US Patent Application 18251077. PLASMA PROCESSING APPARATUS simplified abstract
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Contents
PLASMA PROCESSING APPARATUS
Organization Name
Inventor(s)
Haruhiko Himura of Kyoto-shi, Kyoto (JP)
PLASMA PROCESSING APPARATUS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18251077 titled 'PLASMA PROCESSING APPARATUS
Simplified Explanation
The patent application describes a plasma processing apparatus used for plasma processing on a substrate.
- The apparatus includes a processing vessel where the substrate is placed.
- A plasma forming device is used to generate plasma within the processing vessel.
- A focusing device is placed inside the processing vessel and is responsible for concentrating multiple ions in the plasma to create an ion beam.
- A sorting device is used to separate a specific ion from the ion beam generated by the focusing device.
- The specific ion is then supplied to the substrate for the plasma processing.
- The invention aims to improve the efficiency and accuracy of plasma processing by focusing and sorting ions in the plasma.
Original Abstract Submitted
A plasma processing apparatus includes a processing vessel in which a substrate as a target of a plasma processing is disposed; a plasma forming device configured to form plasma within the processing vessel; a focusing device disposed within the processing vessel, and configured to focus multiple ions in the plasma to output an ion beam; and a sorting device configured to sort out, from the ion beam outputted from the focusing device, a specific ion to be supplied to the substrate.
