US Patent Application 17828123. SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF simplified abstract

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Organization Name

Taiwan Semiconductor Manufacturing Company, Ltd.==Inventor(s)==

[[Category:Jhon-Jhy Liaw of Zhudong Township (TW)]]

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A simplified explanation of the abstract

This abstract first appeared for US patent application 17828123 titled 'SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Simplified Explanation

- The patent application is about semiconductor devices. - It describes a write port circuit that performs a write function based on specific input lines. - There are also two read port circuits that perform read functions based on different input lines. - The transistors in the read port circuits share a common structure that extends in a specific direction. - The read and write bit lines are arranged in different metallization layers and extend in the same direction. - The innovation aims to provide an improved design for semiconductor devices with efficient read and write operations.

Original Abstract Submitted

Semiconductor devices are provided. A write port circuit is configured to perform a write function according to the write word line and the first and second write bit lines. The first read port circuit is configured to perform first read function according to the first read bit line and the first read word line. The second read port circuit is configured to perform second read function according to the second read bit line and the second read word line. The transistors of the first and second read port circuits share a first active structure extending in the first direction. The first read bit line and the second read bit line extend in the first direction in a first metallization layer, and the first write bit line and the second write bit line extend in the first direction in a second metallization layer over the first metallization layer.