Plasma Technology Patent Application Trends 2025

Plasma Technology patent applications in 2025

Top Technology Areas in Plasma Technology

Top CPC Codes

• H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps)
  • Count: 51 patents
  • Example: 20250118537. PLASMA PROCESSING APPARATUS AND HEATING APPARATUS (Hitachi High-Tech Corporation)
• H01J37/32146 (Gas-filled discharge tubes (heating by discharge)
  • Count: 28 patents
  • Example: 20250118566. PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE (HITACHI HIGH-TECH CORPORATION)
• H01J37/32449 (Gas-filled discharge tubes (heating by discharge)
  • Count: 26 patents
  • Example: 20250118566. PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE (HITACHI HIGH-TECH CORPORATION)
• H01J37/32715 (Gas-filled discharge tubes (heating by discharge)
  • Count: 24 patents
  • Example: 20250115522. JOINING TECHNIQUES FOR COMPOSITE CERAMIC BODIES (Lam Research Corporation)
• H01J37/3244 (Gas-filled discharge tubes (heating by discharge)
  • Count: 22 patents
  • Example: 20250115522. JOINING TECHNIQUES FOR COMPOSITE CERAMIC BODIES (Lam Research Corporation)
• H01J37/32183 ({Matching circuits})
  • Count: 20 patents
  • Example: 20250037973. CONTROL AND PREDICTION OF MULTIPLE PLASMA COUPLING SURFACES AND CORRESPONDING POWER TRANSFER (Applied Materials, Inc.)
• H01J37/32174 (Gas-filled discharge tubes (heating by discharge)
  • Count: 19 patents
  • Example: 20250118532. SYSTEM AND METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01L21/3065 (Plasma etching; Reactive-ion etching)
  • Count: 16 patents
  • Example: 20250118532. SYSTEM AND METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited)
• H01J37/32724 (Gas-filled discharge tubes (heating by discharge)
  • Count: 16 patents
  • Example: 20250118541. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation)
• H01L21/31116 ({by dry-etching})
  • Count: 14 patents
  • Example: 20250118566. PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE (HITACHI HIGH-TECH CORPORATION)

Top Companies in Plasma Technology 2025

Tokyo Electron Limited

• Number of Plasma Technology patents: 73
• Top CPC codes:
  • H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 16 patents
  • H01J37/32146 (Gas-filled discharge tubes (heating by discharge): 15 patents
  • H01J37/32174 (Gas-filled discharge tubes (heating by discharge): 14 patents
• Recent patents:
  • 20250104975. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250327)
  • 20250104977. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited) (20250327)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Applied Materials, Inc.

• Number of Plasma Technology patents: 16
• Top CPC codes:
  • H01J37/32183 ({Matching circuits}): 7 patents
  • H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 6 patents
  • H01J37/321 (Gas-filled discharge tubes (heating by discharge): 4 patents
• Recent patents:
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)
  • 20250112029. SUPPRESSING HEATING OF A PLASMA PROCESSING CHAMBER LID (Applied Materials, Inc.) (20250403)
  • 20250112076. GROUND ELECTRODE FORMED IN AN ELECTROSTATIC CHUCK FOR A PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20250403)

Hitachi High-Tech Corporation

• Number of Plasma Technology patents: 13
• Top CPC codes:
  • H01J2237/334 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 9 patents
  • H01J37/32522 (Gas-filled discharge tubes (heating by discharge): 2 patents
  • H01J37/32724 (Gas-filled discharge tubes (heating by discharge): 2 patents
• Recent patents:
  • 20250087497. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250313)
  • 20250104981. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250327)
  • 20250105020. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250327)

HITACHI HIGH-TECH CORPORATION

• Number of Plasma Technology patents: 7
• Top CPC codes:
  • H01J37/32146 (Gas-filled discharge tubes (heating by discharge): 4 patents
  • H01L21/31116 ({by dry-etching}): 3 patents
  • H01J37/32715 (Gas-filled discharge tubes (heating by discharge): 3 patents
• Recent patents:
  • 20250029818. PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE (HITACHI HIGH-TECH CORPORATION) (20250123)
  • 20250149294. PLASMA PROCESSING METHOD (HITACHI HIGH-TECH CORPORATION) (20250508)
  • 20250149313. PLASMA PROCESSING APPARATUS (HITACHI HIGH-TECH CORPORATION) (20250508)

Taiwan Semiconductor Manufacturing Company, Ltd.

• Number of Plasma Technology patents: 6
• Top CPC codes:
  • H01L21/3065 (Plasma etching; Reactive-ion etching): 3 patents
  • H10D30/43 (No explanation available): 2 patents
  • H10D30/6735 (No explanation available): 2 patents
• Recent patents:
  • 20250022715. PLASMA ETCHING PROCESSES (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250116)
  • 20250079177. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250306)
  • 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250109)

Lam Research Corporation

• Number of Plasma Technology patents: 5
• Top CPC codes:
  • H01J37/32183 ({Matching circuits}): 3 patents
  • H01J37/32091 (Gas-filled discharge tubes (heating by discharge): 2 patents
  • H01J9/34 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• Recent patents:
  • 20250140528. YTTRIA COATING FOR PLASMA PROCESSING CHAMBER COMPONENTS (Lam Research Corporation) (20250501)
  • 20250087458. TUNING VOLTAGE SETPOINT IN A PULSED RF SIGNAL FOR A TUNABLE EDGE SHEATH SYSTEM (Lam Research Corporation) (20250313)
  • 20250054730. Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System (Lam Research Corporation) (20250213)

SAMSUNG ELECTRONICS CO., LTD.

• Number of Plasma Technology patents: 4
• Top CPC codes:
  • H01J37/3244 (Gas-filled discharge tubes (heating by discharge): 2 patents
  • H01J37/32642 (Gas-filled discharge tubes (heating by discharge): 2 patents
  • H01J2237/2007 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 2 patents
• Recent patents:
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250146917. METHOD OF MEASURING PARAMETERS OF PLASMA, APPARATUS FOR MEASURING PARAMETERS OF PLASMA, PLASMA PROCESSING SYSTEM, AND METHOD OF PROCESSING WAFER (SAMSUNG ELECTRONICS CO., LTD.) (20250508)
  • 20250149301. PLASMA PROCESSING APPARATUS INCLUDING GAS DISTRIBUTION PLATE (SAMSUNG ELECTRONICS CO., LTD.) (20250508)

TOKYO ELECTRON LIMITED

• Number of Plasma Technology patents: 3
• Top CPC codes:
  • H01J37/32917 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • G01J5/0018 (Radiation pyrometry, e.g. infrared or optical thermometry): 1 patents
  • H01J2237/24592 (ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS (spark-gaps): 1 patents
• Recent patents:
  • 20250118542. MEASUREMENT SYSTEM, MEASUREMENT METHOD, AND PLASMA PROCESSING DEVICE (TOKYO ELECTRON LIMITED) (20250410)
  • 20250096020. SUBSTRATE PROCESSING APPARATUS (TOKYO ELECTRON LIMITED) (20250320)
  • 20250149342. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (TOKYO ELECTRON LIMITED) (20250508)

UVAT TECHNOLOGY CO.,LTD.

• Number of Plasma Technology patents: 3
• Top CPC codes:
  • H01J37/32715 (Gas-filled discharge tubes (heating by discharge): 2 patents
  • H01J37/32761 (Gas-filled discharge tubes (heating by discharge): 2 patents
  • H01J37/32174 (Gas-filled discharge tubes (heating by discharge): 1 patents
• Recent patents:
  • 20250046574. CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING (UVAT TECHNOLOGY CO.,LTD.) (20250206)
  • 20250125121. TWO-ELECTRODE CONTINUOUS PLASMA PROCESSING SYSTEM (UVAT TECHNOLOGY CO.,LTD.) (20250417)
  • 20250125127. CONTINUOUS PLASMA PROCESSING SYSTEM WITH ADJUSTABLE ELECTRODE (UVAT TECHNOLOGY CO.,LTD.) (20250417)

ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA

• Number of Plasma Technology patents: 2
• Top CPC codes:
  • H01J37/32082 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • H01J37/32513 (Gas-filled discharge tubes (heating by discharge): 1 patents
  • H01J37/32568 (Gas-filled discharge tubes (heating by discharge): 1 patents
• Recent patents:
  • 20250037971. PLASMA PROCESSING DEVICE (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250130)
  • 20250011917. METHOD AND APPARATUS FOR FORMING A PLASMA RESISTANT COATING, COMPONENT, AND PLASMA PROCESSING APPARATUS (ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA) (20250109)

New Companies in Plasma Technology (Last Month)

File:New Companies in Plasma Technology Last Month.png

No new companies detected in the last month.

Emerging Technology Areas in Plasma Technology

• H01L21/32051 (Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers (manufacture of electrodes)
  • Count: 1 patents
  • Example: 20250105020. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation)
• H01J37/3288 (Gas-filled discharge tubes (heating by discharge)
  • Count: 1 patents
  • Example: 20250104981. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation)
• H01L21/67259 (Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components {; Apparatus not specifically provided for elsewhere (processes per se)
  • Count: 1 patents
  • Example: 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited)
• H05H1/26 (Plasma torches)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)
• A61P35/00 (Antineoplastic agents)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)
• A61K47/6913 ({the liposome being modified on its surface by an antibody})
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)
• A61K47/6851 (PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES (devices or methods specially adapted for bringing pharmaceutical products into particular physical or administering forms)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)
• A61K47/42 (PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES (devices or methods specially adapted for bringing pharmaceutical products into particular physical or administering forms)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)
• A61K39/3955 (PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES (devices or methods specially adapted for bringing pharmaceutical products into particular physical or administering forms)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)
• A61K35/13 (PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES (devices or methods specially adapted for bringing pharmaceutical products into particular physical or administering forms)
  • Count: 1 patents
  • Example: 20250099391. Compositions and Methods for Treating Cancer (Wisconsin Alumni Research Foundation)

Top Companies in Emerging Plasma Technology Technologies 2025

• Wisconsin Alumni Research Foundation: 7 patents
• Hitachi High-Tech Corporation: 2 patents
• Tokyo Electron Limited: 1 patents

Top Inventors in Plasma Technology

Chishio KOSHIMIZU

• Number of Plasma Technology patents: 6
• Top companies:
  • Tokyo Electron Limited: 6 patents
• Recent patents:
  • 20250062101. CONTROL METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250220)
  • 20250149296. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20250508)
  • 20250014872. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)

Daisuke YOSHIKOSHI

• Number of Plasma Technology patents: 6
• Top companies:
  • Tokyo Electron Limited: 6 patents
• Recent patents:
  • 20250149298. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149307. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149308. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)

Nozomu NAGASHIMA

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20250149298. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149307. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149308. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)

Kunihiko YAMAGATA

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20250149298. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149307. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149308. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)

Taro IKEDA

• Number of Plasma Technology patents: 5
• Top companies:
  • Tokyo Electron Limited: 5 patents
• Recent patents:
  • 20250104974. Plasma Processing Device (Tokyo Electron Limited) (20250327)
  • 20250104975. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250327)
  • 20250104977. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited) (20250327)

Barton Lane of Austin TX (US)

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250227)
  • 20250022688. PLASMA PROCESSING METHOD AND APPARATUS (Tokyo Electron Limited) (20250116)
  • 20250014865. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250109)

Kartik RAMASWAMY of San Jose CA (US)

• Number of Plasma Technology patents: 4
• Top companies:
  • Applied Materials, Inc.: 4 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250140541. REAL-TIME PLASMA MEASUREMENT AND CONTROL (Applied Materials, Inc.) (20250501)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

Lifu LI

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20250174434. PLASMA PROCESSING APPARATUS AND POWER SUPPLY SYSTEM (Tokyo Electron Limited) (20250529)
  • 20250112031. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CLEANING METHOD (Tokyo Electron Limited) (20250403)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Yusuke SHIMIZU

• Number of Plasma Technology patents: 4
• Top companies:
  • Tokyo Electron Limited: 4 patents
• Recent patents:
  • 20250166980. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250522)
  • 20250149315. ADJUSTMENT METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149316. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)

Takahiro SHINDO

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250006471. NITRIDE FILM FORMING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250102)
  • 20250046575. Plasma Processing Device (Tokyo Electron Limited) (20250206)
  • 20250149291. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)

YUAN-CHI LEE

• Number of Plasma Technology patents: 3
• Top companies:
  • UVAT TECHNOLOGY CO.,LTD.: 3 patents
• Recent patents:
  • 20250046574. CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING (UVAT TECHNOLOGY CO.,LTD.) (20250206)
  • 20250125121. TWO-ELECTRODE CONTINUOUS PLASMA PROCESSING SYSTEM (UVAT TECHNOLOGY CO.,LTD.) (20250417)
  • 20250125127. CONTINUOUS PLASMA PROCESSING SYSTEM WITH ADJUSTABLE ELECTRODE (UVAT TECHNOLOGY CO.,LTD.) (20250417)

PIN-CHUN LIU

• Number of Plasma Technology patents: 3
• Top companies:
  • UVAT TECHNOLOGY CO.,LTD.: 3 patents
• Recent patents:
  • 20250046574. CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING (UVAT TECHNOLOGY CO.,LTD.) (20250206)
  • 20250125121. TWO-ELECTRODE CONTINUOUS PLASMA PROCESSING SYSTEM (UVAT TECHNOLOGY CO.,LTD.) (20250417)
  • 20250125127. CONTINUOUS PLASMA PROCESSING SYSTEM WITH ADJUSTABLE ELECTRODE (UVAT TECHNOLOGY CO.,LTD.) (20250417)

MING-CHAN TSAI

• Number of Plasma Technology patents: 3
• Top companies:
  • UVAT TECHNOLOGY CO.,LTD.: 3 patents
• Recent patents:
  • 20250046574. CONTINUOUS PROCESSING MECHANISM FOR DUAL EFFECT PLASMA ETCHING (UVAT TECHNOLOGY CO.,LTD.) (20250206)
  • 20250125121. TWO-ELECTRODE CONTINUOUS PLASMA PROCESSING SYSTEM (UVAT TECHNOLOGY CO.,LTD.) (20250417)
  • 20250125127. CONTINUOUS PLASMA PROCESSING SYSTEM WITH ADJUSTABLE ELECTRODE (UVAT TECHNOLOGY CO.,LTD.) (20250417)

Yue GUO of Redwood City CA (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • Applied Materials, Inc.: 3 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250140541. REAL-TIME PLASMA MEASUREMENT AND CONTROL (Applied Materials, Inc.) (20250501)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

Yang YANG of San Diego CA (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • Applied Materials, Inc.: 3 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250140541. REAL-TIME PLASMA MEASUREMENT AND CONTROL (Applied Materials, Inc.) (20250501)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

A N M Wasekul AZAD of Santa Clara CA (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • Applied Materials, Inc.: 3 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250140541. REAL-TIME PLASMA MEASUREMENT AND CONTROL (Applied Materials, Inc.) (20250501)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

Alok Ranjan of Austin TX (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250022689. GAS CLUSTER ASSISTED PLASMA PROCESSING (Tokyo Electron Limited) (20250116)
  • 20250079178. REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL (Tokyo Electron Limited) (20250306)
  • 20250149295. SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250508)

Nathan STAFFORD of Newark DE (US)

• Number of Plasma Technology patents: 3
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Societe Anonyme pour l'Etude et l’Exploitation des Procedes Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250166974. SULFUR-CONTAINING MOLECULES FOR HIGH ASPECT RATIO PLASMA ETCHING PROCESSES (L'Air Liquide, Societe Anonyme pour l'Etude et l’Exploitation des Procedes Georges Claude) (20250522)

Mitsunori Ohata

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250079128. PROCESSING SUBSTRATES WITH PLASMA MODULATED BY DC MAGNETIC FIELDS (Tokyo Electron Limited) (20250306)
  • 20250079178. REMOTE SOURCE PULSING WITH ADVANCED PULSE CONTROL (Tokyo Electron Limited) (20250306)
  • 20250149295. SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250508)

Takashi ARAMAKI

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250079138. SUBSTRATE PROCESSING SYSTEM AND METHOD FOR INSTALLING EDGE RING (Tokyo Electron Limited) (20250306)
  • 20250112031. SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING SYSTEM, AND CLEANING METHOD (Tokyo Electron Limited) (20250403)
  • 20250104979. SUBSTRATE PROCESSING SYSTEM (Tokyo Electron Limited) (20250327)

Kenichi KUWAHARA

• Number of Plasma Technology patents: 3
• Top companies:
  • Hitachi High-Tech Corporation: 2 patents
  • HITACHI HIGH-TECH CORPORATION: 1 patents
• Recent patents:
  • 20250095963. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250320)
  • 20250029818. PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE (HITACHI HIGH-TECH CORPORATION) (20250123)
  • 20250105020. PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20250327)

Eiki KAMATA

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250095973. Plasma Processing Apparatus and Method for Measuring Resonance Frequency (Tokyo Electron Limited) (20250320)
  • 20250104972. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited) (20250327)
  • 20250104977. Plasma Source and Plasma Processing Apparatus (Tokyo Electron Limited) (20250327)

Satoru NAKAMURA

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250166980. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250522)
  • 20250149315. ADJUSTMENT METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149316. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)

Toshihisa OZU

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250166980. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250522)
  • 20250149315. ADJUSTMENT METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149316. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)

Naoki MATSUMOTO

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250166980. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250522)
  • 20250149315. ADJUSTMENT METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)
  • 20250149316. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250508)

Masaki HIRAYAMA

• Number of Plasma Technology patents: 3
• Top companies:
  • Tokyo Electron Limited: 3 patents
• Recent patents:
  • 20250014863. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)
  • 20250014864. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250109)
  • 20250104971. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250327)

Tomoaki HYODO

• Number of Plasma Technology patents: 2
• Top companies:
  • Hitachi High-Tech Corporation: 2 patents
• Recent patents:
  • 20250118541. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250410)
  • 20250140532. PLASMA PROCESSING APPARATUS AND MANUFACTURING METHOD OF WAFER STAGE FOR PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250501)

Shintaro NAKATANI

• Number of Plasma Technology patents: 2
• Top companies:
  • Hitachi High-Tech Corporation: 2 patents
• Recent patents:
  • 20250118541. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250410)
  • 20250140532. PLASMA PROCESSING APPARATUS AND MANUFACTURING METHOD OF WAFER STAGE FOR PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250501)

Takamasa ICHINO

• Number of Plasma Technology patents: 2
• Top companies:
  • Hitachi High-Tech Corporation: 2 patents
• Recent patents:
  • 20250118541. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250410)
  • 20250140532. PLASMA PROCESSING APPARATUS AND MANUFACTURING METHOD OF WAFER STAGE FOR PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250501)

Yuki TANAKA

• Number of Plasma Technology patents: 2
• Top companies:
  • Hitachi High-Tech Corporation: 2 patents
• Recent patents:
  • 20250118541. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250410)
  • 20250140532. PLASMA PROCESSING APPARATUS AND MANUFACTURING METHOD OF WAFER STAGE FOR PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20250501)

Merritt Funk of Austin TX (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250069852. METHOD FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250227)
  • 20250014865. APPARATUS FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250109)

Chih-Teng LIAO

• Number of Plasma Technology patents: 2
• Top companies:
  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 1 patents
• Recent patents:
  • 20250069860. PLASMA PROCESSING METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.) (20250227)
  • 20250079177. METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250306)

Jonghwa LEE

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Jawon KO

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Taijo JEON

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Yunsong JEONG

• Number of Plasma Technology patents: 2
• Top companies:
  • SAMSUNG ELECTRONICS CO., LTD.: 2 patents
• Recent patents:
  • 20250069869. PLASMA ANALYZER, PLASMA PROCESSING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)
  • 20250069871. SENSOR APPARATUS, PLASMA PROCESSING APPARATUS INCLUDING THE SAME, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.) (20250227)

Kazushi KANEKO

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250006464. PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, AND STORAGE MEDIUM (Tokyo Electron Limited) (20250102)
  • 20250095973. Plasma Processing Apparatus and Method for Measuring Resonance Frequency (Tokyo Electron Limited) (20250320)

Kazuhiro ISHIKAWA

• Number of Plasma Technology patents: 2
• Top companies:
  • KYOCERA Corporation: 2 patents
• Recent patents:
  • 20250006468. PLASMA-RESISTANT LAMINATE, MANUFACTURING METHOD THEREFOR, AND PLASMA PROCESSING APPARATUS (KYOCERA Corporation) (20250102)
  • 20250129465. COMPONENT FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS INCLUDING COMPONENT (KYOCERA Corporation) (20250424)

Mohd Fairuz BIN BUDIMAN

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250046573. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20250206)
  • 20250157799. MONITORING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250515)

Nicolas J. BRIGHT of Arlington WA (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Applied Materials, Inc.: 2 patents
• Recent patents:
  • 20250046576. PLASMA PROCESSING ASSEMBLY FOR RF AND PVT INTEGRATION (Applied Materials, Inc.) (20250206)
  • 20250087462. RADIO-FREQUENCY (RF) MATCHING NETWORK AND TUNING TECHNIQUE (Applied Materials, Inc.) (20250313)

Shin YAMAGUCHI

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250132136. SUBSTRATE SUPPORT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20250424)
  • 20250140535. SUBSTRATE PROCESSING APPARATUS AND ELECTROSTATIC CHUCK (Tokyo Electron Limited) (20250501)

Shogo OKITA

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Takahiro MIYAI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Naoaki TAKEDA

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Toshiyuki TAKASAKI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Hisao NAGAI

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Seiya NAGANO

• Number of Plasma Technology patents: 2
• Top companies:
  • Panasonic Intellectual Property Management Co., Ltd.: 2 patents
• Recent patents:
  • 20250022682. PLASMA PROCESSING APPARATUS (Panasonic Intellectual Property Management Co., Ltd.) (20250116)
  • 20250014877. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Panasonic Intellectual Property Management Co., Ltd.) (20250109)

Peter Ventzek of Austin TX (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • Tokyo Electron Limited: 2 patents
• Recent patents:
  • 20250022689. GAS CLUSTER ASSISTED PLASMA PROCESSING (Tokyo Electron Limited) (20250116)
  • 20250149295. SYSTEMS AND METHODS OF CONTROL FOR PLASMA PROCESSING (Tokyo Electron Limited) (20250508)

Tzu-Ging Lin

• Number of Plasma Technology patents: 2
• Top companies:
  • Taiwan Semiconductor Manufacturing Company, Ltd.: 2 patents
• Recent patents:
  • 20250022715. PLASMA ETCHING PROCESSES (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250116)
  • 20250015166. SEMICONDUCTOR DEVICES AND METHODS FOR MANUFACTURING (Taiwan Semiconductor Manufacturing Company, Ltd.) (20250109)

Colin JENNINGS of Newark DE (US)

• Number of Plasma Technology patents: 2
• Top companies:
  • L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
  • L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude: 1 patents
• Recent patents:
  • 20250079127. DIELECTRIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour L'Etude et l'Exploitation des Procédés Georges Claude) (20250306)
  • 20250079183. CRYOGENIC PLASMA ETCHING USING C2H2F2 (L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude) (20250306)

Top Collaborations in Plasma Technology

Top US States for Plasma Technology Inventors

Top Cities for Plasma Technology Inventors

• Miyagi: 116 inventors
• Tokyo: 77 inventors
• Suwon-si: 33 inventors
• San Jose: 20 inventors
• Austin: 18 inventors
• Yamanashi: 17 inventors
• Shanghai: 17 inventors
• Hsinchu: 15 inventors
• Taoyuan City: 13 inventors
• Daejeon: 12 inventors
• Kurokawa-gun: 12 inventors
• Beijing: 12 inventors
• Newark: 12 inventors
• Hwaseong-si: 12 inventors
• Sunnyvale: 11 inventors
• Fremont: 11 inventors
• Cheonan-si: 10 inventors
• Albany: 9 inventors
• Hsinchu City: 9 inventors
• Newport: 8 inventors