Taiwan semiconductor manufacturing company, ltd. (20240377263). APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE simplified abstract
Contents
APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE
Organization Name
taiwan semiconductor manufacturing company, ltd.
Inventor(s)
Huicheng Chang of Hsinchu (TW)
APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE - A simplified explanation of the abstract
This abstract first appeared for US patent application 20240377263 titled 'APPARATUS, SYSTEM, AND METHOD FOR MEASURING THE TEMPERATURE OF A SUBSTRATE
Simplified Explanation:
This patent application describes a temperature measuring apparatus that uses laser pulses to measure the temperature of a substrate during a thermal process.
- The apparatus includes a light emitting source that emits laser pulses onto the substrate.
- A detector on the other side of the light emitting source receives the reflected laser pulses and emission signals from the substrate's surface.
- By analyzing the received laser pulses and emission signals, the apparatus can determine the temperature of the substrate.
- To improve the signal to noise ratio of the reflected laser pulses, a polarizer may be used to polarize the laser pulses with s polarization.
- The angle at which the polarized laser pulses are applied to the substrate can be controlled to enhance the signal to noise ratio at the detector's end.
Key Features and Innovation:
- Use of laser pulses for temperature measurement during a thermal process.
- Integration of a polarizer to improve signal to noise ratio.
- Control of the angle of polarized laser pulses for enhanced accuracy.
Potential Applications:
- Industrial processes requiring precise temperature measurements.
- Semiconductor manufacturing.
- Material processing industries.
Problems Solved:
- Accurate temperature measurement during thermal processes.
- Improved signal to noise ratio for more reliable data.
Benefits:
- Enhanced temperature monitoring accuracy.
- Increased efficiency in thermal processes.
- Improved quality control in manufacturing.
Commercial Applications:
Temperature monitoring in industrial processes for quality control and efficiency improvements.
Questions about Temperature Measuring Apparatus:
1. How does the use of laser pulses improve temperature measurement accuracy? 2. What are the potential industrial applications of this technology?
Original Abstract Submitted
a temperature measuring apparatus for measuring a temperature of a substrate is described. a light emitting source that emits light signals such as laser pulses are applied to the substrate. a detector on the other side of the light emitting source receives the reflected laser pulses. the detector further receives emission signals associated with temperature or energy density that is radiated from the surface of the substrate. the temperature measuring apparatus determines the temperature of the substrate during a thermal process using the received laser pulses and the emission signals. to improve the signal to noise ratio of the reflected laser pulses, a polarizer may be used to polarize the laser pulses to have a s polarization. the angle in which the polarized laser pulses are applied towards the substrate may also be controlled to enhance the signal to noise ratio at the detector's end.
