US Patent Application 18248567. CULTURE APPARATUS AND CULTURE METHOD simplified abstract
Contents
CULTURE APPARATUS AND CULTURE METHOD
Organization Name
Inventor(s)
Yuki Tabata of Kariya-shi (JP)
Isao Otsubo of Kariya-shi (JP)
Akiyoshi Hirano of Kariya-shi (JP)
CULTURE APPARATUS AND CULTURE METHOD - A simplified explanation of the abstract
This abstract first appeared for US patent application 18248567 titled 'CULTURE APPARATUS AND CULTURE METHOD
Simplified Explanation
The patent application describes a culture apparatus that generates fine water particles for supplying moisture into a culture space.
- The apparatus includes a cartridge that absorbs moisture from the air using conductive polymer films.
- The cartridge can switch between a moisture absorption state and a moisture release state.
- In the moisture absorption state, the cartridge adsorbs moisture from the air by reducing the temperature of the base material.
- In the moisture release state, the cartridge releases fine water particles with a size of 50 nanometers or less by increasing the temperature of the base material.
- The apparatus also includes a control part that regulates the moisture absorption and release processes.
- The control part brings the cartridge into the moisture absorption state to absorb moisture and into the moisture release state to release the fine water particles into the culture space.
- The fine water particles can be used to irradiate a subject in the culture space.
Original Abstract Submitted
A culture apparatus includes a fine water generating cartridge disposed in an air passage by which moisture is supplied into a culture space and that goes into a moisture absorption state in which moisture in air is adsorbed on conductive polymer films by reducing the temperature of a base material having the conductive polymer films, and goes into a moisture release state in which fine water with a particle size of 50 nanometers or less is released from the moisture adsorbed on the conductive polymer films by increasing the temperature of the base material; and a control part performing moisture absorption control bringing the fine water generating cartridge into the moisture absorption state, and moisture release control releasing the fine water by bringing the fine water generating cartridge into the moisture release state supplied into the culture space, by irradiating the subject with the fine water.
