18974589. Plasma Processing Device (Tokyo Electron Limited)
Plasma Processing Device
Organization Name
Inventor(s)
Toshifumi Kitahara of Tokyo JP
Plasma Processing Device
This abstract first appeared for US patent application 18974589 titled 'Plasma Processing Device
Original Abstract Submitted
A plasma processing apparatus comprises a processing chamber, a waveguide, an electrode, an electromagnetic wave emission part and a multipactor discharge part. A plasma generation space is formed in the processing chamber. Electromagnetic waves for generating plasma are applied to the electrode. The waveguide is disposed along an outer circumference of the electrode. The electromagnetic wave emission part is made of a dielectric material and configured to emit the electromagnetic waves into the plasma generation space. The multipactor discharge part is a gap formed between the electrode and the electromagnetic wave emission part and faces the plasma generation space.
