US Patent Application 18365529. SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS simplified abstract
Contents
SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.
Inventor(s)
Wen-Zhan Zhou of Zhubei City (TW)
Heng-Jen Lee of Baoshan Township (TW)
Hsu-Yuan Liu of Zhudong Township (TW)
Yu-Chen Huang of Toufen Township (TW)
Cheng-Han Wu of Taichung City (TW)
Shih-Che Wang of Hsin-Chu City (TW)
Ho-Yung David Hwang of Chu Pei City (TW)
SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18365529 titled 'SYSTEM AND METHOD FOR SUPPLYING AND DISPENSING BUBBLE-FREE PHOTOLITHOGRAPHY CHEMICAL SOLUTIONS
Simplified Explanation
The patent application describes a method for supplying a chemical solution to a photolithography system.
- The chemical solution is pumped from a variable-volume buffer tank.
- The pumped chemical solution is dispensed in a spin-coater.
- To refill the variable-volume buffer tank, a storage container filled with the chemical solution is emptied into it.
Original Abstract Submitted
A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a variable-volume buffer tank. The pumped chemical solution is dispensed in a spin-coater. The variable-volume buffer tank is refilled by emptying a storage container filled with the chemical solution into the variable-volume buffer tank.
