SEARCH RESULTS for assignor:"LAI, WEI-HAN"

Showing 1 to 4 of 4 results

Last Update Patent(s) Assignor(s) Orig. Assignee(s) Assignee(s) Reel/Frame
31-May-2018

(X0) 1: Extreme Ultraviolet Photoresist and Method

(A1) 2: Extreme Ultraviolet Photoresist and Method

CHEN, YEN-HAO

LAI, WEI-HAN

WANG, CHIEN-WEI

LIN, CHIN-HSIANG

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD

41050/125

01-May-2018

(X0) 1: NOVEL PHOTORESIST ADDITIVE FOR OUTGASSING REDUCTION AND OUT-OF-BAND RADIATION ABSORPTION

(A1) 2: NOVEL PHOTORESIST ADDITIVE FOR OUTGASSING REDUCTION AND OUT-OF-BAND RADIATION ABSORPTION

(B2) 9: NOVEL PHOTORESIST ADDITIVE FOR OUTGASSING REDUCTION AND OUT-OF-BAND RADIATION ABSORPTION

LAI, WEI-HAN

CHANG, CHING-YU

WANG, CHIEN-WEI

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

36743/693

20-Mar-2018

(X0) 1: FUNCTIONAL HEADWEAR

(A1) 2: FUNCTIONAL HEADWEAR

(B2) 9: FUNCTIONAL HEADWEAR

LAI, WEI-SHIN

WOLFE, JASON

LAI, WEI-HAN

ACOUSTICSHEEP LLC

33874/640

20-Mar-2018

(X0) 1: EXTREME ULTRAVIOLET PHOTORESIST

(A1) 2: EXTREME ULTRAVIOLET PHOTORESIST

(B2) 9: EXTREME ULTRAVIOLET PHOTORESIST

LAI, WEI-HAN

CHANG, CHING-YU

WANG, CHIEN-WEI

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD

39132/683