US Patent Application 18356579. COAXIAL LIFT DEVICE WITH DYNAMIC LEVELING simplified abstract
Contents
COAXIAL LIFT DEVICE WITH DYNAMIC LEVELING
Organization Name
Inventor(s)
Jason M. Schaller of Austin TX (US)
Jeffrey Charles Blahnik of Volente TX (US)
Amit Kumar Bansal of Milpitas CA (US)
COAXIAL LIFT DEVICE WITH DYNAMIC LEVELING - A simplified explanation of the abstract
This abstract first appeared for US patent application 18356579 titled 'COAXIAL LIFT DEVICE WITH DYNAMIC LEVELING
Simplified Explanation
- The patent application describes a process chamber with coaxial lift devices. - The device includes a bottom bowl lift and a pedestal lift. - The bottom bowl lift moves the bottom bowl into a position that reduces the process volume. - The bottom bowl lift and the pedestal lift are attached for vacuum operation. - The pedestal lift has multiple actuators to create a dynamic lift mechanism. - The bottom bowl lift is adjustable and can close the bottom bowl, creating a symmetric and small process volume. - The pedestal lift can move independently to its process position and tilt in a desired direction without interference from the bottom bowl lift. - This innovation improves film uniformity on a processed substrate.
Original Abstract Submitted
Embodiments described herein generally relate to process chambers with coaxial lift devices. In some embodiments, the device comprises both a bottom bowl lift and a pedestal lift. The bottom bowl lift supports a bottom bowl and is configured to move the bottom bowl into a position that reduces the process volume. The bottom bowl lift is co-axial with the pedestal lift and the bottom bowl lift and the pedestal lift are attached for vacuum operation. The pedestal lift includes multiple actuators to create a dynamic lift mechanism. Both systems complete a nested system such that the bottom bowl lift is adjustable and can close the bottom bowl creating a symmetric and small process volume. The pedestal lift can move independently to its process position and tilt in a desired direction without interference with the bottom bowl lift, increasing film uniformity on a processed substrate.
