18974589. Plasma Processing Device (Tokyo Electron Limited)

Plasma Processing Device

Organization Name

Tokyo Electron Limited

Inventor(s)

Taro Ikeda of Yamanashi JP

Toshifumi Kitahara of Tokyo JP

Plasma Processing Device

This abstract first appeared for US patent application 18974589 titled 'Plasma Processing Device

Original Abstract Submitted

A plasma processing apparatus comprises a processing chamber, a waveguide, an electrode, an electromagnetic wave emission part and a multipactor discharge part. A plasma generation space is formed in the processing chamber. Electromagnetic waves for generating plasma are applied to the electrode. The waveguide is disposed along an outer circumference of the electrode. The electromagnetic wave emission part is made of a dielectric material and configured to emit the electromagnetic waves into the plasma generation space. The multipactor discharge part is a gap formed between the electrode and the electromagnetic wave emission part and faces the plasma generation space.