US Patent Application 17977018. GRINDING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME simplified abstract

From WikiPatents
Jump to navigation Jump to search

GRINDING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

Organization Name

Samsung Electronics Co., Ltd.


Inventor(s)

Junghyun Roh of Suwon-si (KR)


Jongguw Kim of Suwon-si (KR)


Wangsun Lim of Suwon-si (KR)


Manhee Han of Suwon-si (KR)


Jaeyoung Hong of Suwon-si (KR)


GRINDING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME - A simplified explanation of the abstract

  • This abstract for appeared for US patent application number 17977018 Titled 'GRINDING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME'

Simplified Explanation

The abstract describes a grinding apparatus and a method for manufacturing a semiconductor device using the apparatus. The grinding apparatus consists of a chuck unit that holds the substrate, a grinding unit that grinds the substrate, and a dressing unit located beneath the grinding unit. The dressing unit includes a dressing board that is used to maintain the condition of the grinding unit, and magnets are placed under the dressing board.


Original Abstract Submitted

A grinding apparatus and a method for manufacturing a semiconductor device using the same are provided. A griding apparatus includes a chuck unit configured to receive a substrate, a grinding unit on a part of the chuck unit and configured to grind the substrate, and a dressing unit under a part of the grinding unit adjacent to the chuck unit and including a dressing board configured to dress the grinding unit and magnets under the dressing board.