18885134. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited)
Plasma Source and Plasma Processing Apparatus
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Plasma Source and Plasma Processing Apparatus
This abstract first appeared for US patent application 18885134 titled 'Plasma Source and Plasma Processing Apparatus
Original Abstract Submitted
Provided is a plasma source comprising: a housing that defines a plasma generation space; a gas inlet port disposed in the housing to introduce a gas; a supply port disposed in the housing to supply active species of plasma produced from the gas in the plasma generation space; an ignition power supply port disposed in the housing to supply a radio-frequency (RF) power for igniting the plasma in the plasma generation space; and a maintenance power supply port disposed in the housing to supply the RF power for maintaining the plasma ignited in the plasma generation space.
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