US Patent Application 18199625. OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS simplified abstract
OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS
Organization Name
Inventor(s)
Pravin K. Narwankar of Sunnyvale CA (US)
OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS - A simplified explanation of the abstract
This abstract first appeared for US patent application 18199625 titled 'OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS
Simplified Explanation
- The patent application is about coated drug compositions and how to prepare them using a low temperature o-zone based silicon oxide coating. - The method involves coating active pharmaceutical ingredient particles using a silicon precursor and ozone. - The coating process is done at a low temperature. - The purpose of the coating is to enhance the drug's effectiveness or stability. - The patent application provides a specific method for achieving this coating.
Original Abstract Submitted
This disclosure pertains to coated drug compositions and methods of preparing coated drug compositions with a low temperature o-zone based silicon oxide coating. Specifically, the instant application discloses a method to coat active pharmaceutical ingredient particles using a silicon precursor and ozone at a low temperature.
