US Patent Application 17824926. WET PROCESSING SYSTEM AND SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE simplified abstract

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WET PROCESSING SYSTEM AND SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

Organization Name

TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

Inventor(s)

YING-CHIEH Meng of TAICHUNG CITY (TW)

WET PROCESSING SYSTEM AND SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE - A simplified explanation of the abstract

This abstract first appeared for US patent application 17824926 titled 'WET PROCESSING SYSTEM AND SYSTEM AND METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE

Simplified Explanation

The patent application describes a semiconductor structure manufacturing system.

  • The system includes a load lock chamber, first chambers, second chambers, and a first robot.
  • The load lock chamber is used to store wafers that need to be processed.
  • The first chambers are responsible for processing the wafers and each has first stage plates to support the wafers.
  • The second chambers are designed to process a single wafer and have a second stage plate for support.
  • The first robot is responsible for transporting the wafers from the load lock chamber to the first chambers.
  • The first robot is positioned between the first chambers, second chambers, and load lock chamber.


Original Abstract Submitted

A semiconductor structure manufacturing system is provided. The system includes a load lock chamber, first chambers, second chambers and a first robot. The load lock chamber is configured to store wafers that are to be processed. The first chambers are configured to process the wafers. Each of the first chambers has first stage plates for supporting the wafers. The second chambers are configured to process a single wafer. Each of the second chambers has a second stage plate for supporting a wafer. The first robot is configured to transport the wafers from the load lock chamber to the first chambers. The first robot is arranged between the first chambers, the second chambers and the load lock chamber.

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