18885134. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited)
Plasma Source and Plasma Processing Apparatus
Organization Name
Inventor(s)
Plasma Source and Plasma Processing Apparatus
This abstract first appeared for US patent application 18885134 titled 'Plasma Source and Plasma Processing Apparatus
Original Abstract Submitted
Provided is a plasma source comprising: a housing that defines a plasma generation space; a gas inlet port disposed in the housing to introduce a gas; a supply port disposed in the housing to supply active species of plasma produced from the gas in the plasma generation space; an ignition power supply port disposed in the housing to supply a radio-frequency (RF) power for igniting the plasma in the plasma generation space; and a maintenance power supply port disposed in the housing to supply the RF power for maintaining the plasma ignited in the plasma generation space.
(Ad) Transform your business with AI in minutes, not months
✓
Custom AI strategy for your specific industry
✓
Step-by-step implementation with clear ROI
✓
5-minute setup - no technical skills needed
