US Patent Application 18201551. BOLOMETER AND METHOD FOR MANUFACTURING SAME simplified abstract

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BOLOMETER AND METHOD FOR MANUFACTURING SAME

Organization Name

NEC Corporation

Inventor(s)

Mayumi Kosaka of Tokyo (JP)

BOLOMETER AND METHOD FOR MANUFACTURING SAME - A simplified explanation of the abstract

This abstract first appeared for US patent application 18201551 titled 'BOLOMETER AND METHOD FOR MANUFACTURING SAME

Simplified Explanation

The patent application describes a bolometer with improved temperature coefficient of resistance (TCR).

  • The bolometer includes two electrodes on a substrate and a bolometer film connecting the electrodes.
  • The bolometer film contains p-type semiconducting carbon nanotubes.
  • The contact sites of the electrodes with the bolometer film consist of a monometal or alloy with higher work function than the carbon nanotubes.
  • The proportion of a monometal or alloy with lower work function in the contact sites is 10% or less.
  • The contact area of a monometal or alloy with lower work function with the bolometer film is 10% or less of the total contact area.


Original Abstract Submitted

One object of the present invention is to provide a bolometer with improved TCR. The present invention relates to a bolometer including two electrodes provided on a substrate and a bolometer film lying between the two electrodes to connect the two electrodes, wherein the bolometer film includes p-type semiconducting carbon nanotubes, and contact sites of the two electrodes with the bolometer film each consist only of a monometal or alloy having higher work function than the p-type semiconducting carbon nanotubes, or the proportion of a monometal or alloy having lower work function than the p-type semiconducting carbon nanotubes in metals constituting the contact sites of the two electrodes with the bolometer film is 10% by mass or less, or the contact area of a monometal or alloy having lower work function than the p-type semiconducting carbon nanotubes with the bolometer film is 10% or less of the total contact area between the electrodes and the bolometer film.

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