Plasma Technology Patent Application Trends 2025

Plasma Technology patent applications in 2025

Top Technology Areas in Plasma Technology

Top CPC Codes

• H01J2237/334 (No explanation available)
  • Count: 28 patents
  • Example: 20250037979. RESILIENT RELEASE LAYER FOR LITHIUM FILM TRANSFER AND ATMOSPHERIC PLASMA ASSISTED REMOVAL OF RESIDUAL RELEASE LAYER (Applied Materials, Inc.)
• H01J37/32146 (No explanation available)
  • Count: 19 patents
  • Example: 20250069851. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited)
• H01J37/3244 (No explanation available)
  • Count: 17 patents
  • Example: 20250069858. PLASMA PROCESSING APPARATUS AND CONTROL METHOD THEREFOR (ULVAC, INC.)
• H01J37/32183 (No explanation available)
  • Count: 15 patents
  • Example: 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.)
• H01J37/32449 (No explanation available)
  • Count: 14 patents
  • Example: 20250037977. APPARATUS AND METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01J37/32715 (No explanation available)
  • Count: 14 patents
  • Example: 20250037977. APPARATUS AND METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01J37/32642 (No explanation available)
  • Count: 10 patents
  • Example: 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• H01L21/31116 (No explanation available)
  • Count: 10 patents
  • Example: 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01L21/3065 (No explanation available)
  • Count: 10 patents
  • Example: 20250006537. Plasma Etching Method and Apparatus (SPTS Technologies Limited)
• H01J37/32724 (No explanation available)
  • Count: 8 patents
  • Example: 20250069860. PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)

Top Companies in Plasma Technology 2025

Tokyo Electron Limited

• Number of Plasma Technology patents: 42
• Top CPC codes:
  • H01J37/32449 (No explanation available): 9 patents
  • H01J37/32715 (No explanation available): 9 patents
  • H01J37/3244 (No explanation available): 9 patents
• Recent patents:
  • 20250104975. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250327)
  • 20250104977. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited) (20250327)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Applied Materials, Inc.

• Number of Plasma Technology patents: 12
• Top CPC codes:
  • H01J2237/334 (No explanation available): 5 patents
  • H01J37/32183 (No explanation available): 4 patents
  • H01J37/32935 (No explanation available): 3 patents
• Recent patents:
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)
  • 20250112029. SUPPRESSING HEATING OF A PLASMA PROCESSING CHAMBER LID (Applied Materials, Inc.) (20250403)
  • 20250112076. GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20250403)

Hitachi High-Tech Corporation

• Number of Plasma Technology patents: 7
• Top CPC codes:
  • H01J2237/334 (No explanation available): 5 patents
  • H01J37/3244 (No explanation available): 2 patents
  • H01J37/32146 (No explanation available): 2 patents
• Recent patents:
  • 20250087497. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250313)
  • 20250104981. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250327)
  • 20250105020. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250327)

Taiwan Semiconductor Manufacturing Company, Ltd.

• Number of Plasma Technology patents: 4
• Top CPC codes:
  • H01L29/66545 (No explanation available): 2 patents
  • H01L21/3065 (No explanation available): 2 patents
  • G03F1/82 (No explanation available): 1 patents
• Recent patents:
  • 20250022715. PLASMA ETCHING PROCESSES (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250116)
  • 20250079177. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250306)
  • 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250109)

HITACHI HIGH-TECH CORPORATION

• Number of Plasma Technology patents: 4
• Top CPC codes:
  • H01J37/32146 (No explanation available): 2 patents
  • H01L21/31116 (No explanation available): 2 patents
  • H01J2237/332 (No explanation available): 2 patents
• Recent patents:
  • 20250079136. PLASMA PROCESSING METHOD (HITACHI HIGH-TECH CORPORATION) (20250306)
  • 20250095981. PLASMA PROCESSING METHOD (HITACHI HIGH-TECH CORPORATION) (20250320)
  • 20250029818. PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE (HITACHI HIGH-TECH CORPORATION) (20250123)

ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/32082 (No explanation available): 1 patents
  • H01J37/32513 (No explanation available): 1 patents
  • H01J37/32568 (No explanation available): 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)
  • 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250109)

SAMSUNG ELECTRONICS CO., LTD.

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/32642 (No explanation available): 2 patents
  • H01J2237/2007 (No explanation available): 2 patents
  • H01J2237/202 (No explanation available): 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Panasonic Intellectual Property Management Co., Ltd.

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/3211 (No explanation available): 2 patents
  • H01J2237/334 (No explanation available): 2 patents
  • H01J37/3299 (No explanation available): 1 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Lam Research Corporation

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/32091 (No explanation available): 2 patents
  • H01J37/32183 (No explanation available): 2 patents
  • H01J37/32146 (No explanation available): 1 patents
• Recent patents:
  • 20250087458. TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SHEATH SYSTEM (Lam Research Corporation) (20250313)
  • 20250054730. Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System (Lam Research Corporation) (20250213)

Beijing E-Town Semiconductor Technology Co., Ltd.

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/32651 (No explanation available): 1 patents
  • H01J37/3244 (No explanation available): 1 patents
  • H01J37/32596 (No explanation available): 1 patents
• Recent patents:
  • 20250112030. PLASMA PROCESSING APPARATUS (Beijing E-Town Semiconductor Technology Co., Ltd.) (20250403)
  • 20250014935. ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA PROCESSING APPARATUS (Beijing E-Town Semiconductor Technology Co., Ltd.) (20250109)

New Companies in Plasma Technology (Last Month)

File:New Companies in Plasma Technology Last Month.png

No new companies detected in the last month.

Emerging Technology Areas in Plasma Technology

• H01L21/32051 (No explanation available)
  • Count: 1 patents
  • Example: 20250105020. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation)
• H01J37/3288 (No explanation available)
  • Count: 1 patents
  • Example: 20250104981. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation)
• H01L21/6831 (No explanation available)
  • Count: 1 patents
  • Example: 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited)
• H01L21/67259 (No explanation available)
  • Count: 1 patents
  • Example: 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited)
• C23C16/50 (No explanation available)
  • Count: 1 patents
  • Example: 20250104975. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• C23C16/45565 (No explanation available)
  • Count: 1 patents
  • Example: 20250104975. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• H05H2245/30 (No explanation available)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)
• H05H1/26 (No explanation available)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)
• A61P35/00 (No explanation available)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)
• A61K47/6913 (No explanation available)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)

Top Companies in Emerging Plasma Technology Technologies 2025

• Tokyo Electron Limited: 4 patents
• Wisconsin Alumni Research Foundation: 4 patents
• Hitachi High-Tech Corporation: 2 patents

Top Inventors in Plasma Technology

Taro IKEDA

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20250104974. Plasma Processing Device (Tokyo Electron Limited) (20250327)
  • 20250104975. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250327)
  • 20250104977. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited) (20250327)

Barton Lane of Austin TX (US)

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250227)
  • 20250022688. PLASMA PROCESSING METHOD AND APPARATUS (Tokyo Electron Limited) (20250116)
  • 20250014865. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250109)

Chishio KOSHIMIZU

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20250069863. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250227)
  • 20250062101. CONTROL METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250220)
  • 20250014872. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)

Kartik RAMASWAMY of San Jose CA (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • Applied Materials, Inc.: 3 patents
• Recent patents:
  • 20250006465. Remote Plasma Source and Plasma Processing Chamber Having Same (Applied Materials, Inc.) (20250102)
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

Takashi ARAMAKI

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250079138. SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING (Tokyo Electron Limited) (20250306)
  • 20250112031. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CLEANING METHOD (Tokyo Electron Limited) (20250403)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Lifu LI

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250079138. SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING (Tokyo Electron Limited) (20250306)
  • 20250112031. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CLEANING METHOD (Tokyo Electron Limited) (20250403)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Kenichi KUWAHARA

• Number of Plasma Technology patents: 3
• Top companies:
  • Hitachi High-Tech Corporation: 2 patents
  • HITACHI HIGH-TECH CORPORATION: 1 patents
• Recent patents:
  • 20250095963. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250320)
  • 20250029818. PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE (HITACHI HIGH-TECH CORPORATION) (20250123)
  • 20250105020. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250327)

Eiki KAMATA

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250095973. Plasma Processing Apparatus and Method for Measuring Resonance Frequency (Tokyo Electron Limited) (20250320)
  • 20250104972. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited) (20250327)
  • 20250104977. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited) (20250327)

Masaki HIRAYAMA

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250014863. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)
  • 20250014864. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)
  • 20250104971. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250327)

Merritt Funk of Austin TX (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250227)
  • 20250014865. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250109)

Chih-Teng LIAO

• Number of Plasma Technology patents: 2
• Top companies:
  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 1 patents
• Recent patents:
  • 20250069860. PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) (20250227)
  • 20250079177. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250306)

Jonghwa LEE

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Jawon KO

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Taijo JEON

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Yunsong JEONG

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Kazushi KANEKO

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250006464. PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM (Tokyo Electron Limited) (20250102)
  • 20250095973. Plasma Processing Apparatus and Method for Measuring Resonance Frequency (Tokyo Electron Limited) (20250320)

Takahiro SHINDO

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250006471. NITRIDE FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250102)
  • 20250046575. Plasma Processing Device (Tokyo Electron Limited) (20250206)

Yue GUO of Redwood City CA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Applied Materials, Inc.: 2 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

Yang YANG of San Diego CA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Applied Materials, Inc.: 2 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

A N M Wasekul AZAD of Santa Clara CA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Applied Materials, Inc.: 2 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

Nicolas J. BRIGHT of Arlington WA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Applied Materials, Inc.: 2 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

Shogo OKITA

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Takahiro MIYAI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Naoaki TAKEDA

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Toshiyuki TAKASAKI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Hisao NAGAI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Seiya NAGANO

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Alok Ranjan of Austin TX (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250022689. GAS CLUSTER ASSISTED PLASMA PROCESSING (Tokyo Electron Limited) (20250116)
  • 20250079178. REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL (Tokyo Electron Limited) (20250306)

Tzu-Ging Lin

• Number of Plasma Technology patents: 2
• Top companies:
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 2 patents
• Recent patents:
  • 20250022715. PLASMA ETCHING PROCESSES (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250116)
  • 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250109)

Nathan STAFFORD of Newark DE (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)

Colin JENNINGS of Newark DE (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)

Scott BILTEK of Newark DE (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)

Phong NGUYEN of Newark DE (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)

Peter Lowell George Ventzek of Austin TX (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250079128. PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS (Tokyo Electron Limited) (20250306)
  • 20250079178. REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL (Tokyo Electron Limited) (20250306)

Mitsunori Ohata

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250079128. PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS (Tokyo Electron Limited) (20250306)
  • 20250079178. REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL (Tokyo Electron Limited) (20250306)

Satoshi UNE

• Number of Plasma Technology patents: 2
• Top companies:
  • HITACHI HIGH-TECH CORPORATION: 2 patents
• Recent patents:
  • 20250079136. PLASMA PROCESSING METHOD (HITACHI HIGH-TECH CORPORATION) (20250306)
  • 20250095981. PLASMA PROCESSING METHOD (HITACHI HIGH-TECH CORPORATION) (20250320)

Nobutaka SASAKI

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250079138. SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING (Tokyo Electron Limited) (20250306)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Toshiki AKAMA

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250079138. SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING (Tokyo Electron Limited) (20250306)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Shusei KATO

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250079138. SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING (Tokyo Electron Limited) (20250306)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Gyeong min PARK

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250079138. SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING (Tokyo Electron Limited) (20250306)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Maolin Long of Santa Clara CA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Mattson Technology, Inc.: 1 patents
  • Beijing E-Town Semiconductor Technology Co., Ltd.: 1 patents
• Recent patents:
  • 20250062103. Cooled Shield for ICP Source (Mattson Technology, Inc.) (20250220)
  • 20250014935. ELECTROSTATIC CHUCK ASSEMBLY FOR PLASMA PROCESSING APPARATUS (Beijing E-Town Semiconductor Technology Co., Ltd.) (20250109)

Sho KUMAKURA

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250087454. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)
  • 20250087455. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)

Soichiro KIMURA

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250087454. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)
  • 20250087455. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)

Koyumi SASA

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250087454. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)
  • 20250087455. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)

Nobuhiro ODASHIMA

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250087454. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)
  • 20250087455. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)

Yuji MASAKI

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250087454. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)
  • 20250087455. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)

Noboru TAKEMOTO

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250087454. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)
  • 20250087455. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)

Makoto KOBAYASHI

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250087454. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)
  • 20250087455. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250313)

Alexei Marakhtanov of Albany CA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Lam Research Corporation: 2 patents
• Recent patents:
  • 20250087458. TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SHEATH SYSTEM (Lam Research Corporation) (20250313)
  • 20250054730. Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System (Lam Research Corporation) (20250213)

Toshifumi KITAHARA

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250104974. Plasma Processing Device (Tokyo Electron Limited) (20250327)
  • 20250104975. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250327)

Top Collaborations in Plasma Technology

Top US States for Plasma Technology Inventors

Top Cities for Plasma Technology Inventors

• Miyagi: 58 inventors
• Tokyo: 45 inventors
• Suwon-si: 29 inventors
• San Jose: 19 inventors
• Shanghai: 17 inventors
• Austin: 16 inventors
• Hsinchu: 15 inventors
• Yamanashi: 12 inventors
• Sunnyvale: 11 inventors
• Newark: 10 inventors
• Santa Clara: 6 inventors
• Kurokawa-gun: 6 inventors
• OSAKA: 6 inventors
• Madison: 6 inventors
• Chigasaki-shi: 5 inventors
• Fremont: 5 inventors
• Taoyuan: 5 inventors
• Pleasanton: 5 inventors
• Jiangsu: 5 inventors
• Osaka: 5 inventors