US Patent Application 18224206. ALD CYCLE TIME REDUCTION USING PROCESS CHAMBER LID WITH TUNABLE PUMPING simplified abstract
Contents
ALD CYCLE TIME REDUCTION USING PROCESS CHAMBER LID WITH TUNABLE PUMPING
Organization Name
Inventor(s)
Muhannad Mustafa of Milpitas CA (US)
Muhammad M. Rasheed of San Jose CA (US)
Mario D. Sanchez of San Jose CA (US)
Anqing Cui of Palo Alto CA (US)
ALD CYCLE TIME REDUCTION USING PROCESS CHAMBER LID WITH TUNABLE PUMPING - A simplified explanation of the abstract
This abstract first appeared for US patent application 18224206 titled 'ALD CYCLE TIME REDUCTION USING PROCESS CHAMBER LID WITH TUNABLE PUMPING
Simplified Explanation
- The patent application describes process chamber lids that have a pumping liner with a showerhead and gas funnel within an open central region. - The showerhead and gas funnel are spaced apart to create a gap, and the gas funnel has an opening to allow gas to flow into the gap. - The gas funnel has multiple apertures that extend from the front surface to a common region near the back surface. - A purge ring is in contact with the back surface of the gas funnel and has a circular channel on its bottom surface that aligns with the common area of the apertures. - The purpose of this design is to provide an improved gas flow distribution within the process chamber. - The gap between the showerhead and gas funnel allows for better mixing of the gas, leading to more uniform processing. - The apertures in the gas funnel and the circular channel in the purge ring help to evenly distribute the gas flow across the process chamber. - This innovation aims to enhance the efficiency and effectiveness of processes carried out in the process chamber.
Original Abstract Submitted
Process chamber lids having a pumping liner with a showerhead and gas funnel within an open central region are described. The showerhead is spaced a distance from the gas funnel to form a gap and the gas funnel has an opening to provide a flow of gas into the gap. The gas funnel includes a plurality of apertures extending from the front surface to a common region adjacent the back surface of the gas funnel. A purge ring is in contact with the back surface of the gas funnel and aligned so that a circular channel formed in the bottom surface of the purge ring body is positioned adjacent the common area of the apertures in the gas funnel.
