD

Organization Name

SAMSUNG ELECTRONICS CO., LTD.

Inventor(s)

Sungyoon Ryu of Suwon-si (KR)

Ingi Kim of Suwon-si (KR)

Suhwan Park of Suwon-si (KR)

Inkeun Baek of Suwon-si (KR)

Younghoon Sohn of Suwon-si (KR)

Soobin Sinn of Suwon-si (KR)

Yusin Yang of Suwon-si (KR)

Sunhong Jun of Suwon-si (KR)

Ikseon Jeon of Suwon-si (KR)

MATERIAL MEASUREMENT SYSTEM AND METHOD

This abstract first appeared for US patent application 18639332 titled 'MATERIAL MEASUREMENT SYSTEM AND METHOD



Original Abstract Submitted

A measuring system measures an overall resistance of two or more films on a substrate/measurement object by a terahertz absorption measurement and an overall film thickness by a photoacoustic measurement. The system estimates a first film thickness based on the overall resistance, then subtracts this estimated thickness from the overall film thickness measured by the photoacoustic measurement. The system includes a source unit to output a laser beam. A first pump-probe unit receives the laser beam and performs a photoacoustic test on the measurement object. A second pump-probe unit receives the laser beam and performs a terahertz signal test on the measurement object. The system also includes a stage to support the measurement object and controls for controlling elements and calculating the film thicknesses