Difference between revisions of "Plasma Technology Patent Application Trends 2024"
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== Plasma Technology Patent Application Filing Activity == | == Plasma Technology Patent Application Filing Activity == | ||
| − | == Plasma Technology patent applications in | + | == Plasma Technology patent applications in 2025 == |
| − | [[File: | + | [[File:Plasma_Technology_Monthly_Patent_Applications_2025_-_Up_to_ 2025.png|border|800px]] |
== Top Technology Areas in Plasma Technology == | == Top Technology Areas in Plasma Technology == | ||
| − | [[File: | + | [[File:Top_Technology_Areas_in_Plasma_Technology_2025_-_Up_to_ 2025.png|border|800px]] |
=== Top CPC Codes === | === Top CPC Codes === | ||
* [[:Category:CPC_H01J2237/334|H01J2237/334]] (No explanation available) | * [[:Category:CPC_H01J2237/334|H01J2237/334]] (No explanation available) | ||
| − | ** Count: | + | ** Count: 83 patents |
** Example: [[20240234097. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] | ** Example: [[20240234097. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] | ||
* [[:Category:CPC_H01J37/32715|H01J37/32715]] (No explanation available) | * [[:Category:CPC_H01J37/32715|H01J37/32715]] (No explanation available) | ||
| Line 14: | Line 14: | ||
** Example: [[20240234102. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited)]] | ** Example: [[20240234102. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited)]] | ||
* [[:Category:CPC_H01J37/32449|H01J37/32449]] (No explanation available) | * [[:Category:CPC_H01J37/32449|H01J37/32449]] (No explanation available) | ||
| − | ** Count: | + | ** Count: 50 patents |
** Example: [[20240234113. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] | ** Example: [[20240234113. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] | ||
* [[:Category:CPC_H01J37/32183|H01J37/32183]] (No explanation available) | * [[:Category:CPC_H01J37/32183|H01J37/32183]] (No explanation available) | ||
| − | ** Count: | + | ** Count: 46 patents |
** Example: [[20240234092. FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] | ** Example: [[20240234092. FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] | ||
* [[:Category:CPC_H01J37/32568|H01J37/32568]] (No explanation available) | * [[:Category:CPC_H01J37/32568|H01J37/32568]] (No explanation available) | ||
| − | ** Count: | + | ** Count: 42 patents |
** Example: [[20240234104. MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE (Lam Research Corporation)]] | ** Example: [[20240234104. MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE (Lam Research Corporation)]] | ||
* [[:Category:CPC_H01J37/3244|H01J37/3244]] (No explanation available) | * [[:Category:CPC_H01J37/3244|H01J37/3244]] (No explanation available) | ||
| − | ** Count: | + | ** Count: 38 patents |
** Example: [[20240234096. PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)]] | ** Example: [[20240234096. PLASMA PROCESSING APPARATUS AND METHOD FOR FABRICATING SEMICONDUCTOR DEVICE USING THE SAME (SAMSUNG ELECTRONICS CO., LTD.)]] | ||
* [[:Category:CPC_H01J37/32091|H01J37/32091]] (No explanation available) | * [[:Category:CPC_H01J37/32091|H01J37/32091]] (No explanation available) | ||
| Line 32: | Line 32: | ||
** Example: [[20240234099. FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] | ** Example: [[20240234099. FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] | ||
* [[:Category:CPC_H01J37/32174|H01J37/32174]] (No explanation available) | * [[:Category:CPC_H01J37/32174|H01J37/32174]] (No explanation available) | ||
| + | ** Count: 34 patents | ||
| + | ** Example: [[20240429027. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] | ||
| + | * [[:Category:CPC_H01J37/32642|H01J37/32642]] (No explanation available) | ||
** Count: 33 patents | ** Count: 33 patents | ||
| − | |||
| − | |||
| − | |||
** Example: [[20240234102. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited)]] | ** Example: [[20240234102. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited)]] | ||
| Line 42: | Line 42: | ||
=== [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] === | === [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]] === | ||
| − | * Number of Plasma Technology patents: | + | * Number of Plasma Technology patents: 167 |
* Top CPC codes: | * Top CPC codes: | ||
| + | ** [[:Category:CPC_H01J2237/334|H01J2237/334]] (No explanation available): 40 patents | ||
** [[:Category:CPC_H01J37/32715|H01J37/32715]] (No explanation available): 39 patents | ** [[:Category:CPC_H01J37/32715|H01J37/32715]] (No explanation available): 39 patents | ||
| − | + | ** [[:Category:CPC_H01J37/32449|H01J37/32449]] (No explanation available): 29 patents | |
| − | ** [[:Category:CPC_H01J37/32449|H01J37/32449]] (No explanation available): | ||
* Recent patents: | * Recent patents: | ||
** [[20240047182. PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK (Tokyo Electron Limited)]] (20240208) | ** [[20240047182. PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK (Tokyo Electron Limited)]] (20240208) | ||
| Line 62: | Line 62: | ||
** [[20240047246. ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING CHAMBER (Applied Materials, Inc.)]] (20240208) | ** [[20240047246. ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING CHAMBER (Applied Materials, Inc.)]] (20240208) | ||
=== [[:Category:Lam Research Corporation|Lam Research Corporation]] === | === [[:Category:Lam Research Corporation|Lam Research Corporation]] === | ||
| − | * Number of Plasma Technology patents: | + | * Number of Plasma Technology patents: 22 |
* Top CPC codes: | * Top CPC codes: | ||
** [[:Category:CPC_H01L21/67069|H01L21/67069]] (No explanation available): 7 patents | ** [[:Category:CPC_H01L21/67069|H01L21/67069]] (No explanation available): 7 patents | ||
| Line 102: | Line 102: | ||
** [[20240331974. PLASMA PROCESSING APPARATUS (HITACHI HIGH-TECH CORPORATION)]] (20241003) | ** [[20240331974. PLASMA PROCESSING APPARATUS (HITACHI HIGH-TECH CORPORATION)]] (20241003) | ||
=== [[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]] === | === [[:Category:SAMSUNG ELECTRONICS CO., LTD.|SAMSUNG ELECTRONICS CO., LTD.]] === | ||
| − | * Number of Plasma Technology patents: | + | * Number of Plasma Technology patents: 8 |
* Top CPC codes: | * Top CPC codes: | ||
| + | ** [[:Category:CPC_H01J2237/334|H01J2237/334]] (No explanation available): 4 patents | ||
** [[:Category:CPC_H01J37/3244|H01J37/3244]] (No explanation available): 3 patents | ** [[:Category:CPC_H01J37/3244|H01J37/3244]] (No explanation available): 3 patents | ||
| − | + | ** [[:Category:CPC_H01J37/32642|H01J37/32642]] (No explanation available): 3 patents | |
| − | ** [[:Category:CPC_H01J37/ | ||
* Recent patents: | * Recent patents: | ||
** [[20240212992. PLASMA PROCESSING APPARATUS AND METHOD (SAMSUNG ELECTRONICS CO., LTD.)]] (20240627) | ** [[20240212992. PLASMA PROCESSING APPARATUS AND METHOD (SAMSUNG ELECTRONICS CO., LTD.)]] (20240627) | ||
| Line 131: | Line 131: | ||
** [[20240194452. BIAS SUPPLY WITH RESONANT SWITCHING (Advanced Energy Industries, Inc.)]] (20240613) | ** [[20240194452. BIAS SUPPLY WITH RESONANT SWITCHING (Advanced Energy Industries, Inc.)]] (20240613) | ||
** [[20240030001. BIAS SUPPLY WITH A SINGLE CONTROLLED SWITCH (Advanced Energy Industries, Inc.)]] (20240125) | ** [[20240030001. BIAS SUPPLY WITH A SINGLE CONTROLLED SWITCH (Advanced Energy Industries, Inc.)]] (20240125) | ||
| − | === [[:Category: | + | === [[:Category:Taiwan Semiconductor Manufacturing Company, Ltd.|Taiwan Semiconductor Manufacturing Company, Ltd.]] === |
* Number of Plasma Technology patents: 6 | * Number of Plasma Technology patents: 6 | ||
* Top CPC codes: | * Top CPC codes: | ||
| − | ** [[:Category: | + | ** [[:Category:CPC_H01L21/32136|H01L21/32136]] (No explanation available): 2 patents |
| − | ** [[:Category: | + | ** [[:Category:CPC_H01L21/0337|H01L21/0337]] (No explanation available): 2 patents |
| − | ** [[:Category: | + | ** [[:Category:CPC_H01L29/66795|H01L29/66795]] (No explanation available): 2 patents |
* Recent patents: | * Recent patents: | ||
| − | ** [[ | + | ** [[20240404860. PLASMA PROCESSING APPARATUS AND METHOD (Taiwan Semiconductor Manufacturing Company, Ltd.)]] (20241205) |
| − | ** [[ | + | ** [[20240168371. SELECTIVE HARDMASK ON HARDMASK (Taiwan Semiconductor Manufacturing Company, Ltd.)]] (20240523) |
| − | ** [[ | + | ** [[20240363450. METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCTOR PACKAGE AND PHOTORESIST SCUM DETECTION APPARATUS (Taiwan Semiconductor Manufacturing Company, Ltd.)]] (20241031) |
== New Companies in Plasma Technology (Last Month) == | == New Companies in Plasma Technology (Last Month) == | ||
| Line 209: | Line 209: | ||
** [[20240152114. RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALGORITHMS (Applied Materials, Inc.)]] (20240509) | ** [[20240152114. RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALGORITHMS (Applied Materials, Inc.)]] (20240509) | ||
** [[20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.)]] (20240125) | ** [[20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.)]] (20240125) | ||
| + | === [[:Category:Chishio KOSHIMIZU|Chishio KOSHIMIZU]] === | ||
| + | * Number of Plasma Technology patents: 11 | ||
| + | * Top companies: | ||
| + | ** [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]: 11 patents | ||
| + | * Recent patents: | ||
| + | ** [[20240112895. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Tokyo Electron Limited)]] (20240404) | ||
| + | ** [[20240087857. PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT (Tokyo Electron Limited)]] (20240314) | ||
| + | ** [[20240331978. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20241003) | ||
=== [[:Category:Taro IKEDA|Taro IKEDA]] === | === [[:Category:Taro IKEDA|Taro IKEDA]] === | ||
| − | * Number of Plasma Technology patents: | + | * Number of Plasma Technology patents: 11 |
* Top companies: | * Top companies: | ||
| − | ** [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]: | + | ** [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]: 9 patents |
** [[:Category:TOKYO ELECTRON LIMITED|TOKYO ELECTRON LIMITED]]: 2 patents | ** [[:Category:TOKYO ELECTRON LIMITED|TOKYO ELECTRON LIMITED]]: 2 patents | ||
* Recent patents: | * Recent patents: | ||
| Line 218: | Line 226: | ||
** [[20240038500. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240201) | ** [[20240038500. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240201) | ||
** [[20240030008. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED)]] (20240125) | ** [[20240030008. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED)]] (20240125) | ||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
=== [[:Category:Sergey Voronin|Sergey Voronin of Albany NY (US)]] === | === [[:Category:Sergey Voronin|Sergey Voronin of Albany NY (US)]] === | ||
* Number of Plasma Technology patents: 8 | * Number of Plasma Technology patents: 8 | ||
| Line 251: | Line 251: | ||
** [[20240371603. PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, PLASMA PROCESSING METHOD, ANALYSIS METHOD, AND STORAGE MEDIUM (Tokyo Electron Limited)]] (20241107) | ** [[20240371603. PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, PLASMA PROCESSING METHOD, ANALYSIS METHOD, AND STORAGE MEDIUM (Tokyo Electron Limited)]] (20241107) | ||
** [[20240136154. FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240425) | ** [[20240136154. FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240425) | ||
| + | === [[:Category:Eiki KAMATA|Eiki KAMATA]] === | ||
| + | * Number of Plasma Technology patents: 8 | ||
| + | * Top companies: | ||
| + | ** [[:Category:TOKYO ELECTRON LIMITED|TOKYO ELECTRON LIMITED]]: 4 patents | ||
| + | ** [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]: 4 patents | ||
| + | * Recent patents: | ||
| + | ** [[20240170260. PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED)]] (20240523) | ||
| + | ** [[20240030008. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED)]] (20240125) | ||
| + | ** [[20240030015. PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD (TOKYO ELECTRON LIMITED)]] (20240125) | ||
=== [[:Category:Peter Lowell George Ventzek|Peter Lowell George Ventzek of Austin TX (US)]] === | === [[:Category:Peter Lowell George Ventzek|Peter Lowell George Ventzek of Austin TX (US)]] === | ||
* Number of Plasma Technology patents: 8 | * Number of Plasma Technology patents: 8 | ||
| Line 259: | Line 268: | ||
** [[20240038506. Plasma Processing with Magnetic Ring X Point (Tokyo Electron Limited)]] (20240201) | ** [[20240038506. Plasma Processing with Magnetic Ring X Point (Tokyo Electron Limited)]] (20240201) | ||
** [[20240363310. Balanced RF Resonant Antenna System (Tokyo Electron Limited)]] (20241031) | ** [[20240363310. Balanced RF Resonant Antenna System (Tokyo Electron Limited)]] (20241031) | ||
| + | === [[:Category:Maju TOMURA|Maju TOMURA]] === | ||
| + | * Number of Plasma Technology patents: 7 | ||
| + | * Top companies: | ||
| + | ** [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]: 7 patents | ||
| + | * Recent patents: | ||
| + | ** [[20240153744. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240509) | ||
| + | ** [[20240321562. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240926) | ||
| + | ** [[20240030010. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240125) | ||
=== [[:Category:Masaki HIRAYAMA|Masaki HIRAYAMA]] === | === [[:Category:Masaki HIRAYAMA|Masaki HIRAYAMA]] === | ||
* Number of Plasma Technology patents: 7 | * Number of Plasma Technology patents: 7 | ||
| Line 268: | Line 285: | ||
** [[20240087849. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240314) | ** [[20240087849. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240314) | ||
** [[20240321550. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240926) | ** [[20240321550. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240926) | ||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
=== [[:Category:Barton Lane|Barton Lane of Austin TX (US)]] === | === [[:Category:Barton Lane|Barton Lane of Austin TX (US)]] === | ||
* Number of Plasma Technology patents: 6 | * Number of Plasma Technology patents: 6 | ||
| Line 285: | Line 293: | ||
** [[20240213005. System and Method for Plasma Processing (Tokyo Electron Limited)]] (20240627) | ** [[20240213005. System and Method for Plasma Processing (Tokyo Electron Limited)]] (20240627) | ||
** [[20240038506. Plasma Processing with Magnetic Ring X Point (Tokyo Electron Limited)]] (20240201) | ** [[20240038506. Plasma Processing with Magnetic Ring X Point (Tokyo Electron Limited)]] (20240201) | ||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
=== [[:Category:Blaze Messer|Blaze Messer of Albany NY (US)]] === | === [[:Category:Blaze Messer|Blaze Messer of Albany NY (US)]] === | ||
* Number of Plasma Technology patents: 5 | * Number of Plasma Technology patents: 5 | ||
| Line 403: | Line 403: | ||
* Recent patents: | * Recent patents: | ||
** [[20240213032. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240627) | ** [[20240213032. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240627) | ||
| + | ** [[20240321562. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240926) | ||
| + | ** [[20240030010. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240125) | ||
| + | === [[:Category:Yoshihide KIHARA|Yoshihide KIHARA]] === | ||
| + | * Number of Plasma Technology patents: 5 | ||
| + | * Top companies: | ||
| + | ** [[:Category:Tokyo Electron Limited|Tokyo Electron Limited]]: 5 patents | ||
| + | * Recent patents: | ||
| + | ** [[20240203698. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240620) | ||
** [[20240321562. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240926) | ** [[20240321562. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240926) | ||
** [[20240030010. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240125) | ** [[20240030010. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240125) | ||
| Line 453: | Line 461: | ||
** [[20240222078. PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM (Tokyo Electron Limited)]] (20240704) | ** [[20240222078. PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM (Tokyo Electron Limited)]] (20240704) | ||
** [[20240153742. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240509) | ** [[20240153742. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)]] (20240509) | ||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
| − | |||
=== [[:Category:Hiroyuki MATSUURA|Hiroyuki MATSUURA]] === | === [[:Category:Hiroyuki MATSUURA|Hiroyuki MATSUURA]] === | ||
* Number of Plasma Technology patents: 4 | * Number of Plasma Technology patents: 4 | ||
| Line 610: | Line 610: | ||
[[File:Top_20_Cities_for_Plasma_Technology_Inventors.png|border|800px]] | [[File:Top_20_Cities_for_Plasma_Technology_Inventors.png|border|800px]] | ||
| − | * Miyagi: | + | * Miyagi: 188 inventors |
| − | * Tokyo: | + | * Tokyo: 121 inventors |
* Kurokawa-gun: 72 inventors | * Kurokawa-gun: 72 inventors | ||
| − | * Suwon-si: | + | * Suwon-si: 64 inventors |
* Austin: 51 inventors | * Austin: 51 inventors | ||
| − | * Fremont: 41 inventors | + | * Yamanashi: 44 inventors |
| − | * | + | * Fremont: 43 inventors |
| + | * Santa Clara: 41 inventors | ||
| + | * San Jose: 41 inventors | ||
* Albany: 40 inventors | * Albany: 40 inventors | ||
| − | * | + | * Hsinchu: 22 inventors |
| − | |||
* Seoul: 20 inventors | * Seoul: 20 inventors | ||
* Nirasaki City: 18 inventors | * Nirasaki City: 18 inventors | ||
| − | + | * Sunnyvale: 15 inventors | |
| − | * Sunnyvale: | ||
* Pleasanton: 13 inventors | * Pleasanton: 13 inventors | ||
* Portland: 13 inventors | * Portland: 13 inventors | ||
Latest revision as of 17:27, 6 January 2025
Contents
- 1 Plasma Technology Patent Application Filing Activity
- 2 Plasma Technology patent applications in 2025
- 3 Top Technology Areas in Plasma Technology
- 4 Top Companies in Plasma Technology
- 4.1 Tokyo Electron Limited
- 4.2 Applied Materials, Inc.
- 4.3 Lam Research Corporation
- 4.4 Hitachi High-Tech Corporation
- 4.5 TOKYO ELECTRON LIMITED
- 4.6 HITACHI HIGH-TECH CORPORATION
- 4.7 SAMSUNG ELECTRONICS CO., LTD.
- 4.8 DISCO CORPORATION
- 4.9 Advanced Energy Industries, Inc.
- 4.10 Taiwan Semiconductor Manufacturing Company, Ltd.
- 5 New Companies in Plasma Technology (Last Month)
- 6 Emerging Technology Areas in Plasma Technology
- 7 Top Companies in Emerging Plasma Technology Technologies
- 8 Top Inventors in Plasma Technology
- 8.1 Kartik RAMASWAMY of San Jose CA (US)
- 8.2 Yue GUO of Redwood City CA (US)
- 8.3 Chishio KOSHIMIZU
- 8.4 Taro IKEDA
- 8.5 Sergey Voronin of Albany NY (US)
- 8.6 Yang YANG of San Diego CA (US)
- 8.7 Kazushi KANEKO
- 8.8 Eiki KAMATA
- 8.9 Peter Lowell George Ventzek of Austin TX (US)
- 8.10 Maju TOMURA
- 8.11 Masaki HIRAYAMA
- 8.12 Barton Lane of Austin TX (US)
- 8.13 Blaze Messer of Albany NY (US)
- 8.14 Yan Chen of Fremont CA (US)
- 8.15 Joel Ng of Fremont CA (US)
- 8.16 Ashawaraya Shalini of Fremont CA (US)
- 8.17 Ying Zhu of Fremont CA (US)
- 8.18 Merritt Funk of Austin TX (US)
- 8.19 Keren J. KANARIK of Los Altos CA (US)
- 8.20 Samantha SiamHwa TAN of Newark CA (US)
- 8.21 Yang PAN of Los Altos CA (US)
- 8.22 Jeffrey MARKS of Saratoga CA (US)
- 8.23 Linying CUI of Cupertino CA (US)
- 8.24 James ROGERS of Los Gatos CA (US)
- 8.25 Rajinder DHINDSA of Pleasanton CA (US)
- 8.26 Koki MUKAIYAMA
- 8.27 Yoshihide KIHARA
- 8.28 Shinji HIMORI
- 8.29 A N M Wasekul AZAD of Santa Clara CA (US)
- 8.30 Atsushi TAKAHASHI
- 8.31 Kazuki MOYAMA
- 8.32 Mitsunori Ohata
- 8.33 Gen TAMAMUSHI
- 8.34 Hiroyuki MATSUURA
- 8.35 Satoru KAWAKAMI
- 8.36 Shota YOSHIMURA
- 8.37 Jianping Zhao of Austin TX (US)
- 8.38 Qiang Wang of Austin TX (US)
- 8.39 Shin YAMAGUCHI
- 8.40 Makoto KATO
- 8.41 Hajime TAMURA
- 8.42 Kazuya NAGASEKI
- 8.43 Satoru TERUUCHI
- 8.44 Yasuharu SASAKI
- 8.45 Naoki MATSUMOTO
- 8.46 Da Song of Albany NY (US)
- 8.47 Shin MATSUURA
- 8.48 Chelsea DuBose of Austin TX (US)
- 8.49 Justin Moses of Austin TX (US)
- 8.50 Hiroyuki MIYASHITA
- 9 Top Collaborations in Plasma Technology
- 10 Top US States for Plasma Technology Inventors
- 11 Top Cities for Plasma Technology Inventors
Plasma Technology Patent Application Filing Activity
Plasma Technology patent applications in 2025
Top Technology Areas in Plasma Technology
Top CPC Codes
- H01J2237/334 (No explanation available)
- Count: 83 patents
- Example: 20240234097. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- H01J37/32715 (No explanation available)
- Count: 66 patents
- Example: 20240234102. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited)
- H01J37/32449 (No explanation available)
- Count: 50 patents
- Example: 20240234113. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- H01J37/32183 (No explanation available)
- Count: 46 patents
- Example: 20240234092. FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- H01J37/32568 (No explanation available)
- Count: 42 patents
- Example: 20240234104. MULTI-SECTIONAL PLASMA CONFINEMENT RING STRUCTURE (Lam Research Corporation)
- H01J37/3244 (No explanation available)
- H01J37/32091 (No explanation available)
- Count: 35 patents
- Example: 20240234087. PULSED VOLTAGE SOURCE FOR PLASMA PROCESSING APPLICATIONS (Applied Materials, Inc.)
- H01J37/32724 (No explanation available)
- Count: 34 patents
- Example: 20240234099. FORMING METHOD OF COMPONENT AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- H01J37/32174 (No explanation available)
- Count: 34 patents
- Example: 20240429027. PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- H01J37/32642 (No explanation available)
- Count: 33 patents
- Example: 20240234102. PLASMA PROCESSING SYSTEM AND EDGE RING REPLACEMENT METHOD (Tokyo Electron Limited)
Top Companies in Plasma Technology
Tokyo Electron Limited
- Number of Plasma Technology patents: 167
- Top CPC codes:
- H01J2237/334 (No explanation available): 40 patents
- H01J37/32715 (No explanation available): 39 patents
- H01J37/32449 (No explanation available): 29 patents
- Recent patents:
Applied Materials, Inc.
- Number of Plasma Technology patents: 36
- Top CPC codes:
- H01J37/32183 (No explanation available): 11 patents
- H01J37/32128 (No explanation available): 10 patents
- H01J2237/3341 (No explanation available): 8 patents
- Recent patents:
- 20240321610. SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR (Applied Materials, Inc.) (20240926)
- 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)
- 20240047246. ADVANCED TEMPERATURE CONTROL FOR WAFER CARRIER IN PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240208)
Lam Research Corporation
- Number of Plasma Technology patents: 22
- Top CPC codes:
- H01L21/67069 (No explanation available): 7 patents
- H01L21/6833 (No explanation available): 7 patents
- H01L21/67109 (No explanation available): 5 patents
- Recent patents:
- 20240363311. RF POWER COMPENSATION TO REDUCE DEPOSITION OR ETCH RATE CHANGES IN RESPONSE TO SUBSTRATE BULK RESISTIVITY VARIATIONS (Lam Research Corporation) (20241031)
- 20240218509. MINIMIZING RADICAL RECOMBINATION USING ALD SILICON OXIDE SURFACE COATING WITH INTERMITTENT RESTORATION PLASMA (Lam Research Corporation) (20240704)
- 20240322781. Multiple-Output Radiofrequency Matching Module and Associated Methods (Lam Research Corporation) (20240926)
Hitachi High-Tech Corporation
- Number of Plasma Technology patents: 17
- Top CPC codes:
- H01J2237/334 (No explanation available): 4 patents
- H01J37/32174 (No explanation available): 3 patents
- H01J37/32715 (No explanation available): 3 patents
- Recent patents:
- 20240047181. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20240208)
- 20240047239. PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD (Hitachi High-Tech Corporation) (20240208)
- 20240047258. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation) (20240208)
TOKYO ELECTRON LIMITED
- Number of Plasma Technology patents: 14
- Top CPC codes:
- H01J2237/334 (No explanation available): 3 patents
- H01J37/32247 (No explanation available): 3 patents
- H01J37/32513 (No explanation available): 2 patents
- Recent patents:
- 20240331977. PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20241003)
- 20240030008. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20240125)
- 20240030015. PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD (TOKYO ELECTRON LIMITED) (20240125)
HITACHI HIGH-TECH CORPORATION
- Number of Plasma Technology patents: 11
- Top CPC codes:
- H01J2237/334 (No explanation available): 6 patents
- H01J37/32449 (No explanation available): 3 patents
- H01J37/32972 (No explanation available): 3 patents
- Recent patents:
SAMSUNG ELECTRONICS CO., LTD.
- Number of Plasma Technology patents: 8
- Top CPC codes:
- H01J2237/334 (No explanation available): 4 patents
- H01J37/3244 (No explanation available): 3 patents
- H01J37/32642 (No explanation available): 3 patents
- Recent patents:
- 20240212992. PLASMA PROCESSING APPARATUS AND METHOD (SAMSUNG ELECTRONICS CO., LTD.) (20240627)
- 20240096649. SEMICONDUCTOR PROCESS SYSTEM AND GAS TREATMENT METHOD (SAMSUNG ELECTRONICS CO., LTD.) (20240321)
- 20240038536. PLASMA PROCESSING APPARATUS, WAFER TO WAFER BONDING SYSTEM AND WAFER TO WAFER BONDING METHOD (SAMSUNG ELECTRONICS CO., LTD.) (20240201)
DISCO CORPORATION
- Number of Plasma Technology patents: 7
- Top CPC codes:
- H01L21/304 (No explanation available): 3 patents
- H01L21/3065 (No explanation available): 3 patents
- H01L24/80 (No explanation available): 2 patents
- Recent patents:
Advanced Energy Industries, Inc.
- Number of Plasma Technology patents: 7
- Top CPC codes:
- H01J37/32174 (No explanation available): 2 patents
- H01J37/32935 (No explanation available): 2 patents
- H01L21/67069 (No explanation available): 2 patents
- Recent patents:
- 20240071721. SYSTEM, METHOD, AND APPARATUS FOR CONTROLLING ION ENERGY DISTRIBUTION IN PLASMA PROCESSING SYSTEMS (Advanced Energy Industries, Inc.) (20240229)
- 20240194452. BIAS SUPPLY WITH RESONANT SWITCHING (Advanced Energy Industries, Inc.) (20240613)
- 20240030001. BIAS SUPPLY WITH A SINGLE CONTROLLED SWITCH (Advanced Energy Industries, Inc.) (20240125)
Taiwan Semiconductor Manufacturing Company, Ltd.
- Number of Plasma Technology patents: 6
- Top CPC codes:
- H01L21/32136 (No explanation available): 2 patents
- H01L21/0337 (No explanation available): 2 patents
- H01L29/66795 (No explanation available): 2 patents
- Recent patents:
- 20240404860. PLASMA PROCESSING APPARATUS AND METHOD (Taiwan Semiconductor Manufacturing Company, Ltd.) (20241205)
- 20240168371. SELECTIVE HARDMASK ON HARDMASK (Taiwan Semiconductor Manufacturing Company, Ltd.) (20240523)
- 20240363450. METHOD OF DETECTING PHOTORESIST SCUM, METHOD OF FORMING SEMICONDUCTOR PACKAGE AND PHOTORESIST SCUM DETECTION APPARATUS (Taiwan Semiconductor Manufacturing Company, Ltd.) (20241031)
New Companies in Plasma Technology (Last Month)
No new companies detected in the last month.
Emerging Technology Areas in Plasma Technology
- H01L21/67063 (No explanation available)
- Count: 1 patents
- Example: 20240047258. PLASMA PROCESSING APPARATUS (Hitachi High-Tech Corporation)
- C23C4/04 (No explanation available)
- G03F7/70633 (No explanation available)
- Count: 1 patents
- Example: 20240030073. ETCH MONITORING AND PERFORMING (TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.)
- H01J2237/24578 (No explanation available)
- Count: 1 patents
- Example: 20240030015. PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD (TOKYO ELECTRON LIMITED)
- G05B15/02 (No explanation available)
- Count: 1 patents
- Example: 20240030015. PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD (TOKYO ELECTRON LIMITED)
- G01N25/72 (No explanation available)
- Count: 1 patents
- Example: 20240030012. DETECTION METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- G01M3/002 (No explanation available)
- Count: 1 patents
- Example: 20240030012. DETECTION METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- H01J2237/3342 (No explanation available)
- Count: 1 patents
- Example: 20240030010. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited)
- H05B6/62 (No explanation available)
- Count: 1 patents
- Example: 20240030009. PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROLLING METHOD (Tokyo Electron Limited)
- H05B6/54 (No explanation available)
- Count: 1 patents
- Example: 20240030009. PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROLLING METHOD (Tokyo Electron Limited)
Top Companies in Emerging Plasma Technology Technologies
- Tokyo Electron Limited: 5 patents
- TOKYO ELECTRON LIMITED: 2 patents
- Hitachi High-Tech Corporation: 1 patents
- TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.: 1 patents
- TOCALO Co., Ltd.: 1 patents
Top Inventors in Plasma Technology
Kartik RAMASWAMY of San Jose CA (US)
- Number of Plasma Technology patents: 13
- Top companies:
- Applied Materials, Inc.: 13 patents
- Recent patents:
- 20240194447. LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
- 20240152114. RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALGORITHMS (Applied Materials, Inc.) (20240509)
- 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)
Yue GUO of Redwood City CA (US)
- Number of Plasma Technology patents: 11
- Top companies:
- Applied Materials, Inc.: 11 patents
- Recent patents:
- 20240194447. LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
- 20240152114. RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALGORITHMS (Applied Materials, Inc.) (20240509)
- 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)
Chishio KOSHIMIZU
- Number of Plasma Technology patents: 11
- Top companies:
- Tokyo Electron Limited: 11 patents
- Recent patents:
Taro IKEDA
- Number of Plasma Technology patents: 11
- Top companies:
- Tokyo Electron Limited: 9 patents
- TOKYO ELECTRON LIMITED: 2 patents
- Recent patents:
Sergey Voronin of Albany NY (US)
- Number of Plasma Technology patents: 8
- Top companies:
- Tokyo Electron Limited: 8 patents
- Recent patents:
- 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)
- 20240096600. Substrate Bombardment with Ions having Targeted Mass using Pulsed Bias Phase Control (Tokyo Electron Limited) (20240321)
- 20240331979. Apparatus and Methods for Plasma Processing (Tokyo Electron Limited) (20241003)
Yang YANG of San Diego CA (US)
- Number of Plasma Technology patents: 8
- Top companies:
- Applied Materials, Inc.: 8 patents
- Recent patents:
- 20240177969. SOLID-STATE SWITCH BASED HIGH-SPEED PULSER WITH PLASMA IEDF MODIFICATION CAPABILITY THROUGH MULTILEVEL OUTPUT FUNCTIONALITY (Applied Materials, Inc.) (20240530)
- 20240194447. LEARNING BASED TUNING IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
- 20240152114. RADIO FREQUENCY IMPEDANCE MATCHING NETWORK WITH FLEXIBLE TUNING ALGORITHMS (Applied Materials, Inc.) (20240509)
Kazushi KANEKO
- Number of Plasma Technology patents: 8
- Top companies:
- Tokyo Electron Limited: 5 patents
- TOKYO ELECTRON LIMITED: 3 patents
- Recent patents:
- 20240203692. PLASMA PROCESSING APPARATUS AND PLASMA CONTROL METHOD (Tokyo Electron Limited) (20240620)
- 20240371603. PLASMA PROCESSING APPARATUS, ANALYSIS APPARATUS, PLASMA PROCESSING METHOD, ANALYSIS METHOD, AND STORAGE MEDIUM (Tokyo Electron Limited) (20241107)
- 20240136154. FREQUENCY-VARIABLE POWER SUPPLY AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240425)
Eiki KAMATA
- Number of Plasma Technology patents: 8
- Top companies:
- TOKYO ELECTRON LIMITED: 4 patents
- Tokyo Electron Limited: 4 patents
- Recent patents:
- 20240170260. PLASMA PROCESSING DEVICE, AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20240523)
- 20240030008. PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD (TOKYO ELECTRON LIMITED) (20240125)
- 20240030015. PLASMA PROCESSING APPARATUS AND PLASMA STATE ESTIMATION METHOD (TOKYO ELECTRON LIMITED) (20240125)
Peter Lowell George Ventzek of Austin TX (US)
- Number of Plasma Technology patents: 8
- Top companies:
- Tokyo Electron Limited: 8 patents
- Recent patents:
Maju TOMURA
- Number of Plasma Technology patents: 7
- Top companies:
- Tokyo Electron Limited: 7 patents
- Recent patents:
Masaki HIRAYAMA
- Number of Plasma Technology patents: 7
- Top companies:
- Tokyo Electron Limited: 6 patents
- TOKYO ELECTRON LIMITED: 1 patents
- Recent patents:
Barton Lane of Austin TX (US)
- Number of Plasma Technology patents: 6
- Top companies:
- Tokyo Electron Limited: 6 patents
- Recent patents:
Blaze Messer of Albany NY (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Tokyo Electron Limited: 5 patents
- Recent patents:
- 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
- 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
- 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)
Yan Chen of Fremont CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Tokyo Electron Limited: 5 patents
- Recent patents:
- 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
- 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
- 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)
Joel Ng of Fremont CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Tokyo Electron Limited: 5 patents
- Recent patents:
- 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
- 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
- 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)
Ashawaraya Shalini of Fremont CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Tokyo Electron Limited: 5 patents
- Recent patents:
- 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
- 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
- 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)
Ying Zhu of Fremont CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Tokyo Electron Limited: 5 patents
- Recent patents:
- 20240133742. Time-Resolved OES Data Collection (Tokyo Electron Limited) (20240425)
- 20240136164. Method for OES Data Collection and Endpoint Detection (Tokyo Electron Limited) (20240425)
- 20240094056. Optical Emission Spectroscopy for Advanced Process Characterization (Tokyo Electron Limited) (20240321)
Merritt Funk of Austin TX (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Tokyo Electron Limited: 5 patents
- Recent patents:
Keren J. KANARIK of Los Altos CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Lam Research Corporation: 5 patents
- Recent patents:
- 20240203759. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
- 20240203760. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
- 20240178014. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240530)
Samantha SiamHwa TAN of Newark CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Lam Research Corporation: 5 patents
- Recent patents:
- 20240203759. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
- 20240203760. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
- 20240178014. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240530)
Yang PAN of Los Altos CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Lam Research Corporation: 5 patents
- Recent patents:
- 20240203759. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
- 20240203760. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
- 20240178014. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240530)
Jeffrey MARKS of Saratoga CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Lam Research Corporation: 5 patents
- Recent patents:
- 20240203759. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
- 20240203760. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240620)
- 20240178014. PLASMA ETCHING CHEMISTRIES OF HIGH ASPECT RATIO FEATURES IN DIELECTRICS (Lam Research Corporation) (20240530)
Linying CUI of Cupertino CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Applied Materials, Inc.: 5 patents
- Recent patents:
- 20240194446. CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
- 20240153741. MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TUNING (Applied Materials, Inc.) (20240509)
- 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)
James ROGERS of Los Gatos CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Applied Materials, Inc.: 5 patents
- Recent patents:
- 20240194446. CHAMBER IMPEDANCE MANAGEMENT IN A PROCESSING CHAMBER (Applied Materials, Inc.) (20240613)
- 20240153741. MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TUNING (Applied Materials, Inc.) (20240509)
- 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)
Rajinder DHINDSA of Pleasanton CA (US)
- Number of Plasma Technology patents: 5
- Top companies:
- Applied Materials, Inc.: 5 patents
- Recent patents:
- 20240153741. MULTI-SHAPE VOLTAGE PULSE TRAINS FOR UNIFORMITY AND ETCH PROFILE TUNING (Applied Materials, Inc.) (20240509)
- 20240321610. SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR (Applied Materials, Inc.) (20240926)
- 20240030002. PLASMA PROCESSING ASSEMBLY USING PULSED-VOLTAGE AND RADIO-FREQUENCY POWER (Applied Materials, Inc.) (20240125)
Koki MUKAIYAMA
- Number of Plasma Technology patents: 5
- Top companies:
- Tokyo Electron Limited: 5 patents
- Recent patents:
Yoshihide KIHARA
- Number of Plasma Technology patents: 5
- Top companies:
- Tokyo Electron Limited: 5 patents
- Recent patents:
Shinji HIMORI
- Number of Plasma Technology patents: 5
- Top companies:
- Tokyo Electron Limited: 5 patents
- Recent patents:
- 20240096608. PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240321)
- 20240068921. PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240229)
- 20240194459. PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
A N M Wasekul AZAD of Santa Clara CA (US)
- Number of Plasma Technology patents: 4
- Top companies:
- Applied Materials, Inc.: 4 patents
- Recent patents:
- 20240290578. RADIO FREQUENCY DIVERTER ASSEMBLY ENABLING ON-DEMAND DIFFERENT SPATIAL OUTPUTS (Applied Materials, Inc.) (20240829)
- 20240079212. SCANNING IMPEDANCE MEASUREMENT IN A RADIO FREQUENCY PLASMA PROCESSING CHAMBER (Applied Materials, Inc.) (20240307)
- 20240177968. SYSTEM AND METHODS FOR IMPLEMENTING A MICRO PULSING SCHEME USING DUAL INDEPENDENT PULSERS (Applied Materials, Inc.) (20240530)
Atsushi TAKAHASHI
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
- 20240112918. PLASMA PROCESSING SYSTEM, PLASMA PROCESSING APPARATUS, AND ETCHING METHOD (Tokyo Electron Limited) (20240404)
- 20240112922. ETCHING METHOD AND PLASMA PROCESSING SYSTEM (Tokyo Electron Limited) (20240404)
- 20240153744. ETCHING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240509)
Kazuki MOYAMA
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
Mitsunori Ohata
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
Gen TAMAMUSHI
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
- 20240170258. PLASMA PROCESSING SYSTEM AND PLASMA PROCESSING METHOD (Tokyo Electron Limited) (20240523)
- 20240222078. PLASMA PROCESSING APPARATUS, POWER SUPPLY SYSTEM, CONTROL METHOD, PROGRAM, AND STORAGE MEDIUM (Tokyo Electron Limited) (20240704)
- 20240153742. PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240509)
Hiroyuki MATSUURA
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
Satoru KAWAKAMI
- Number of Plasma Technology patents: 4
- Top companies:
- TOKYO ELECTRON LIMITED: 2 patents
- Tokyo Electron Limited: 2 patents
- Recent patents:
Shota YOSHIMURA
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
- 20240212987. GAS SUPPLY SYSTEM, GAS CONTROL SYSTEM, PLASMA PROCESSING APPARATUS, AND GAS CONTROL METHOD (Tokyo Electron Limited) (20240627)
- 20240071727. SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240229)
- 20240071728. SUBSTRATE PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240229)
Jianping Zhao of Austin TX (US)
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
Qiang Wang of Austin TX (US)
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
Shin YAMAGUCHI
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
Makoto KATO
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
- 20240194514. SUBSTRATE SUPPORT AND SUBSTRATE PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
- 20240087857. PLASMA PROCESSING APPARATUS AND SUBSTRATE SUPPORT (Tokyo Electron Limited) (20240314)
- 20240047182. PLASMA PROCESSING APPARATUS AND ELECTROSTATIC CHUCK (Tokyo Electron Limited) (20240208)
Hajime TAMURA
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
Kazuya NAGASEKI
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
- 20240096608. PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240321)
- 20240068921. PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240229)
- 20240194459. PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
Satoru TERUUCHI
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
- 20240096608. PLASMA MONITORING SYSTEM, PLASMA MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240321)
- 20240068921. PARTICLE MONITORING SYSTEM, PARTICLE MONITORING METHOD, AND MONITORING DEVICE (Tokyo Electron Limited) (20240229)
- 20240194459. PROCESSING METHOD AND PLASMA PROCESSING APPARATUS (Tokyo Electron Limited) (20240613)
Yasuharu SASAKI
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
Naoki MATSUMOTO
- Number of Plasma Technology patents: 4
- Top companies:
- Tokyo Electron Limited: 4 patents
- Recent patents:
Da Song of Albany NY (US)
- Number of Plasma Technology patents: 3
- Top companies:
- Tokyo Electron Limited: 3 patents
- Recent patents:
Shin MATSUURA
- Number of Plasma Technology patents: 3
- Top companies:
- Tokyo Electron Limited: 2 patents
- TOKYO ELECTRON LIMITED: 1 patents
- Recent patents:
Chelsea DuBose of Austin TX (US)
- Number of Plasma Technology patents: 3
- Top companies:
- Tokyo Electron Limited: 3 patents
- Recent patents:
Justin Moses of Austin TX (US)
- Number of Plasma Technology patents: 3
- Top companies:
- Tokyo Electron Limited: 3 patents
- Recent patents:
Hiroyuki MIYASHITA
- Number of Plasma Technology patents: 3
- Top companies:
- Tokyo Electron Limited: 3 patents
- Recent patents:
Top Collaborations in Plasma Technology
Top US States for Plasma Technology Inventors
Top Cities for Plasma Technology Inventors
- Miyagi: 188 inventors
- Tokyo: 121 inventors
- Kurokawa-gun: 72 inventors
- Suwon-si: 64 inventors
- Austin: 51 inventors
- Yamanashi: 44 inventors
- Fremont: 43 inventors
- Santa Clara: 41 inventors
- San Jose: 41 inventors
- Albany: 40 inventors
- Hsinchu: 22 inventors
- Seoul: 20 inventors
- Nirasaki City: 18 inventors
- Sunnyvale: 15 inventors
- Pleasanton: 13 inventors
- Portland: 13 inventors
- Redwood City: 12 inventors
- Nirasaki City, Yamanashi: 11 inventors
- Shanghai: 11 inventors
- Saratoga: 10 inventors
