US Patent Application 18362935. DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE simplified abstract

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DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE

Organization Name

Samsung Display Co., LTD.==Inventor(s)==

[[Category:JAESEOL Cho of Seoul (KR)]]

[[Category:CHUNGI You of Asan-si (KR)]]

DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE - A simplified explanation of the abstract

This abstract first appeared for US patent application 18362935 titled 'DISPLAY DEVICE AND METHOD OF MANUFACTURING DISPLAY DEVICE

Simplified Explanation

The patent application describes a display device that includes a substrate with a display area and a pad area, and various electrodes and layers.

  • The display area has a lower electrode consisting of three layers: a first electrode, a second electrode, and a third electrode.
  • The first electrode has a slower etching rate during the etching process.
  • The second electrode, which is on top of the first electrode, has a higher etching rate during the etching process.
  • The third electrode, which is on top of the second electrode, has a lower etching rate than the second electrode but higher than the first electrode.
  • The pad area includes a pad electrode.
  • The light emitting layer is positioned over the first electrode.

Overall, this patent application introduces a display device with specific electrode layers that have different etching rates, allowing for precise control during the manufacturing process.


Original Abstract Submitted

A display device includes a substrate including a display area and a pad area, a lower electrode, a light emitting layer, an upper electrode on the light emitting layer, and a pad electrode in the pad area. The lower electrode is in the display area, the lower electrode including a first electrode, a second electrode, and a third electrode. The first electrode has a first etching rate with respect to an etching process. The second electrode is on the first electrode. The second electrode has a second etching rate with respect to the etching process that is higher than the first etching rate. The third electrode is on the second electrode. The third electrode has a third etching rate with respect to the etching process that is lower than the second etching rate and higher than the first etching rate. The light emitting layer is over the first electrode.