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18498519. DOUBLE-SIDED CONDUCTIVE VIA (Intel Corporation)

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DOUBLE-SIDED CONDUCTIVE VIA

Organization Name

Intel Corporation

Inventor(s)

Payam Amin of Portland OR US

Mandip Sibakoti of Hillsboro OR US

Bozidar Marinkovic of Portland OR US

Tofizur Rahman of Portland OR US

Conor P. Puls of Portland OR US

DOUBLE-SIDED CONDUCTIVE VIA

This abstract first appeared for US patent application 18498519 titled 'DOUBLE-SIDED CONDUCTIVE VIA

Original Abstract Submitted

A fabrication method and associated integrated circuit (IC) structures and devices that include one or more conductive vias is described herein. In one example, a conductive via is formed from one side of the integrated circuit, and then a portion of the conductive via is widened from a second side of the IC structure opposite the first side. In one example, a resulting IC structure includes a first portion having a first width, a second portion having a second width, and a third portion having a third width, wherein the third portion is between the first portion and the second portion, and the third width is smaller than the first width and the second width. In one such example, the conductive via tapers from both ends towards the third portion between the ends.

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