US Patent Application 18199625. OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS simplified abstract

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OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS

Organization Name

Applied Materials, Inc.


Inventor(s)

Fei Wang of Fremont CA (US)

Geetika Bajaj of Mumbai (IN)

Pravin K. Narwankar of Sunnyvale CA (US)

OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS - A simplified explanation of the abstract

This abstract first appeared for US patent application 18199625 titled 'OZONE-BASED LOW TEMPERATURE SILICON OXIDE COATING FOR PHARMACEUTICAL APPLICATIONS

Simplified Explanation

- The patent application is about coated drug compositions and how to prepare them using a low temperature o-zone based silicon oxide coating. - The method involves coating active pharmaceutical ingredient particles using a silicon precursor and ozone. - The coating process is done at a low temperature. - The purpose of the coating is to enhance the drug's effectiveness or stability. - The patent application provides a specific method for achieving this coating.


Original Abstract Submitted

This disclosure pertains to coated drug compositions and methods of preparing coated drug compositions with a low temperature o-zone based silicon oxide coating. Specifically, the instant application discloses a method to coat active pharmaceutical ingredient particles using a silicon precursor and ozone at a low temperature.