US Patent Application 18360966. METHOD FOR FORMING LIGHT PIPE STRUCTURE WITH HIGH QUANTUM EFFICIENCY simplified abstract
Contents
METHOD FOR FORMING LIGHT PIPE STRUCTURE WITH HIGH QUANTUM EFFICIENCY
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.==Inventor(s)==
[[Category:Tsun-Kai Tsao of Tainan City (TW)]]
[[Category:Jiech-Fun Lu of Madou Township (TW)]]
[[Category:Shih-Pei Chou of Tainan City (TW)]]
[[Category:Tzu-Ming Wang of Tainan City (TW)]]
METHOD FOR FORMING LIGHT PIPE STRUCTURE WITH HIGH QUANTUM EFFICIENCY - A simplified explanation of the abstract
This abstract first appeared for US patent application 18360966 titled 'METHOD FOR FORMING LIGHT PIPE STRUCTURE WITH HIGH QUANTUM EFFICIENCY
Simplified Explanation
- The patent application is about an integrated chip that includes an optical device on a semiconductor substrate. - The chip also has a light guide structure that is positioned over the optical device. - The light guide structure has two etch stop layers, with the first etch stop layer covering the first sidewalls and lower surface of the light guide structure, and the second etch stop layer covering the second sidewalls of the light guide structure.
Original Abstract Submitted
Various embodiments of the present disclosure are directed towards an integrated chip including an optical device within or on a semiconductor substrate. A light guide structure overlies the optical device. A first etch stop layer extends along first sidewalls and a lower surface of the light guide structure. A second etch stop layer overlies the first etch stop layer and extends along second sidewalls of the light guide structure.
