SEARCH RESULTS for assignor:"WANG, MEILIANG"

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(X0) 16255464: High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films

(A1) 20190189431: High Temperature Atomic Layer Deposition of Silicon Oxide Thin Films

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(X0) 15404376: High Temperature Atomic Layer Deposition of Silicon-Containing Films

(A1) 20170207082: High Temperature Atomic Layer Deposition of Silicon-Containing Films

(B2) 1: High Temperature Atomic Layer Deposition of Silicon-Containing Films