Category:Ta-Chun LIN: Difference between revisions
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=== Executive Summary === | === Executive Summary === | ||
Ta-Chun LIN is an inventor who has filed | Ta-Chun LIN is an inventor who has filed 11 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Company, Ltd. (10 patents), TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (1 patents). Their most frequent collaborators include [[Category:Jhon Jhy Liaw|Jhon Jhy Liaw]] (3 collaborations), [[Category:Jhon-Jhy LIAW|Jhon-Jhy LIAW]] (2 collaborations), [[Category:Chun-Sheng Liang|Chun-Sheng Liang]] (2 collaborations). | ||
=== Patent Filing Activity === | === Patent Filing Activity === | ||
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* [[:Category:CPC_H01L29/0673|H01L29/0673]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents | * [[:Category:CPC_H01L29/0673|H01L29/0673]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents | ||
* [[:Category:CPC_H01L29/775|H01L29/775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents | * [[:Category:CPC_H01L29/775|H01L29/775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents | ||
* [[:Category:CPC_H10D84/038|H10D84/038]] (No explanation available): 5 patents | |||
* [[:Category:CPC_H01L29/66439|H01L29/66439]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents | * [[:Category:CPC_H01L29/66439|H01L29/66439]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents | ||
* [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 4 patents | * [[:Category:CPC_H01L29/66545|H01L29/66545]] ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 4 patents | ||
* [[:Category:CPC_H01L29/66553|H01L29/66553]] ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 3 patents | * [[:Category:CPC_H01L29/66553|H01L29/66553]] ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 3 patents | ||
* [[:Category:CPC_H10D62/121|H10D62/121]] (No explanation available): 3 patents | |||
* [[:Category:CPC_H10D30/014|H10D30/014]] (No explanation available): 3 patents | |||
* [[:Category:CPC_H10D30/43|H10D30/43]] (No explanation available): 3 patents | |||
* [[:Category:CPC_H10D30/6735|H10D30/6735]] (No explanation available): 3 patents | |||
* [[:Category:CPC_H10D30/6757|H10D30/6757]] (No explanation available): 3 patents | |||
* [[:Category:CPC_H10D64/017|H10D64/017]] (No explanation available): 3 patents | |||
* [[:Category:CPC_H10D84/0151|H10D84/0151]] (No explanation available): 3 patents | |||
* [[:Category:CPC_H10D84/83|H10D84/83]] (No explanation available): 3 patents | |||
* [[:Category:CPC_H01L27/088|H01L27/088]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents | * [[:Category:CPC_H01L27/088|H01L27/088]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents | ||
* [[:Category:CPC_H01L29/41775|H01L29/41775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents | * [[:Category:CPC_H01L29/41775|H01L29/41775]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents | ||
* [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents | * [[:Category:CPC_H01L29/0847|H01L29/0847]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents | ||
* [[:Category:CPC_H10D30/6729|H10D30/6729]] (No explanation available): 2 patents | |||
* [[:Category:CPC_H10D64/021|H10D64/021]] (No explanation available): 2 patents | |||
* [[:Category:CPC_H10D84/0147|H10D84/0147]] (No explanation available): 2 patents | |||
* [[:Category:CPC_H01L21/823481|H01L21/823481]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents | * [[:Category:CPC_H01L21/823481|H01L21/823481]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents | ||
* [[:Category:CPC_H01L27/092|H01L27/092]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | * [[:Category:CPC_H01L27/092|H01L27/092]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | ||
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* [[:Category:CPC_H01L29/6653|H01L29/6653]] ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 1 patents | * [[:Category:CPC_H01L29/6653|H01L29/6653]] ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 1 patents | ||
* [[:Category:CPC_H01L21/823475|H01L21/823475]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents | * [[:Category:CPC_H01L21/823475|H01L21/823475]] (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents | ||
* [[:Category:CPC_H01L21/76804|H01L21/76804]] ({by forming tapered via holes}): 1 patents | * [[:Category:CPC_H01L21/76804|H01L21/76804]] ({by forming tapered via holes}): 1 patents | ||
* [[:Category:CPC_H01L23/5226|H01L23/5226]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | * [[:Category:CPC_H01L23/5226|H01L23/5226]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | ||
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* [[:Category:CPC_H10D30/6211|H10D30/6211]] (No explanation available): 1 patents | * [[:Category:CPC_H10D30/6211|H10D30/6211]] (No explanation available): 1 patents | ||
* [[:Category:CPC_H10D62/115|H10D62/115]] (No explanation available): 1 patents | * [[:Category:CPC_H10D62/115|H10D62/115]] (No explanation available): 1 patents | ||
* [[:Category:CPC_H10D84/0158|H10D84/0158]] (No explanation available): 1 patents | * [[:Category:CPC_H10D84/0158|H10D84/0158]] (No explanation available): 1 patents | ||
* [[:Category:CPC_H01L29/41733|H01L29/41733]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | * [[:Category:CPC_H01L29/41733|H01L29/41733]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | ||
* [[:Category:CPC_H01L21/28518|H01L21/28518]] (from a gas or vapour, e.g. condensation): 1 patents | * [[:Category:CPC_H01L21/28518|H01L21/28518]] (from a gas or vapour, e.g. condensation): 1 patents | ||
* [[:Category:CPC_H01L29/401|H01L29/401]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | * [[:Category:CPC_H01L29/401|H01L29/401]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | ||
* [[:Category:CPC_H10D84/0167|H10D84/0167]] (No explanation available): 1 patents | * [[:Category:CPC_H10D84/0167|H10D84/0167]] (No explanation available): 1 patents | ||
* [[:Category:CPC_H10D84/017|H10D84/017]] (No explanation available): 1 patents | * [[:Category:CPC_H10D84/017|H10D84/017]] (No explanation available): 1 patents | ||
* [[:Category:CPC_H10D84/85|H10D84/85]] (No explanation available): 1 patents | * [[:Category:CPC_H10D84/85|H10D84/85]] (No explanation available): 1 patents | ||
* [[:Category:CPC_H10D62/151|H10D62/151]] (No explanation available): 1 patents | |||
* [[:Category:CPC_H10D84/013|H10D84/013]] (No explanation available): 1 patents | |||
* [[:Category:CPC_H10D84/0135|H10D84/0135]] (No explanation available): 1 patents | |||
* [[:Category:CPC_H01L29/41766|H01L29/41766]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | * [[:Category:CPC_H01L29/41766|H01L29/41766]] (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents | ||
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==== List of Companies ==== | ==== List of Companies ==== | ||
* Taiwan Semiconductor Manufacturing Company, Ltd.: | * Taiwan Semiconductor Manufacturing Company, Ltd.: 10 patents | ||
* TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents | * TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents | ||
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* [[:Category:Jhon Jhy LIAW|Jhon Jhy LIAW]][[Category:Jhon Jhy LIAW]] (1 collaborations) | * [[:Category:Jhon Jhy LIAW|Jhon Jhy LIAW]][[Category:Jhon Jhy LIAW]] (1 collaborations) | ||
* [[:Category:Ming-Heng TSAI|Ming-Heng TSAI]][[Category:Ming-Heng TSAI]] (1 collaborations) | * [[:Category:Ming-Heng TSAI|Ming-Heng TSAI]][[Category:Ming-Heng TSAI]] (1 collaborations) | ||
* [[:Category:Tzu-Hung LIU|Tzu-Hung LIU]][[Category:Tzu-Hung LIU]] (1 collaborations) | |||
* [[:Category:Chi-Hsin CHANG|Chi-Hsin CHANG]][[Category:Chi-Hsin CHANG]] (1 collaborations) | |||
* [[:Category:Chun-Sheng LIANG|Chun-Sheng LIANG]][[Category:Chun-Sheng LIANG]] (1 collaborations) | |||
* [[:Category:Chih-Hao CHANG|Chih-Hao CHANG]][[Category:Chih-Hao CHANG]] (1 collaborations) | |||
* [[:Category:Huang-Chao Chang|Huang-Chao Chang]][[Category:Huang-Chao Chang]] (1 collaborations) | * [[:Category:Huang-Chao Chang|Huang-Chao Chang]][[Category:Huang-Chao Chang]] (1 collaborations) | ||
* [[:Category:Yen-Cheng Lai|Yen-Cheng Lai]][[Category:Yen-Cheng Lai]] (1 collaborations) | * [[:Category:Yen-Cheng Lai|Yen-Cheng Lai]][[Category:Yen-Cheng Lai]] (1 collaborations) | ||
Latest revision as of 08:40, 2 May 2025
Ta-Chun LIN
Executive Summary
Ta-Chun LIN is an inventor who has filed 11 patents. Their primary areas of innovation include SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), SEMICONDUCTOR DEVICES NOT COVERED BY CLASS (6 patents), and they have worked with companies such as Taiwan Semiconductor Manufacturing Company, Ltd. (10 patents), TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (1 patents). Their most frequent collaborators include (3 collaborations), (2 collaborations), (2 collaborations).
Patent Filing Activity
Technology Areas
List of Technology Areas
- H01L29/42392 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
- H01L29/0673 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
- H01L29/775 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 6 patents
- H10D84/038 (No explanation available): 5 patents
- H01L29/66439 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 4 patents
- H01L29/66545 ({using a dummy, i.e. replacement gate in a process wherein at least a part of the final gate is self aligned to the dummy gate}): 4 patents
- H01L29/66553 ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 3 patents
- H10D62/121 (No explanation available): 3 patents
- H10D30/014 (No explanation available): 3 patents
- H10D30/43 (No explanation available): 3 patents
- H10D30/6735 (No explanation available): 3 patents
- H10D30/6757 (No explanation available): 3 patents
- H10D64/017 (No explanation available): 3 patents
- H10D84/0151 (No explanation available): 3 patents
- H10D84/83 (No explanation available): 3 patents
- H01L27/088 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
- H01L29/41775 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 3 patents
- H01L29/0847 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 2 patents
- H10D30/6729 (No explanation available): 2 patents
- H10D64/021 (No explanation available): 2 patents
- H10D84/0147 (No explanation available): 2 patents
- H01L21/823481 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 2 patents
- H01L27/092 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
- H01L2029/42388 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
- H01L29/6653 ({using self aligned silicidation, i.e. salicide (formation of conductive layers comprising silicides): 1 patents
- H01L21/823475 (to produce devices, e.g. integrated circuits, each consisting of a plurality of components): 1 patents
- H01L21/76804 ({by forming tapered via holes}): 1 patents
- H01L23/5226 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
- H10D84/0149 (No explanation available): 1 patents
- H10D84/834 (No explanation available): 1 patents
- H10D30/0243 (No explanation available): 1 patents
- H10D30/6211 (No explanation available): 1 patents
- H10D62/115 (No explanation available): 1 patents
- H10D84/0158 (No explanation available): 1 patents
- H01L29/41733 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
- H01L21/28518 (from a gas or vapour, e.g. condensation): 1 patents
- H01L29/401 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
- H10D84/0167 (No explanation available): 1 patents
- H10D84/017 (No explanation available): 1 patents
- H10D84/85 (No explanation available): 1 patents
- H10D62/151 (No explanation available): 1 patents
- H10D84/013 (No explanation available): 1 patents
- H10D84/0135 (No explanation available): 1 patents
- H01L29/41766 (SEMICONDUCTOR DEVICES NOT COVERED BY CLASS): 1 patents
Companies
List of Companies
- Taiwan Semiconductor Manufacturing Company, Ltd.: 10 patents
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents
Collaborators
- Jhon Jhy Liaw (3 collaborations)
- Jhon-Jhy LIAW (2 collaborations)
- Chun-Sheng Liang (2 collaborations)
- Chun-Wing Yeung (1 collaborations)
- Feng-Ming CHANG (1 collaborations)
- Ming-Heng Tsai (1 collaborations)
- Kuo-Hua PAN (1 collaborations)
- Jhon Jhy LIAW (1 collaborations)
- Ming-Heng TSAI (1 collaborations)
- Tzu-Hung LIU (1 collaborations)
- Chi-Hsin CHANG (1 collaborations)
- Chun-Sheng LIANG (1 collaborations)
- Chih-Hao CHANG (1 collaborations)
- Huang-Chao Chang (1 collaborations)
- Yen-Cheng Lai (1 collaborations)
- Wen-Chiang Hong (1 collaborations)
- Chih-Hao Chang (1 collaborations)
Subcategories
This category has the following 5 subcategories, out of 5 total.
C
J
T
Categories:
- Jhon Jhy Liaw
- Jhon-Jhy LIAW
- Chun-Sheng Liang
- Chun-Wing Yeung
- Feng-Ming CHANG
- Ming-Heng Tsai
- Kuo-Hua PAN
- Jhon Jhy LIAW
- Ming-Heng TSAI
- Tzu-Hung LIU
- Chi-Hsin CHANG
- Chun-Sheng LIANG
- Chih-Hao CHANG
- Huang-Chao Chang
- Yen-Cheng Lai
- Wen-Chiang Hong
- Chih-Hao Chang
- Ta-Chun LIN
- Inventors
- Inventors filing patents with Taiwan Semiconductor Manufacturing Company, Ltd.
- Inventors filing patents with TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.