D2S, Inc. Patent Application Trends in 2025
D2S, Inc. Patent Filing Activity
D2S, Inc. patent applications in 2025
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Top 10 Technology Areas
- G06F30/398 (Circuit design at the physical level (physical level design for reconfigurable circuits)
- Count: 6 patents
- Example: 20250068051. MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS (D2S, Inc.)
- G03F1/36 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 3 patents
- Example: 20250068051. MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS (D2S, Inc.)
- G06F2119/18 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models)
- Count: 3 patents
- Example: 20250068051. MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS (D2S, Inc.)
- G06F30/31 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models)
- Count: 3 patents
- Example: 20250068808. GENERATION OF 3-D SHAPES FOR EDA OPERATIONS (D2S, Inc.)
- G03F1/70 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 2 patents
- Example: 20250068056. MASK OPTIMIZATION FOR LAYER ACCOUNTING FOR OVERLAP WITH OTHER LAYERS (D2S, Inc.)
- G06N3/08 (Learning methods)
- Count: 2 patents
- Example: 20250068810. GENERATION OF 3-D SHAPES FOR EDA OPERATIONS (D2S, Inc.)
- G03F1/72 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 1 patents
- Example: 20250068058. ITERATIVE MASK OPTIMIZATION BIASED TOWARDS CRITICAL REGIONS OF LAYOUT (D2S, Inc.)
- G06F30/392 (Floor-planning or layout, e.g. partitioning or placement)
- Count: 1 patents
- Example: 20250068809. GENERATION OF 3-D SHAPES FOR EDA OPERATIONS (D2S, Inc.)
- G06F2119/06 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models)
- Count: 1 patents
- Example: 20250068824. HIGH ACCURACY PARASITICS EXTRACTION (D2S, Inc.)
Emerging Technology Areas
- G06F2119/06 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models)
- Count: 1 patents
- Example: 20250068824. HIGH ACCURACY PARASITICS EXTRACTION (D2S, Inc.)
- G06F30/392 (Floor-planning or layout, e.g. partitioning or placement)
- Count: 1 patents
- Example: 20250068809. GENERATION OF 3-D SHAPES FOR EDA OPERATIONS (D2S, Inc.)
- G03F1/72 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 1 patents
- Example: 20250068058. ITERATIVE MASK OPTIMIZATION BIASED TOWARDS CRITICAL REGIONS OF LAYOUT (D2S, Inc.)
- G06N3/08 (Learning methods)
- Count: 2 patents
- Example: 20250068810. GENERATION OF 3-D SHAPES FOR EDA OPERATIONS (D2S, Inc.)
- G03F1/70 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 2 patents
- Example: 20250068056. MASK OPTIMIZATION FOR LAYER ACCOUNTING FOR OVERLAP WITH OTHER LAYERS (D2S, Inc.)
- G06F30/31 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models)
- Count: 3 patents
- Example: 20250068808. GENERATION OF 3-D SHAPES FOR EDA OPERATIONS (D2S, Inc.)
- G06F2119/18 (ELECTRIC DIGITAL DATA PROCESSING (computer systems based on specific computational models)
- Count: 3 patents
- Example: 20250068051. MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS (D2S, Inc.)
- G03F1/36 (PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices)
- Count: 3 patents
- Example: 20250068051. MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS (D2S, Inc.)
- G06F30/398 (Circuit design at the physical level (physical level design for reconfigurable circuits)
- Count: 6 patents
- Example: 20250068051. MASK OPTIMIZATION FOR FIRST LAYER THAT ACCOUNTS FOR OTHER LAYERS (D2S, Inc.)
Top Inventors
- Donald Oriordan of Sunnyvale CA (US) (12 patents)
- Akira Fujimura of Saratoga CA (US) (11 patents)
Patent Categories
Geographical Distribution of Inventors
