18215743. INTEGRATED CIRCUIT STRUCTURES WITH INTERNAL SPACER LINERS (Intel Corporation)
INTEGRATED CIRCUIT STRUCTURES WITH INTERNAL SPACER LINERS
Organization Name
Inventor(s)
Leonard P. Guler of Hillsboro OR (US)
Mohammad Hasan of Aloha OR (US)
Charles H. Wallace of Portland OR (US)
INTEGRATED CIRCUIT STRUCTURES WITH INTERNAL SPACER LINERS
This abstract first appeared for US patent application 18215743 titled 'INTEGRATED CIRCUIT STRUCTURES WITH INTERNAL SPACER LINERS
Original Abstract Submitted
Integrated circuit structures having internal spacer liners, and methods of fabricating integrated circuit structures having internal spacer liners, are described. For example, an integrated circuit structure includes a stack of horizontal nanowires. A gate structure is vertically around the stack of horizontal nanowires, the stack of horizontal nanowires extending laterally beyond the gate structure. An internal gate spacer is between vertically adjacent ones of the stack of horizontal nanowires and laterally adjacent to the gate structure. An internal spacer liner is intervening between the internal gate spacer and the vertically adjacent ones of the stack of horizontal nanowires, and the internal spacer liner is intervening between the internal gate spacer and the gate structure.