US Patent Application 18447871. Semiconductor Device Having Backside Interconnect Structure on Through Substrate Via simplified abstract
Contents
Semiconductor Device Having Backside Interconnect Structure on Through Substrate Via
Organization Name
Taiwan Semiconductor Manufacturing Company, Ltd.==Inventor(s)==
[[Category:Yung-Chi Lin of Su-Lin City (TW)]]
[[Category:Hsin-Yu Chen of Taipei City (TW)]]
[[Category:Ming-Tsu Chung of Hsinchu (TW)]]
[[Category:HsiaoYun Lo of Hsinchu (TW)]]
[[Category:Hong-Ye Shih of New Taipei City (TW)]]
[[Category:Chia-Yin Chen of Hsinchu (TW)]]
[[Category:Ku-Feng Yang of Baoshan Township (TW)]]
[[Category:Tsang-Jiuh Wu of Hsinchu (TW)]]
[[Category:Wen-Chih Chiou of Zhunan Township (TW)]]
Semiconductor Device Having Backside Interconnect Structure on Through Substrate Via - A simplified explanation of the abstract
This abstract first appeared for US patent application 18447871 titled 'Semiconductor Device Having Backside Interconnect Structure on Through Substrate Via
Simplified Explanation
The patent application describes a semiconductor device with a through-substrate via that extends from the frontside to the backside of a semiconductor substrate. The via has a concave or convex portion near the backside of the substrate.
- Through-substrate via extends from frontside to backside of semiconductor substrate
- Via has concave or convex portion near backside of substrate
- Isolation film is formed on the backside of the substrate
- Conductive layer has a first portion on the concave or convex portion of the via and a second portion on the isolation film
- Passivation layer partially covers the conductive layer
Original Abstract Submitted
A semiconductor device includes a through-substrate via extending from a frontside to a backside of a semiconductor substrate. The through-substrate via includes a concave or a convex portion adjacent to the backside of the semiconductor substrate. An isolation film is formed on the backside of the semiconductor substrate. A conductive layer includes a first portion formed on the concave or convex portion of the through substrate via and a second portion formed on the isolation film. A passivation layer partially covers the conductive layer.