Plasma Technology Patent Application Trends 2025

Plasma Technology patent applications in 2025

Top Technology Areas in Plasma Technology

Top CPC Codes

• H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps)
  • Count: 10 patents
  • Example: 20250037979. RESILIENT RELEASE LAYER FOR LITHIUM FILM TRANSFER AND ATMOSPHERIC PLASMA ASSISTED REMOVAL OF RESIDUAL RELEASE LAYER (Applied Materials, Inc.)
• H01J37/32183 ({Matching circuits})
  • Count: 9 patents
  • Example: 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.)
• H01J37/32146 (Gas-filled discharge tubes (heating by discharge)
  • Count: 9 patents
  • Example: 20250006464. PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM (Tokyo Electron Limited)
• H01J37/32449 (Gas-filled discharge tubes (heating by discharge)
  • Count: 8 patents
  • Example: 20250037977. APPARATUS AND METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01J37/32715 (Gas-filled discharge tubes (heating by discharge)
  • Count: 6 patents
  • Example: 20250037977. APPARATUS AND METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01J37/3244 (Gas-filled discharge tubes (heating by discharge)
  • Count: 5 patents
  • Example: 20250006461. Plasma Processing Apparatus (Tokyo Electron Limited)
• H01J37/32174 (Gas-filled discharge tubes (heating by discharge)
  • Count: 5 patents
  • Example: 20250006516. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
• H01J37/3211 (Gas-filled discharge tubes (heating by discharge)
  • Count: 4 patents
  • Example: 20250006461. Plasma Processing Apparatus (Tokyo Electron Limited)
• H01J37/321 (Gas-filled discharge tubes (heating by discharge)
  • Count: 4 patents
  • Example: 20250006465. Remote Plasma Source and Plasma Processing Chamber Having Same (Applied Materials, Inc.)
• H01L21/6833 (for supporting or gripping (for conveying)
  • Count: 4 patents
  • Example: 20250006516. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)

Top Companies in Plasma Technology 2025

Tokyo Electron Limited

• Number of Plasma Technology patents: 19
• Top CPC codes:
  • H01J37/32449 (Gas-filled discharge tubes (heating by discharge): 5 patents
  • H01J37/32146 (Gas-filled discharge tubes (heating by discharge): 5 patents
  • H01J37/32715 (Gas-filled discharge tubes (heating by discharge): 4 patents
• Recent patents:
  • 20250014866. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20250109)
  • 20250014872. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)
  • 20250014874. ELECTROSTATIC CHUCK AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)

Applied Materials, Inc.

• Number of Plasma Technology patents: 5
• Top CPC codes:
  • H01J37/32183 ({Matching circuits}): 2 patents
  • H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 2 patents
  • H01J37/32935 (Gas-filled discharge tubes (heating by discharge): 1 patents
• Recent patents:
  • 20250006465. Remote Plasma Source and Plasma Processing Chamber Having Same (Applied Materials, Inc.) (20250102)
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250022697. PLASMA SYSTEM HAVING RESIDENCE TIME TUNING ASSEMBLY (Applied Materials, Inc.) (20250116)

ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/32082 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • H01J37/32513 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • H01J37/32568 (Gas-filled discharge tubes (heating by discharge): 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)
  • 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250109)

Hitachi High-Tech Corporation

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/32522 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • H01J37/32146 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • H01J37/32201 (Gas-filled discharge tubes (heating by discharge): 1 patents
• Recent patents:
  • 20250046580. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250206)
  • 20250046582. REGENERATING METHOD FOR INNER MEMBER OF PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250206)

HITACHI HIGH-TECH CORPORATION

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01L21/32136 ({using plasmas}): 1 patents
  • H01J37/32146 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • H01J37/32174 (Gas-filled discharge tubes (heating by discharge): 1 patents
• Recent patents:
  • 20250046620. PLASMA PROCESSING METHOD (HITACHI HIGH-TECH CORPORATION) (20250206)
  • 20250029818. PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE (HITACHI HIGH-TECH CORPORATION) (20250123)

Panasonic Intellectual Property Management Co., Ltd.

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/3211 (Gas-filled discharge tubes (heating by discharge): 2 patents
  • H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 2 patents
  • H01J37/3299 (Gas-filled discharge tubes (heating by discharge): 1 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Taiwan Semiconductor Manufacturing Company, Ltd.

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01L29/66545 ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 2 patents
  • H01L21/30655 (Plasma etching; Reactive-ion etching): 1 patents
  • H01L21/76232 (Dielectric regions {, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers}): 1 patents
• Recent patents:
  • 20250022715. PLASMA ETCHING PROCESSES (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250116)
  • 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250109)

Research & Business Foundation SUNGKYUNKWAN UNIVERSITY

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • A61K9/1271 (PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES (devices or methods specially adapted for bringing pharmaceutical products into particular physical or administering forms): 1 patents
  • B01J19/087 (Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor (application of shock waves): 1 patents
  • H01J37/32422 (Gas-filled discharge tubes (heating by discharge): 1 patents
• Recent patents:
  • 20250009661. PLASMA COATING METHOD OF NANOVESICLE SURFACE AND PLASMA JET DEVICE FOR PLASMA COATING OF NANOVESICLE SURFACE (Research & Business Foundation SUNGKYUNKWAN UNIVERSITY) (20250109)
  • 20250014868. ETCHING PLASMA PROCESSING APPARATUS INCLUDING CONSUMABLE METAL MEMBER (Research & Business Foundation SUNGKYUNKWAN UNIVERSITY) (20250109)

Impinj, Inc.

• Number of Plasma Technology patents: 1
• Top CPC codes:
  • H01L24/05 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
  • G06K19/07722 (Constructional details, e.g. mounting of circuits in the carrier): 1 patents
  • H01L24/03 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
• Recent patents:
  • 20250038139. ADHESIVE ATTACHMENT OF PLASMA-ETCH-DICED RFID INTEGRATED CIRCUITS WITH STRUCTURAL SUPPORT (Impinj, Inc.) (20250130)

Teknologian tutkimuskeskus VTT Oy

• Number of Plasma Technology patents: 1
• Top CPC codes:
  • H10N60/0912 (No explanation available): 1 patents
  • H10N60/12 (No explanation available): 1 patents
  • H10N60/85 (No explanation available): 1 patents
• Recent patents:
  • 20250040449. Superconducting device (Teknologian tutkimuskeskus VTT Oy) (20250130)

New Companies in Plasma Technology (Last Month)

File:New Companies in Plasma Technology Last Month.png

No new companies detected in the last month.

Emerging Technology Areas in Plasma Technology

• H01L29/7851 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS)
  • Count: 1 patents
  • Example: 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.)
• H01L29/66795 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS)
  • Count: 1 patents
  • Example: 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.)
• H01J37/32981 (Gas-filled discharge tubes (heating by discharge)
  • Count: 1 patents
  • Example: 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.)
• H01J37/32926 (Gas-filled discharge tubes (heating by discharge)
  • Count: 1 patents
  • Example: 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.)
• H01J37/32165 (Gas-filled discharge tubes (heating by discharge)
  • Count: 1 patents
  • Example: 20250014865. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited)
• C23C28/042 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• C23C14/46 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• C23C14/30 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• C23C14/26 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)
• C23C14/0694 (COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL (making metal-coated products by extrusion)
  • Count: 1 patents
  • Example: 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA)

Top Companies in Emerging Plasma Technology Technologies 2025

• ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA: 5 patents
• Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Taiwan Semiconductor Manufacturing Company, Ltd.: 2 patents
• Tokyo Electron Limited: 1 patents

Top Inventors in Plasma Technology

Barton Lane of Austin TX (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250037977. APPARATUS AND METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250130)
  • 20250022688. PLASMA PROCESSING METHOD AND APPARATUS (Tokyo Electron Limited) (20250116)
  • 20250014865. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250109)

Kartik RAMASWAMY of San Jose CA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Applied Materials, Inc.: 2 patents
• Recent patents:
  • 20250006465. Remote Plasma Source and Plasma Processing Chamber Having Same (Applied Materials, Inc.) (20250102)
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)

Takahiro SHINDO

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250006471. NITRIDE FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250102)
  • 20250046575. Plasma Processing Device (Tokyo Electron Limited) (20250206)

Shogo OKITA

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Takahiro MIYAI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Naoaki TAKEDA

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Toshiyuki TAKASAKI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Hisao NAGAI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Seiya NAGANO

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Tzu-Ging Lin

• Number of Plasma Technology patents: 2
• Top companies:
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 2 patents
• Recent patents:
  • 20250022715. PLASMA ETCHING PROCESSES (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250116)
  • 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250109)

Masaki HIRAYAMA

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250014863. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)
  • 20250014864. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)

Tuqiang NI

• Number of Plasma Technology patents: 1
• Top companies:
  • ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA: 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)

Zhihao WANG

• Number of Plasma Technology patents: 1
• Top companies:
  • ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA: 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)

Kailin WANG

• Number of Plasma Technology patents: 1
• Top companies:
  • ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA: 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)

David Coumou of Webster NY (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.) (20250130)

Zhi Wang of Sunnyvale CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.) (20250130)

Tao Zhang of San Ramon CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.) (20250130)

David Peterson of San Jose CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.) (20250130)

Mina T. FARAG of Cupertino CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037979. RESILIENT RELEASE LAYER FOR LITHIUM FILM TRANSFER AND ATMOSPHERIC PLASMA ASSISTED REMOVAL OF RESIDUAL RELEASE LAYER (Applied Materials, Inc.) (20250130)

Terry BLUCK of Santa Clara CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250037979. RESILIENT RELEASE LAYER FOR LITHIUM FILM TRANSFER AND ATMOSPHERIC PLASMA ASSISTED REMOVAL OF RESIDUAL RELEASE LAYER (Applied Materials, Inc.) (20250130)

James GUZZO

• Number of Plasma Technology patents: 1
• Top companies:
  • Impinj, Inc.: 1 patents
• Recent patents:
  • 20250038139. ADHESIVE ATTACHMENT OF PLASMA-ETCH-DICED RFID INTEGRATED CIRCUITS WITH STRUCTURAL SUPPORT (Impinj, Inc.) (20250130)

Harley K. HEINRICH of Seattle WA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Impinj, Inc.: 1 patents
• Recent patents:
  • 20250038139. ADHESIVE ATTACHMENT OF PLASMA-ETCH-DICED RFID INTEGRATED CIRCUITS WITH STRUCTURAL SUPPORT (Impinj, Inc.) (20250130)

Christopher J. DIORIO of Shoreline WA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Impinj, Inc.: 1 patents
• Recent patents:
  • 20250038139. ADHESIVE ATTACHMENT OF PLASMA-ETCH-DICED RFID INTEGRATED CIRCUITS WITH STRUCTURAL SUPPORT (Impinj, Inc.) (20250130)

Janne Lehtinen

• Number of Plasma Technology patents: 1
• Top companies:
  • Teknologian tutkimuskeskus VTT Oy: 1 patents
• Recent patents:
  • 20250040449. Superconducting device (Teknologian tutkimuskeskus VTT Oy) (20250130)

Joonas Govenius

• Number of Plasma Technology patents: 1
• Top companies:
  • Teknologian tutkimuskeskus VTT Oy: 1 patents
• Recent patents:
  • 20250040449. Superconducting device (Teknologian tutkimuskeskus VTT Oy) (20250130)

Jukka-Pekka Kaikkonen

• Number of Plasma Technology patents: 1
• Top companies:
  • Teknologian tutkimuskeskus VTT Oy: 1 patents
• Recent patents:
  • 20250040449. Superconducting device (Teknologian tutkimuskeskus VTT Oy) (20250130)

Taro HAYAKAWA

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250006461. Plasma Processing Apparatus (Tokyo Electron Limited) (20250102)

Kazushi KANEKO

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250006464. PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM (Tokyo Electron Limited) (20250102)

Yohei ISHIDA

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250006464. PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM (Tokyo Electron Limited) (20250102)

Yang YANG of Cupertino CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250006465. Remote Plasma Source and Plasma Processing Chamber Having Same (Applied Materials, Inc.) (20250102)

Fernando SILVEIRA of Livermore CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250006465. Remote Plasma Source and Plasma Processing Chamber Having Same (Applied Materials, Inc.) (20250102)

Imad YOUSIF of San Jose CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250006465. Remote Plasma Source and Plasma Processing Chamber Having Same (Applied Materials, Inc.) (20250102)

Motohiro UMEHARA

• Number of Plasma Technology patents: 1
• Top companies:
  • KYOCERA Corporation: 1 patents
• Recent patents:
  • 20250006468. PLASMA-RESISTANT LAMINATE, MANUFACTURING METHOD THEREFOR, AND PLASMA PROCESSING APPARATUS (KYOCERA Corporation) (20250102)

Wataru FUJITA

• Number of Plasma Technology patents: 1
• Top companies:
  • KYOCERA Corporation: 1 patents
• Recent patents:
  • 20250006468. PLASMA-RESISTANT LAMINATE, MANUFACTURING METHOD THEREFOR, AND PLASMA PROCESSING APPARATUS (KYOCERA Corporation) (20250102)

Kazuhiro ISHIKAWA

• Number of Plasma Technology patents: 1
• Top companies:
  • KYOCERA Corporation: 1 patents
• Recent patents:
  • 20250006468. PLASMA-RESISTANT LAMINATE, MANUFACTURING METHOD THEREFOR, AND PLASMA PROCESSING APPARATUS (KYOCERA Corporation) (20250102)

Takamichi KIKUCHI

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250006471. NITRIDE FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250102)

Yuki ONODERA

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250006473. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250102)

Takamitsu TAKAYAMA

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250006473. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250102)

Noriiki MASUDA

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250006516. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250102)

Adam S. BEACHEY

• Number of Plasma Technology patents: 1
• Top companies:
  • SPTS Technologies Limited: 1 patents
• Recent patents:
  • 20250006537. Plasma Etching Method and Apparatus (SPTS Technologies Limited) (20250102)

Jhih-Yan HE

• Number of Plasma Technology patents: 1
• Top companies:
  • Ming Chi University of Technology: 1 patents
• Recent patents:
  • 20250008635. CONTROL CIRCUIT OF ATMOSPHERIC PLASMA GENERATING DEVICE AND ATMOSPHERIC PLASMA GENERATING SYSTEM (Ming Chi University of Technology) (20250102)

Li-Chun CHANG

• Number of Plasma Technology patents: 1
• Top companies:
  • Ming Chi University of Technology: 1 patents
• Recent patents:
  • 20250008635. CONTROL CIRCUIT OF ATMOSPHERIC PLASMA GENERATING DEVICE AND ATMOSPHERIC PLASMA GENERATING SYSTEM (Ming Chi University of Technology) (20250102)

Jyh-Wei LEE

• Number of Plasma Technology patents: 1
• Top companies:
  • Ming Chi University of Technology: 1 patents
• Recent patents:
  • 20250008635. CONTROL CIRCUIT OF ATMOSPHERIC PLASMA GENERATING DEVICE AND ATMOSPHERIC PLASMA GENERATING SYSTEM (Ming Chi University of Technology) (20250102)

Ming-Hung CHEN

• Number of Plasma Technology patents: 1
• Top companies:
  • Ming Chi University of Technology: 1 patents
• Recent patents:
  • 20250008635. CONTROL CIRCUIT OF ATMOSPHERIC PLASMA GENERATING DEVICE AND ATMOSPHERIC PLASMA GENERATING SYSTEM (Ming Chi University of Technology) (20250102)

Mohd Fairuz BIN BUDIMAN

• Number of Plasma Technology patents: 1
• Top companies:
  • Tokyo Electron Limited: 1 patents
• Recent patents:
  • 20250046573. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20250206)

YUAN-CHI LEE

• Number of Plasma Technology patents: 1
• Top companies:
  • UVAT TECHNOLOGY CO.,LTD.: 1 patents
• Recent patents:
  • 20250046574. CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING (UVAT TECHNOLOGY CO.,LTD.) (20250206)

PIN-CHUN LIU

• Number of Plasma Technology patents: 1
• Top companies:
  • UVAT TECHNOLOGY CO.,LTD.: 1 patents
• Recent patents:
  • 20250046574. CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING (UVAT TECHNOLOGY CO.,LTD.) (20250206)

MING-CHAN TSAI

• Number of Plasma Technology patents: 1
• Top companies:
  • UVAT TECHNOLOGY CO.,LTD.: 1 patents
• Recent patents:
  • 20250046574. CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING (UVAT TECHNOLOGY CO.,LTD.) (20250206)

Yue GUO of Redwood City CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)

Yang YANG of San Diego CA (US)

• Number of Plasma Technology patents: 1
• Top companies:
  • Applied Materials, Inc.: 1 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)

Top Collaborations in Plasma Technology

Top US States for Plasma Technology Inventors

Top Cities for Plasma Technology Inventors

• Tokyo: 16 inventors
• Miyagi: 12 inventors
• Suwon-si: 11 inventors
• San Jose: 8 inventors
• Shanghai: 7 inventors
• Austin: 6 inventors
• OSAKA: 6 inventors
• Taoyuan: 5 inventors
• Hsinchu: 5 inventors
• Osaka: 5 inventors
• New Taipei: 4 inventors
• Santa Clara: 3 inventors
• Espoo: 3 inventors
• Taoyuan City: 3 inventors
• Fort Collins: 3 inventors
• Longmont: 3 inventors
• Sunnyvale: 2 inventors
• Cupertino: 2 inventors
• Taipei: 2 inventors
• Kaohsiung: 2 inventors