US Patent Application 17739856. CONFORMAL METAL DICHALCOGENIDES simplified abstract
Contents
CONFORMAL METAL DICHALCOGENIDES
Organization Name
Inventor(s)
Susmit Singha Roy of Campbell CA (US)
Supriya Ghosh of San Jose CA (US)
John Sudijono of Singapore (SG)
Abhijit Basu Mallick of Sunnyvale CA (US)
Jiecong Tang of Singapore (SG)
CONFORMAL METAL DICHALCOGENIDES - A simplified explanation of the abstract
This abstract first appeared for US patent application 17739856 titled 'CONFORMAL METAL DICHALCOGENIDES
Simplified Explanation
- The patent application describes transition metal dichalcogenide films and methods for depositing them on a substrate. - It also describes methods for converting transition metal oxide films to transition metal dichalcogenide films. - The process involves exposing the substrate to a metal precursor and an oxidant to form a transition metal oxide film. - Then, the transition metal oxide film is exposed to a chalcogenide precursor to form the transition metal dichalcogenide film.
Original Abstract Submitted
Transition metal dichalcogenide films and methods for depositing transition metal dichalcogenide films on a substrate are described. Methods for converting transition metal oxide films to transition metal dichalcogenide films are also described. The substrate is exposed to a metal precursor and an oxidant to form a transition metal oxide film; the transition metal oxide film is exposed to a chalcogenide precursor to form the transition metal dichalcogenide film.
