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• Tokyo electron limited (20250073916). MAINTENANCE DEVICE
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  143 bytes (15 words) - 03:12, 11 March 2025
• 18557744. CONTAINER simplified abstract (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  4 KB (512 words) - 04:29, 8 July 2024
• 18741841. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  2 KB (232 words) - 07:31, 19 December 2024
• 18754488. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  1 KB (168 words) - 08:39, 18 February 2025
• 18755946. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  1 KB (200 words) - 08:39, 18 February 2025
• 18957942. SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  2 KB (268 words) - 04:33, 15 March 2025
• 18367306. EXPANDABLE WAFER BONDER (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  1 KB (198 words) - 04:33, 15 March 2025
• 18939729. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  1 KB (197 words) - 09:53, 17 March 2025
• 18963762. SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  2 KB (231 words) - 05:20, 24 March 2025
• 18973637. FILM FORMING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  1 KB (161 words) - 05:41, 31 March 2025
• 18893142. SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  1 KB (141 words) - 05:41, 31 March 2025
• 18730100. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  2 KB (216 words) - 05:42, 31 March 2025
• 18974589. Plasma Processing Device (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  1 KB (179 words) - 05:42, 31 March 2025
• 18975131. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  1 KB (150 words) - 05:42, 31 March 2025
• 18976345. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  2 KB (296 words) - 05:42, 31 March 2025
• 18600829. TRANSFER APPARATUS simplified abstract (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  4 KB (514 words) - 06:35, 28 June 2024
• TOKYO ELECTRON LIMITED Patent Application Trends in 2024
  == TOKYO ELECTRON LIMITED Patent Filing Activity == == TOKYO ELECTRON LIMITED patent applications in 2024 == ...
  28 KB (3,886 words) - 02:39, 18 July 2024
• Tokyo Electron Limited Patent Application Trends in 2024
  == Tokyo Electron Limited Patent Filing Activity == == Tokyo Electron Limited patent applications in 2024 == ...
  30 KB (4,070 words) - 09:05, 19 July 2024
• 18668416. FILTER CIRCUIT simplified abstract (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  3 KB (376 words) - 07:13, 19 September 2024
• 18891961. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited)
  [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] [[Category:Tokyo Electron Limited]] ...
  1 KB (142 words) - 08:39, 18 February 2025

Page text matches

• Tokyo electron limited (20250079166). METHODS FOR PROTECTING TO REUSE SILICON CARRIER WAFER BASED ON IR LASER LIFT-OFF PROCESS
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  213 bytes (27 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250075322). METHOD OF MONITORING LIQUID RAW MATERIAL AND GAS SUPPLY DEVICE
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  187 bytes (23 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250075319). SUBSTRATE PROCESSING APPARATUS AND METHOD OF SUPPRESSING OXYGEN INCORPORATION
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  202 bytes (22 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250079138). SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  188 bytes (22 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250076771). Methods for Extreme Ultraviolet (EUV) Resist Patterning Development
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  192 bytes (21 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250079128). PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  190 bytes (22 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250079180). METHODS FOR WET ATOMIC LAYER ETCHING OF MOLYBDENUM
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  175 bytes (21 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250079139). IGNITION CONTROL METHOD AND SUBSTRATE PROCESSING APPARATUS
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  183 bytes (20 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250079184). SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING THE SAME
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  184 bytes (21 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250076757). TREATMENTS FOR METAL OXIDE PHOTORESIST FILMS
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  169 bytes (19 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250079178). REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  174 bytes (20 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250075316). METHOD FOR FORMING INSULATION FILM
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  159 bytes (18 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250076232). Inspection Apparatus and Mounting Base
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  163 bytes (18 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250081551). 3D COMB NANOSHEET AND PI/2 ROTATED NANOSHEET
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  169 bytes (20 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250079181). METHOD TO SELECTIVELY ETCH SILICON NITRIDE TO SILICON OXIDE USING SURFACE ALKYLATION
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  209 bytes (25 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250076843). INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING METHOD, AND SEMICONDUCTOR MANUFACTURING SYSTEM
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  228 bytes (23 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250079216). SUBSTRATE HOLDER, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE TRANSFER METHOD
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  204 bytes (22 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250079217). SUBSTRATE HOLDER, SUBSTRATE PROCESSING SYSTEM, AND SUBSTRATE TRANSFER METHOD
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  201 bytes (22 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250081552). 3D SPACER NANOSHEET FORMATION
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  154 bytes (17 words) - 03:12, 11 March 2025
• Tokyo electron limited (20250076028). FILM THICKNESS ANALYSIS METHOD, FILM THICKNESS ANALYSIS DEVICE AND STORAGE MEDIUM
  [[:Category:tokyo electron limited|tokyo electron limited]] [[Category:tokyo electron limited]] ...
  206 bytes (24 words) - 03:12, 11 March 2025