Plasma Technology Patent Application Trends 2025

Plasma Technology patent applications in 2025

Top Technology Areas in Plasma Technology

Top CPC Codes

• H01J2237/334 (No explanation available)
  • Count: 17 patents
  • Example: 20250037979. RESILIENT RELEASE LAYER FOR LITHIUM FILM TRANSFER AND ATMOSPHERIC PLASMA ASSISTED REMOVAL OF RESIDUAL RELEASE LAYER (Applied Materials, Inc.)
• H01J37/32146 (No explanation available)
  • Count: 13 patents
  • Example: 20250069851. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited)
• H01J37/32449 (No explanation available)
  • Count: 11 patents
  • Example: 20250037977. APPARATUS AND METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01J37/32715 (No explanation available)
  • Count: 11 patents
  • Example: 20250037977. APPARATUS AND METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01J37/32183 (No explanation available)
  • Count: 10 patents
  • Example: 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.)
• H01J37/3244 (No explanation available)
  • Count: 10 patents
  • Example: 20250069858. PLASMA PROCESSING APPARATUS AND CONTROL METHOD THEREFOR (ULVAC, INC.)
• H01L21/3065 (No explanation available)
  • Count: 10 patents
  • Example: 20250006537. Plasma Etching Method and Apparatus (SPTS Technologies Limited)
• H01J37/32642 (No explanation available)
  • Count: 7 patents
  • Example: 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• H01L21/31116 (No explanation available)
  • Count: 7 patents
  • Example: 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01J37/32174 (No explanation available)
  • Count: 7 patents
  • Example: 20250006516. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)

Top Companies in Plasma Technology 2025

Tokyo Electron Limited

• Number of Plasma Technology patents: 28
• Top CPC codes:
  • H01J37/32715 (No explanation available): 8 patents
  • H01J37/32146 (No explanation available): 8 patents
  • H01J37/32449 (No explanation available): 7 patents
• Recent patents:
  • 20250014866. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20250109)
  • 20250014872. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)
  • 20250014874. ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)

Applied Materials, Inc.

• Number of Plasma Technology patents: 7
• Top CPC codes:
  • H01J37/32183 (No explanation available): 2 patents
  • H01J2237/334 (No explanation available): 2 patents
  • H01J2237/327 (No explanation available): 2 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250022697. PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY (Applied Materials, Inc.) (20250116)
  • 20250062131. PLASMA ETCHING IN SEMICONDUCTOR PROCESSING (Applied Materials, Inc.) (20250220)

Taiwan Semiconductor Manufacturing Company, Ltd.

• Number of Plasma Technology patents: 4
• Top CPC codes:
  • H01L29/66545 (No explanation available): 2 patents
  • H01L21/3065 (No explanation available): 2 patents
  • G03F1/82 (No explanation available): 1 patents
• Recent patents:
  • 20250022715. PLASMA ETCHING PROCESSES (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250116)
  • 20250079177. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250306)
  • 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250109)

Hitachi High-Tech Corporation

• Number of Plasma Technology patents: 3
• Top CPC codes:
  • H01J2237/334 (No explanation available): 2 patents
  • H01J37/32834 (No explanation available): 1 patents
  • H01J37/3244 (No explanation available): 1 patents
• Recent patents:
  • 20250069867. PLASMA PROCESSING APPARATUS AND GAS EXHAUST METHOD (Hitachi High-Tech Corporation) (20250227)
  • 20250046580. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250206)
  • 20250046582. REGENERATING METHOD FOR INNER MEMBER OF PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250206)

HITACHI HIGH-TECH CORPORATION

• Number of Plasma Technology patents: 3
• Top CPC codes:
  • H01J2237/3341 (No explanation available): 2 patents
  • H01J37/32697 (No explanation available): 2 patents
  • H01J37/32715 (No explanation available): 2 patents
• Recent patents:
  • 20250046620. PLASMA PROCESSING METHOD (HITACHI HIGH-TECH CORPORATION) (20250206)
  • 20250079136. PLASMA PROCESSING METHOD (HITACHI HIGH-TECH CORPORATION) (20250306)
  • 20250029818. PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE (HITACHI HIGH-TECH CORPORATION) (20250123)

ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/32082 (No explanation available): 1 patents
  • H01J37/32513 (No explanation available): 1 patents
  • H01J37/32568 (No explanation available): 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)
  • 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250109)

SAMSUNG ELECTRONICS CO., LTD.

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/32642 (No explanation available): 2 patents
  • H01J2237/2007 (No explanation available): 2 patents
  • H01J2237/202 (No explanation available): 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Panasonic Intellectual Property Management Co., Ltd.

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/3211 (No explanation available): 2 patents
  • H01J2237/334 (No explanation available): 2 patents
  • H01J37/3299 (No explanation available): 1 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Research & Business Foundation SUNGKYUNKWAN UNIVERSITY

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • A61K9/1271 (No explanation available): 1 patents
  • B01J19/087 (No explanation available): 1 patents
  • H01J37/32422 (No explanation available): 1 patents
• Recent patents:
  • 20250009661. PLASMA COATING METHOD OF NANOVESICLE SURFACE AND PLASMA JET DEVICE FOR PLASMA COATING OF NANOVESICLE SURFACE (Research & Business Foundation SUNGKYUNKWAN UNIVERSITY) (20250109)
  • 20250014868. ETCHING PLASMA PROCESSING APPARATUS INCLUDING CONSUMABLE METAL MEMBER (Research & Business Foundation SUNGKYUNKWAN UNIVERSITY) (20250109)

Impinj, Inc.

• Number of Plasma Technology patents: 1
• Top CPC codes:
  • H01L24/05 (No explanation available): 1 patents
  • G06K19/07722 (No explanation available): 1 patents
  • H01L24/03 (No explanation available): 1 patents
• Recent patents:
  • 20250038139. ADHESIVE ATTACHMENT OF PLASMA-ETCH-DICED RFID INTEGRATED CIRCUITS WITH STRUCTURAL SUPPORT (Impinj, Inc.) (20250130)

New Companies in Plasma Technology (Last Month)

File:New Companies in Plasma Technology Last Month.png

No new companies detected in the last month.

Emerging Technology Areas in Plasma Technology

• H01L29/7851 (No explanation available)
  • Count: 1 patents
  • Example: 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.)
• H01L29/66795 (No explanation available)
  • Count: 1 patents
  • Example: 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.)
• H01J37/32981 (No explanation available)
  • Count: 1 patents
  • Example: 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.)
• C23C28/042 (No explanation available)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• C23C14/46 (No explanation available)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• C23C14/30 (No explanation available)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• C23C14/26 (No explanation available)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• C23C14/0694 (No explanation available)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• C23C14/083 (No explanation available)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• B01J19/087 (No explanation available)
  • Count: 1 patents
  • Example: 20250009661. PLASMA COATING METHOD OF NANOVESICLE SURFACE AND PLASMA JET DEVICE FOR PLASMA COATING OF NANOVESICLE SURFACE (Research & Business Foundation SUNGKYUNKWAN UNIVERSITY)

Top Companies in Emerging Plasma Technology Technologies 2025

• ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA: 6 patents
• Taiwan Semiconductor Manufacturing Company, Ltd.: 2 patents
• Panasonic Intellectual Property Management Co., Ltd.: 1 patents
• Research & Business Foundation SUNGKYUNKWAN UNIVERSITY: 1 patents

Top Inventors in Plasma Technology

Barton Lane of Austin TX (US)

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250227)
  • 20250022688. PLASMA PROCESSING METHOD AND APPARATUS (Tokyo Electron Limited) (20250116)
  • 20250014865. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250109)

Chishio KOSHIMIZU

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20250069863. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250227)
  • 20250062101. CONTROL METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250220)
  • 20250014872. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)

Merritt Funk of Austin TX (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250227)
  • 20250014865. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250109)

Chih-Teng LIAO

• Number of Plasma Technology patents: 2
• Top companies:
  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 1 patents
• Recent patents:
  • 20250069860. PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) (20250227)
  • 20250079177. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250306)

Jonghwa LEE

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Jawon KO

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Taijo JEON

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Yunsong JEONG

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Kartik RAMASWAMY of San Jose CA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Applied Materials, Inc.: 2 patents
• Recent patents:
  • 20250006465. Remote Plasma Source and Plasma Processing Chamber Having Same (Applied Materials, Inc.) (20250102)
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)

Takahiro SHINDO

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250006471. NITRIDE FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250102)
  • 20250046575. Plasma Processing Device (Tokyo Electron Limited) (20250206)

Shogo OKITA

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Takahiro MIYAI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Naoaki TAKEDA

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Toshiyuki TAKASAKI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Hisao NAGAI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Seiya NAGANO

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Alok Ranjan of Austin TX (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250022689. GAS CLUSTER ASSISTED PLASMA PROCESSING (Tokyo Electron Limited) (20250116)
  • 20250079178. REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL (Tokyo Electron Limited) (20250306)

Tzu-Ging Lin

• Number of Plasma Technology patents: 2
• Top companies:
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 2 patents
• Recent patents:
  • 20250022715. PLASMA ETCHING PROCESSES (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250116)
  • 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250109)

Nathan STAFFORD of Newark DE (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)

Colin JENNINGS of Newark DE (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)

Scott BILTEK of Newark DE (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)

Phong NGUYEN of Newark DE (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)

Peter Lowell George Ventzek of Austin TX (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250079128. PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS (Tokyo Electron Limited) (20250306)
  • 20250079178. REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL (Tokyo Electron Limited) (20250306)

Mitsunori Ohata

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250079128. PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS (Tokyo Electron Limited) (20250306)
  • 20250079178. REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL (Tokyo Electron Limited) (20250306)

Maolin Long of Santa Clara CA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Mattson Technology, Inc.: 1 patents
  • Beijing E-Town Semiconductor Technology Co., Ltd.: 1 patents
• Recent patents:
  • 20250062103. Cooled Shield for ICP Source (Mattson Technology, Inc.) (20250220)
  • 20250014935. ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA PROCESSING APPARATUS (Beijing E-Town Semiconductor Technology Co., Ltd.) (20250109)

Masaki HIRAYAMA

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250014863. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)
  • 20250014864. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)

Tuqiang NI

• Number of Plasma Technology patents: 1
• Top companies:
  • ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA: 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)

Zhihao WANG

• Number of Plasma Technology patents: 1
• Top companies:
  • ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA: 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)

Kailin WANG

• Number of Plasma Technology patents: 1
• Top companies:
  • ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA: 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)

David Coumou of Webster NY (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.) (20250130)

Zhi Wang of Sunnyvale CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.) (20250130)

Tao Zhang of San Ramon CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.) (20250130)

David Peterson of San Jose CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.) (20250130)

Mina T. FARAG of Cupertino CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037979. RESILIENT RELEASE LAYER FOR LITHIUM FILM TRANSFER AND ATMOSPHERIC PLASMA ASSISTED REMOVAL OF RESIDUAL RELEASE LAYER (Applied Materials, Inc.) (20250130)

Terry BLUCK of Santa Clara CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037979. RESILIENT RELEASE LAYER FOR LITHIUM FILM TRANSFER AND ATMOSPHERIC PLASMA ASSISTED REMOVAL OF RESIDUAL RELEASE LAYER (Applied Materials, Inc.) (20250130)

James GUZZO

• Number of Plasma Technology patents: 1
• Top companies:
  • Impinj, Inc.: 1 patents
• Recent patents:
  • 20250038139. ADHESIVE ATTACHMENT OF PLASMA-ETCH-DICED RFID INTEGRATED CIRCUITS WITH STRUCTURAL SUPPORT (Impinj, Inc.) (20250130)

Harley K. HEINRICH of Seattle WA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Impinj, Inc.: 1 patents
• Recent patents:
  • 20250038139. ADHESIVE ATTACHMENT OF PLASMA-ETCH-DICED RFID INTEGRATED CIRCUITS WITH STRUCTURAL SUPPORT (Impinj, Inc.) (20250130)

Christopher J. DIORIO of Shoreline WA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Impinj, Inc.: 1 patents
• Recent patents:
  • 20250038139. ADHESIVE ATTACHMENT OF PLASMA-ETCH-DICED RFID INTEGRATED CIRCUITS WITH STRUCTURAL SUPPORT (Impinj, Inc.) (20250130)

Janne Lehtinen

• Number of Plasma Technology patents: 1
• Top companies:
  • Teknologian tutkimuskeskus VTT Oy: 1 patents
• Recent patents:
  • 20250040449. Superconducting device (Teknologian tutkimuskeskus VTT Oy) (20250130)

Joonas Govenius

• Number of Plasma Technology patents: 1
• Top companies:
  • Teknologian tutkimuskeskus VTT Oy: 1 patents
• Recent patents:
  • 20250040449. Superconducting device (Teknologian tutkimuskeskus VTT Oy) (20250130)

Jukka-Pekka Kaikkonen

• Number of Plasma Technology patents: 1
• Top companies:
  • Teknologian tutkimuskeskus VTT Oy: 1 patents
• Recent patents:
  • 20250040449. Superconducting device (Teknologian tutkimuskeskus VTT Oy) (20250130)

Chun-Fu YANG

• Number of Plasma Technology patents: 1
• Top companies:
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 1 patents
• Recent patents:
  • 20250068060. METHOD OF FABRICATING AND SERVICING A PHOTOMASK (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250227)

Pei-Cheng HSU

• Number of Plasma Technology patents: 1
• Top companies:
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 1 patents
• Recent patents:
  • 20250068060. METHOD OF FABRICATING AND SERVICING A PHOTOMASK (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250227)

Ta-Cheng LIEN

• Number of Plasma Technology patents: 1
• Top companies:
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 1 patents
• Recent patents:
  • 20250068060. METHOD OF FABRICATING AND SERVICING A PHOTOMASK (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250227)

Hsin-Chang LEE

• Number of Plasma Technology patents: 1
• Top companies:
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 1 patents
• Recent patents:
  • 20250068060. METHOD OF FABRICATING AND SERVICING A PHOTOMASK (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250227)

Shinji HIMORI

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250069851. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20250227)

Justin Moses of Austin TX (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250227)

Chelsea DuBose of Austin TX (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250227)

You Bong LIM

• Number of Plasma Technology patents: 1
• Top companies:
  • PLASMAPP CO., LTD.: 1 patents
• Recent patents:
  • 20250069855. PACKAGING CONTAINER, PLASMA PROCESSING APPARATUS AND PROCESSING METHOD (PLASMAPP CO., LTD.) (20250227)

Jun Young KIM

• Number of Plasma Technology patents: 1
• Top companies:
  • PLASMAPP CO., LTD.: 1 patents
• Recent patents:
  • 20250069855. PACKAGING CONTAINER, PLASMA PROCESSING APPARATUS AND PROCESSING METHOD (PLASMAPP CO., LTD.) (20250227)

Top Collaborations in Plasma Technology

Top US States for Plasma Technology Inventors

Top Cities for Plasma Technology Inventors

• Miyagi: 31 inventors
• Tokyo: 26 inventors
• Suwon-si: 19 inventors
• Austin: 15 inventors
• Hsinchu: 15 inventors
• San Jose: 14 inventors
• Newark: 8 inventors
• Shanghai: 7 inventors
• Sunnyvale: 7 inventors
• OSAKA: 6 inventors
• Chigasaki-shi: 5 inventors
• Taoyuan: 5 inventors
• Osaka: 5 inventors
• Santa Clara: 4 inventors
• Hsinchu City: 4 inventors
• Fremont: 4 inventors
• New Taipei: 4 inventors
• Espoo: 3 inventors
• Daejeon: 3 inventors
• Kurokawa-gun: 3 inventors