US Patent Application 18448963. PARTICLE REMOVER AND METHOD simplified abstract
Contents
PARTICLE REMOVER AND METHOD
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Wen-Hao Cheng of Taichung (TW)
Hsuan-Chih Chu of Changhua (TW)
PARTICLE REMOVER AND METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18448963 titled 'PARTICLE REMOVER AND METHOD
Simplified Explanation
The patent application describes a device for removing particles from a gas stream.
- The device consists of three cylindrical portions.
- The first cylindrical portion receives the gas stream containing both the target gas and the particles.
- Inside the first cylindrical portion, there is a rotatable device that generates a centrifugal force when it rotates.
- This centrifugal force diverts the particles away from the rotatable device.
- The second cylindrical portion receives the target gas after the particles have been diverted.
- The third cylindrical portion surrounds the second cylindrical portion and collects the diverted particles.
Original Abstract Submitted
A device for removing particles in a gas stream includes a first cylindrical portion configured to receive the gas stream containing a target gas and the particles, a rotatable device disposed within the first cylindrical portion and configured to generate a centrifugal force when in a rotational action to divert the particles away from the rotatable device, a second cylindrical portion coupled to the first cylindrical portion and configured to receive the target gas, and a third cylindrical portion coupled to the first cylindrical portion and surrounding the second cylindrical portion, the third cylindrical portion being configured to receive the diverted particles.
Category:B01D45/14 Category:C23C16/455 Category:C23C16/44
