US Patent Application 17752662. MEMORY DEVICE WITH REDUCED AREA simplified abstract
Contents
MEMORY DEVICE WITH REDUCED AREA
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.==Inventor(s)==
[[Category:Chun-Ying Lee of Hsinchu City (TW)]]
[[Category:Chia-En Huang of Xinfeng Township (TW)]]
[[Category:Chieh Lee of Hsinchu City (TW)]]
MEMORY DEVICE WITH REDUCED AREA - A simplified explanation of the abstract
This abstract first appeared for US patent application 17752662 titled 'MEMORY DEVICE WITH REDUCED AREA
Simplified Explanation
The patent application is for a memory device that has multiple word lines (WLs).
- The memory device includes several drivers, each controlling a specific WL.
- Each driver consists of two transistors, one with a first conductive type and the other with a second conductive type.
- The first transistor of the first driver is located in a first well of the substrate.
- The second transistor of the first driver is located in a second well of the substrate.
- The first well and the second well are separated from each other.
Original Abstract Submitted
A memory device includes a plurality of word lines (WLs). The memory device includes a plurality of drivers that are each configured to control a corresponding one of the plurality of WLs and each comprise a first transistor having a first conductive type and a second transistor having a second conductive type. The first transistor of a first one of the drivers is formed in a first well of a substrate, and the second transistor of the first driver is formed in a second well of the substrate. The first well is spaced apart from the second well.