US Patent Application 18351260. Carrier Head Membrane With Regions of Different Roughness simplified abstract
Contents
Carrier Head Membrane With Regions of Different Roughness
Organization Name
Inventor(s)
Young J. Paik of Campbell CA (US)
Ashish Bhatnagar of Fremont CA (US)
Kadthala Ramaya Narendrnath of San Jose CA (US)
Carrier Head Membrane With Regions of Different Roughness - A simplified explanation of the abstract
This abstract first appeared for US patent application 18351260 titled 'Carrier Head Membrane With Regions of Different Roughness
Simplified Explanation
The patent application describes an apparatus used in substrate chemical mechanical polishing.
- The apparatus includes a flexible membrane that is used with a carrier head.
- The membrane has an outer surface that acts as a substrate receiving surface.
- The outer surface is divided into a central portion and an edge portion.
- The central portion has a higher surface roughness compared to the edge portion.
- The purpose of this design is to provide different levels of surface roughness for different areas of the substrate.
- This can help improve the polishing process by optimizing the contact between the substrate and the membrane.
- The innovation lies in the specific design of the membrane with varying surface roughness.
Original Abstract Submitted
An apparatus comprises a flexible membrane for use with a carrier head of a substrate chemical mechanical polishing apparatus. The membrane comprises an outer surface providing a substrate receiving surface, wherein the outer surface has a central portion and an edge portion surrounding the central portion, wherein the central portion has a first surface roughness and the edge portion has a second surface roughness, the first surface roughness being greater than the second surface roughness.
