US Patent Application 18356915. TEMPERATURE AND BIAS CONTROL OF EDGE RING simplified abstract
Contents
TEMPERATURE AND BIAS CONTROL OF EDGE RING
Organization Name
Inventor(s)
James Rogers of Los Gatos CA (US)
Linying Cui of Cupertino CA (US)
Rajinder Dhindsa of Pleasanton CA (US)
TEMPERATURE AND BIAS CONTROL OF EDGE RING - A simplified explanation of the abstract
This abstract first appeared for US patent application 18356915 titled 'TEMPERATURE AND BIAS CONTROL OF EDGE RING
Simplified Explanation
- The patent application describes methods and apparatus for controlling the processing result profile near the edge of a substrate during plasma-assisted processing. - The substrate support assembly includes a first base plate and a second base plate, both of which have cooling mechanisms. - The assembly also includes a substrate support and a biasing ring, both made of a dielectric material. - An edge ring biasing electrode is embedded in the dielectric material of the biasing ring. - An edge ring is placed on the biasing ring. - The purpose of this invention is to improve the control and uniformity of processing near the edge of a substrate during plasma-assisted processing.
Original Abstract Submitted
Embodiments described herein provide methods and apparatus used to control a processing result profile proximate to a circumferential edge of a substrate during the plasma-assisted processing thereof. In one embodiment, a substrate support assembly features a first base plate and a second base plate circumscribing the first base plate. The first and second base plates each have one or more respective first and second cooling disposed therein. The substrate support assembly further features a substrate support disposed on and thermally coupled to the first base plate, and a biasing ring disposed on and thermally coupled to the second base plate. Here, the substrate support and the biasing ring are each formed of a dielectric material. The substrate support assembly further includes an edge ring biasing electrode embedded in the dielectric material of the biasing ring and an edge ring disposed on the biasing ring.
